公开(公告)号：US09390941B2

公开(公告)日：2016-07-12

申请号：US13510296

申请日：2010-11-16

申请人： Seiichi Watanabe ,  Yutaka Kozuma ,  Tooru Aramaki ,  Naoki Yasui ,  Norihiko Ikeda ,  Hiroaki Takikawa

发明人： Seiichi Watanabe ,  Yutaka Kozuma ,  Tooru Aramaki ,  Naoki Yasui ,  Norihiko Ikeda ,  Hiroaki Takikawa

IPC分类号： H01L21/306 ,  C23F1/00 ,  H01L21/3213 ,  G03F7/40 ,  H01J37/32 ,  H01L21/027 ,  H01L21/28

CPC分类号： H01L21/32139 ,  G03F7/40 ,  H01J37/32357 ,  H01J37/32807 ,  H01J37/32816 ,  H01J37/32871 ,  H01L21/0273 ,  H01L21/28035

摘要： There is provided a VUV light processing apparatus that can apply vacuum ultraviolet light to the entire surface of a wafer in excellent reproducibility and can process the wafer with VUV (vacuum ultraviolet) light in excellent reproducibility. A VUV light processing apparatus includes: a chamber connected with a gas supply apparatus and an evacuation apparatus, the chamber being capable of reducing the pressure inside the chamber; a plasma light source that generates VUV light including a wavelength of 200 nm or less, the plasma light source including a plasma generating unit that generates plasma in the chamber; and a VUV transmission filter provided between a stage on which a sample to be processed is placed and the sample in the chamber, the VUV transmission filter transmitting the VUV light including a wavelength of 200 nm or less and not transmitting electrons, ions, and radicals in plasma, the VUV transmission filter having the outer diameter size larger than that of the sample.

摘要翻译： 提供了一种能够以优异的再现性将真空紫外光施加到晶片的整个表面的VUV光处理装置，并且可以以优异的再现性以VUV（真空紫外线）光处理晶片。 VUV光处理装置包括：与气体供给装置和排气装置连接的室，所述室能够减小所述室内的压力; 等离子体光源，其产生包括200nm以下的波长的VUV光，所述等离子体光源包括在所述室中产生等离子体的等离子体发生单元; VUV透射滤光器，其设置在放置有待处理样品的台和样品之间，VUV透射滤光器透射包含200nm以下的波长的VUV光，不透射电子，离子和基团 在等离子体中，VUV透射滤光器的外径尺寸大于样品的尺寸。

公开(公告)号：US20120228261A1

公开(公告)日：2012-09-13

申请号：US13510296

申请日：2010-11-16

申请人： Seiichi Watanabe ,  Yutaka Kozuma ,  Tooru Aramaki ,  Naoki Yasui ,  Norihiko Ikeda ,  Hiroaki Takikawa

发明人： Seiichi Watanabe ,  Yutaka Kozuma ,  Tooru Aramaki ,  Naoki Yasui ,  Norihiko Ikeda ,  Hiroaki Takikawa

IPC分类号： C23F1/08 ,  C23F1/00

CPC分类号： H01L21/32139 ,  G03F7/40 ,  H01J37/32357 ,  H01J37/32807 ,  H01J37/32816 ,  H01J37/32871 ,  H01L21/0273 ,  H01L21/28035

摘要： There is provided a VUV light processing apparatus that can apply vacuum ultraviolet light to the entire surface of a wafer in excellent reproducibility and can process the wafer with VUV (vacuum ultraviolet) light in excellent reproducibility. A VUV light processing apparatus includes: a chamber connected with a gas supply apparatus and an evacuation apparatus, the chamber being capable of reducing the pressure inside the chamber; a plasma light source that generates VUV light including a wavelength of 200 nm or less, the plasma light source including a plasma generating unit that generates plasma in the chamber; and a VUV transmission filter provided between a stage on which a sample to be processed is placed and the sample in the chamber, the VUV transmission filter transmitting the VUV light including a wavelength of 200 nm or less and not transmitting electrons, ions, and radicals in plasma, the VUV transmission filter having the outer diameter size larger than that of the sample.

摘要翻译： 提供了一种能够以优异的再现性将真空紫外光施加到晶片的整个表面的VUV光处理装置，并且可以以优异的再现性以VUV（真空紫外线）光处理晶片。 VUV光处理装置包括：与气体供给装置和排气装置连接的室，所述室能够减小所述室内的压力; 等离子体光源，其产生包括200nm以下的波长的VUV光，所述等离子体光源包括在所述室中产生等离子体的等离子体发生单元; VUV透射滤光器，其设置在放置有待处理样品的台和样品之间，VUV透射滤光器透射包含200nm以下的波长的VUV光，不透射电子，离子和基团 在等离子体中，VUV透射滤光器的外径尺寸大于样品的外径尺寸。