MOLECULAR ARRAY GENERATION USING PHOTORESIST

    公开(公告)号:US20220228210A1

    公开(公告)日:2022-07-21

    申请号:US17565047

    申请日:2021-12-29

    IPC分类号: C12Q1/6874 C12N15/10

    摘要: Provided in some aspects are methods for light-controlled in situ surface patterning of a substrate. Compositions such as nucleic acid arrays produced by the methods are also disclosed. In some embodiments, a method disclosed herein comprises using photoresist for photocontrollable hybridization and/or ligation of nucleic acid molecules, wherein photoresist removal allows hybridization and/or ligation of nucleic acid molecules at the exposed area. A large diversity of barcodes can be created in molecules on the substrate via sequential rounds of light exposure, hybridization, and ligation.