公开(公告)号：US20110117333A1

公开(公告)日：2011-05-19

申请号：US13012939

申请日：2011-01-25

申请人： Yutaka FURUKAWA

发明人： Yutaka FURUKAWA

IPC分类号： G03F7/004 ,  G03F7/20 ,  B32B3/10

CPC分类号： G03F7/0757 ,  G02B5/201 ,  G02B5/223 ,  G02F1/133516 ,  G02F1/13439 ,  G03F7/0007 ,  G03F7/0046 ,  H01L27/3246 ,  H01L27/3283 ,  H01L51/0005 ,  Y10T428/24802

摘要： To provide a negative photosensitive composition applicable to preparation of partition walls which can maintain excellent ink repellency even after ink affinity-imparting treatment, and partition walls for an optical device using such a composition.A negative photosensitive composition comprising the following ink repellent (A) in an amount of from 0.01 to 10 mass % to the total amount, a photosensitive resin (B) having an acidic group and an ethylenic double bond in one molecule, and a photopolymerization initiator (C), and partition walls for an optical device using such a composition: Ink repellent (A): a hydrolyzed condensate of at least three hydrolyzable silane compounds, the three hydrolyzable silane compounds respectively selected from a trifunctional hydrolyzable silane compound having a C3-10 perfluoroalkyl group which may contain an etheric oxygen atom, a bi- to tetrafunctional hydrolyzable silane compound, and a bi- or trifunctional hydrolyzable silane compound having a (meth)acryloyl group, which has a fluorine atom content of from 10 to 55 mass %.

摘要翻译： 为了提供适用于制备分隔壁的负型感光性组合物，即使在赋予油墨亲和力的处理之后也能够保持优异的拒墨性，以及使用这种组合物的光学装置的分隔壁。 包含相对于总量为0.01〜10质量％的以下拒墨剂（A）的负型感光性组合物，1分子中具有酸性基团和烯属双键的感光性树脂（B）和光聚合引发剂 （C）和使用这种组合物的光学装置的分隔壁：防墨水（A）：至少三种可水解硅烷化合物的水解缩合物，分别选自三官能可水解硅烷化合物的三种可水解硅烷化合物，其具有C3- 10个可以含有醚性氧原子的全氟烷基，双官能的水解性硅烷化合物和具有10〜55质量％的氟原子含量的具有（甲基）丙烯酰基的双官能或三官能的水解性硅烷化合物， 。

公开(公告)号：US20100196702A9

公开(公告)日：2010-08-05

申请号：US12204847

申请日：2008-09-05

申请人： Yutaka FURUKAWA

发明人： Yutaka FURUKAWA

IPC分类号： B32B33/00 ,  B32B27/00 ,  C08F2/48 ,  B05D5/00

CPC分类号： H01L21/02118 ,  G03F7/027 ,  G03F7/0755 ,  G03F7/0757 ,  H01L21/312 ,  Y10T428/265 ,  Y10T428/3154 ,  Y10T428/31663 ,  Y10T428/31667

摘要： To provide a treated substrate having a hydrophilic region and a water repellent region, of which contrast is high on its surface. Further, to provide a process for producing a treated substrate, wherein a specific equipment, light having a high energy or light irradiation for a long time is not required, and the treated substrate can be produced with a low amount of light for a short time.A treated substrate having a hydrophilic region and a water repellent region on a surface of a substrate, characterized in that the water repellent region is made of a water repellent film formed by curing the composition (A) comprising a photopolymerization initiator and a compound (a) having at least one (meth)acryloyl group, and a water repellent moiety and having a film thickness of from 0.1 to 100 nm. A process for producing a treated substrate, characterized by using a hydrophilic substrate or carrying out a hydrophilic treatment on a surface of a substrate to make the surface hydrophilic, then forming a film containing the composition (A) on the surface, then forming a water repellent film having a film thickness of from 0.1 to 100 nm by irradiating light on a part of the film surface to cure the composition (A) and then removing an uncured composition (A) present on the surface of the substrate in order to expose the hydrophilic surface.

摘要翻译： 提供具有亲水区域和防水区域的处理过的基材，其表面上的对比度高。 此外，为了提供一种处理基板的制造方法，其中特定的设备，不需要长时间的高能量或光照射的光，并且可以在短时间内以少量的光生产处理过的基板 。 一种在基材表面上具有亲水区域和防水区域的处理过的基材，其特征在于，所述防水区域由通过固化包含光聚合引发剂和化合物（a）的组合物（A）而形成的防水膜制成， ）具有至少一个（甲基）丙烯酰基和斥水性部分，并且膜厚度为0.1-100nm。 一种处理基材的制造方法，其特征在于，在基材表面使用亲水性基材或进行亲水处理，使表面亲水，然后在表面上形成含有组合物（A）的膜，然后形成水 通过在膜表面的一部分上照射光来固化组合物（A），然后除去存在于基材表面上的未固化组合物（A），以使曝光的膜的厚度为0.1至100nm的防水膜 亲水表面。

公开(公告)号：US20090011227A1

公开(公告)日：2009-01-08

申请号：US12204847

申请日：2008-09-05

申请人： Yutaka FURUKAWA

发明人： Yutaka FURUKAWA

IPC分类号： B32B33/00 ,  B32B27/00 ,  C08F2/48 ,  B05D5/00

CPC分类号： H01L21/02118 ,  G03F7/027 ,  G03F7/0755 ,  G03F7/0757 ,  H01L21/312 ,  Y10T428/265 ,  Y10T428/3154 ,  Y10T428/31663 ,  Y10T428/31667

