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公开(公告)号：US20210189175A1
公开(公告)日：2021-06-24
申请号：US16076015
申请日：2017-02-10
发明人： John J. Gagliardi , Eric C. Coad , Paul S. Lugg
摘要： A polishing system includes a substrate to be polished and a polishing pad. The polishing pad includes a base layer and a wear resistant layer. The system further includes a polishing solution disposed between the polishing pad and the substrate. The polishing solution includes a fluid component and a plurality of ceramic abrasive composites. The ceramic abrasive composites include individual abrasive particles uniformly dispersed throughout a porous ceramic matrix. At least a portion of the porous ceramic matrix includes glassy ceramic material. The ceramic abrasive composites are dispersed in the fluid component.
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公开(公告)号：US20170226380A1
公开(公告)日：2017-08-10
申请号：US15329374
申请日：2015-07-31
CPC分类号： C09G1/02 , B24B37/044 , B24B37/245 , B24B37/26 , C01F7/02 , C09G1/04 , C09K3/1409 , C09K3/1463
摘要： A polishing solution includes a fluid component and a plurality of conditioning particles. The fluid component includes water, a basic pH adjusting agent, and a polymeric thickening agent. The polymeric thickening agent is present in the fluid component at greater than 0.01 weight percent based on the total weight of the polishing solution.
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公开(公告)号：US12048980B2
公开(公告)日：2024-07-30
申请号：US16640175
申请日：2018-08-21
发明人： Lian S. Tan , Eric C. Coad , Justin W. Lerbakken
CPC分类号： B24B37/26 , B24B37/105 , B24B37/22
摘要： An article includes a surface layer and a base layer coupled to at least a portion of the surface layer. The surface layer includes a top major surface defining a plane and a bottom major surface opposite the top major surface. A plurality of projections extends from the plane of the top major surface and a plurality of microstructures extend from the plurality of projections.
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公开(公告)号：US20230211455A1
公开(公告)日：2023-07-06
申请号：US18000887
申请日：2021-06-24
发明人： Joseph D. RULE , Duy K. Lehuu , Eric C. Coad
CPC分类号： B24B37/24 , B24B37/22 , B24B37/26 , H01L21/02013
摘要： A polishing pad includes a textured polishing layer comprising a working surface and a second surface opposite the working surface. The textured polishing layer comprises a polymeric blend comprising thermoplastic urethane in an amount of between 40 and 95 wt. %, and styrenic copolymer in an amount of between 5 and 60 wt. %, based on the total weight of the textured polishing layer.
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公开(公告)号：US20200171619A1
公开(公告)日：2020-06-04
申请号：US16640175
申请日：2018-08-21
发明人： Lian S. Tan , Eric C. Coad , Justin W. Lerbakken
摘要： An article includes a surface layer and a base layer coupled to at least a portion of the surface layer. The surface layer includes a top major surface defining a plane and a bottom major surface opposite the top major surface. A plurality of projections extends from the plane of the top major surface and a plurality of microstructures extend from the plurality of projections.
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公开(公告)号：US10058970B2
公开(公告)日：2018-08-28
申请号：US15308198
申请日：2015-04-22
CPC分类号： B24B7/228 , B24B37/22 , B24B37/245 , B24B37/26 , B24D11/00 , B24D2203/00
摘要： Interrupted structured abrasive articles comprise an abrasive layer comprising shaped abrasive composites that extend outwardly from a first major surface of a backing to which they are secured. The abrasive layer defines at least one open region that is free of the shaped abrasive composites and may extend partially or completely through the backing. In some embodiments, each of the open regions comprises a circular area of at least 1.5 square centimeters, and when combined the open regions have total area that is at least 10 percent of the area of the first major surface of the backing. Interrupted abrasive articles are useful in single-sided polishing processes.
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