公开(公告)号：US10752543B2

公开(公告)日：2020-08-25

申请号：US16696835

申请日：2019-11-26

Applicant: AGC INC.

Inventor： Tomohiro Shibuya ,  Shin-ichi Amma ,  Yosuke Amino ,  Daisuke Kobayashi ,  Michinori Suehara

IPC: C03C21/00 ,  C03C23/00

Abstract: A glass substrate includes at least one selected from the group consisting of Li, Na, K, Mg, Ca, Sr, Ba and Zn as a reaction factor component, and includes a surface depletion layer at a surface side of the glass substrate. A total molar concentration (mol/cm3) of the reaction factor component in the surface depletion layer is decreased relative to an inside of the glass substrate. A total depletion amount (mol/cm2) of the reaction factor component in the surface depletion layer is 1.00×10−8 or more. The glass substrate has a refractive index (nd) of 1.68 or more.

公开(公告)号：US11370939B2

公开(公告)日：2022-06-28

申请号：US17006236

申请日：2020-08-28

Applicant: AGC Inc.

Inventor： Tomohiro Shibuya

IPC: C09G1/04 ,  C03C15/02 ,  C09G1/14 ,  H01L21/306 ,  C09K3/14 ,  H01L21/321 ,  C09G1/00 ,  C09K13/06 ,  C09G1/06 ,  B82Y30/00

Abstract: Smoothness of glass is improved. A polishing slurry (A) contains amorphous carbon and water, and a total amount of the amorphous carbon and the water is equal to or more than 90% of the whole polishing slurry in terms of mass ratio.

公开(公告)号：US11518912B2

公开(公告)日：2022-12-06

申请号：US17324921

申请日：2021-05-19

Applicant: AGC Inc.

Inventor： Tomohiro Shibuya

IPC: C09G1/04 ,  C03C15/02 ,  C09G1/14 ,  H01L21/306 ,  C09K3/14 ,  H01L21/321 ,  C09G1/00 ,  C09K13/06 ,  C09G1/06 ,  B82Y30/00

Abstract: Smoothness of glass is improved. A polishing slurry (A) contains amorphous carbon and water, and a total amount of the amorphous carbon and the water is equal to or more than 90% of the whole polishing slurry in terms of mass ratio.