摘要： To provide a treated substrate having a hydrophilic region and a water repellent region, of which contrast is high on its surface. Further, to provide a process for producing a treated substrate, wherein a specific equipment, light having a high energy or light irradiation for a long time is not required, and the treated substrate can be produced with a low amount of light for a short time.A treated substrate having a hydrophilic region and a water repellent region on a surface of a substrate, characterized in that the water repellent region is made of a water repellent film formed by curing the composition (A) comprising a photopolymerization initiator and a compound (a) having at least one (meth)acryloyl group, and a water repellent moiety and having a film thickness of from 0.1 to 100 nm. A process for producing a treated substrate, characterized by using a hydrophilic substrate or carrying out a hydrophilic treatment on a surface of a substrate to make the surface hydrophilic, then forming a film containing the composition (A) on the surface, then forming a water repellent film having a film thickness of from 0.1 to 100 nm by irradiating light on a part of the film surface to cure the composition (A) and then removing an uncured composition (A) present on the surface of the substrate in order to expose the hydrophilic surface.

摘要翻译： 提供具有亲水区域和防水区域的处理过的基材，其表面上的对比度高。 此外，为了提供一种处理基板的制造方法，其中特定的设备，不需要长时间的高能量或光照射的光，并且可以在短时间内以少量的光生产处理过的基板 。 一种在基材表面上具有亲水区域和防水区域的处理过的基材，其特征在于，所述防水区域由通过固化包含光聚合引发剂和化合物（a）的组合物（A）而形成的防水膜制成， ）具有至少一个（甲基）丙烯酰基和斥水性部分，并且膜厚度为0.1-100nm。 一种处理基材的制造方法，其特征在于，在基材表面使用亲水性基材或进行亲水处理，使表面亲水，然后在表面上形成含有组合物（A）的膜，然后形成水 通过在膜表面的一部分上照射光来固化组合物（A），然后除去存在于基材表面上的未固化组合物（A），以使曝光的膜的厚度为0.1至100nm的防水膜 亲水表面。

公开(公告)号：US07393515B2

公开(公告)日：2008-07-01

申请号：US11446200

申请日：2006-06-05

申请人： Taiki Hoshino ,  Yutaka Furukawa ,  Takashi Okazoe

发明人： Taiki Hoshino ,  Yutaka Furukawa ,  Takashi Okazoe

IPC分类号： B01J3/06 ,  C07F7/04

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  C07F7/1804 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/0046

摘要： To provide a fluorinated compound, which can readily form a thin film having a hydrophobic/hydrophilic pattern, by employing an ultraviolet light having a relatively low energy.A thin film having a hydrophobic/hydrophilic pattern is formed by irradiating a thin film formed by employing a fluorinated compound represented by the following formula 1 (in the formula 1, each of R1, R2, R3 and R4 which are independent of one another, is a hydrogen atom, a halogen atom or a monovalent organic group, provided that at least one of them is a monovalent organic group having fluorine atoms, and R5 is a hydrogen atom or a monovalent organic group, R6 is a monovalent organic group, and A is a hetero atom) with ultraviolet light

摘要翻译： 为了提供能够容易地形成具有疏水/亲水图案的薄膜的氟化化合物，通过使用具有较低能量的紫外光。 通过照射通过使用由下式1表示的氟化化合物形成的薄膜来形成具有疏水/亲水图案的薄膜（在式1中，R 1，R 2， 2个，R 3和R 4彼此独立的是氢原子，卤素原子或一价有机基团，条件是至少 其中一个是具有氟原子的一价有机基团，R 5是氢原子或一价有机基团，R 6是一价有机基团，A是 一个杂原子）与紫外线

公开(公告)号：US20050113609A1

公开(公告)日：2005-05-26

申请号：US11026012

申请日：2005-01-03

申请人： Yutaka Furukawa

发明人： Yutaka Furukawa

IPC分类号： C07C43/17 ,  C07C41/00

CPC分类号： C07C43/17

摘要： A novel fluorine-containing unsaturated compound and a method for its production. A fluorine-containing unsaturated compound represented by R1CY1HCY2Y3OQ1CH═CH2 or CH2═CHQ2OCZ1Z2CZ3HR2CZ4HCZ5Z6OQ2CH═CH2 (wherein R1 is a monovalent fluorine containing organic group, etc., R2 is a bivalent fluorine containing organic group, etc., Y1 to Y3 and Z1 to Z6 are fluorine atoms, and Q1 and Q2 are alkylene groups, etc.). A method for producing a fluorine-containing unsaturated compound having a group represented by —CX1HCX2X3OQCH═CH2 (wherein X1 to X3 are fluorine atoms, and Q is an alkylene group, etc.), which comprises reacting a compound having —CX1═CX2X3 with HOQCH═CH2 in the presence of an alkali metal compound.

摘要翻译： 一种新型含氟不饱和化合物及其制备方法。 由R 1表示的含氟不饱和化合物1 CH 2 CH 2或CH 2 -CHQ 2 O 2 ZZZ 2 O 2 / SUP> CZ 3 2 > 2 CH-CH 2（其中R 1是一价含氟有机基团等，R 2是 二价含氟有机基团等，Y 1至Y 3和Z 1至Z 6均为氟 原子，Q 1和Q 2是亚烷基等）。 一种具有由-CX 1 -OXCH 2 O 3 OQCH-CH 2表示的基团的含氟不饱和化合物的制备方法 （其中X 1至X 3是氟原子，Q是亚烷基等），其包括使具有-CX 3 3。