MOLECULAR ARRAY GENERATION USING PHOTORESIST

    公开(公告)号:US20220228210A1

    公开(公告)日:2022-07-21

    申请号:US17565047

    申请日:2021-12-29

    Abstract: Provided in some aspects are methods for light-controlled in situ surface patterning of a substrate. Compositions such as nucleic acid arrays produced by the methods are also disclosed. In some embodiments, a method disclosed herein comprises using photoresist for photocontrollable hybridization and/or ligation of nucleic acid molecules, wherein photoresist removal allows hybridization and/or ligation of nucleic acid molecules at the exposed area. A large diversity of barcodes can be created in molecules on the substrate via sequential rounds of light exposure, hybridization, and ligation.

    COVALENT ATTACHMENT OF SPLINT OLIGONUCLEOTIDES FOR MOLECULAR ARRAY GENERATION USING LIGATION

    公开(公告)号:US20240167077A1

    公开(公告)日:2024-05-23

    申请号:US18215299

    申请日:2023-06-28

    CPC classification number: C12Q1/6806 C12Q1/6874 C12Q2600/166

    Abstract: Provided in some aspects are methods for light-controlled in situ surface patterning of a substrate. Compositions such as nucleic acid arrays produced by the methods are also disclosed. In some embodiments, a method disclosed herein comprises using photocontrollable ligation of nucleic acid molecules with splints, wherein at least one of the splints comprises a photo-crosslinkable moiety. Photo-induced crosslinking of the splint to oligonucleotide molecules immobilized on a substrate allows the splint to remain attached to the oligonucleotide molecules during subsequent rounds of photoresist application and removal. A large diversity of barcodes can be created in molecules on the substrate via sequential rounds of light exposure, hybridization, and ligation.

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