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公开(公告)号:US20220134712A1
公开(公告)日:2022-05-05
申请号:US17575843
申请日:2022-01-14
Applicant: AGC Inc.
Inventor: Shuhei OGAWA , Norihito NAKAZAWA , Shuhei NOMURA
Abstract: A laminated member includes a glass member of which a linear transmittance at a wavelength of 850 nm is 80% or more, a bonding layer provided on or above the glass member, the bonding layer being constituted by a resin, and a ceramic member provided on or above the bonding layer, the ceramic member being constituted by an SiC member or an AlN member.
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公开(公告)号:US20230163453A1
公开(公告)日:2023-05-25
申请号:US18157213
申请日:2023-01-20
Applicant: AGC Inc.
Inventor: Shuhei NOMURA , Kazutaka ONO
CPC classification number: H01Q1/38 , H01Q1/2283 , H01Q9/0407 , H01Q15/0013
Abstract: Provided is a glass substrate with which it is possible to reduce dielectric loss in high-frequency signals, and which also has excellent thermal shock resistance. This invention satisfies the relation {Young's modulus (GPa)×average thermal expansion coefficient (ppm/° C.) at 50-350° C.}≤300 (GPa·ppm/° C.), wherein the relative dielectric constant at 20° C. and 35 GHz does not exceed 10, and the dielectric dissipation factor at 20° C. and 35 GHz does not exceed 0.006.
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公开(公告)号:US20210163341A1
公开(公告)日:2021-06-03
申请号:US17174615
申请日:2021-02-12
Applicant: AGC Inc.
Inventor: Kazutaka ONO , Shuhei NOMURA , Nobutaka KIDERA , Nobuhiko TAKESHITA
IPC: C03C3/089 , C03B25/08 , C03B19/14 , C03C3/091 , C03C4/16 , H05K1/03 , C03B17/02 , C03B17/06 , H05K1/02
Abstract: A glass substrate for a high-frequency device, which contains, in terms of mole percent on the basis of oxides: 40 to 75% of SiO2; 0 to 15% of Al2O3; 13 to 23% of B2O3; 2.5 to 11% of MgO; and 0 to 13% of CaO, and having a total content of alkali metal oxides in the range of 0.001-5%, where at least one main surface of the glass substrate has a surface roughness of 1.5 um or less in terms of arithmetic average roughness Ra. and the glass substrate has a dielectric dissipation factor at 35 GHz of 0.007 or less.
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公开(公告)号:US20210013598A1
公开(公告)日:2021-01-14
申请号:US17022365
申请日:2020-09-16
Applicant: AGC Inc.
Inventor: Shuhei NOMURA , Kazutaka ONO
Abstract: Provided is a glass substrate with which it is possible to reduce dielectric loss in high-frequency signals, and which also has excellent thermal shock resistance. This invention satisfies the relation {Young's modulus (GPa)×average thermal expansion coefficient (ppm/° C.) at 50-350° C}≤300 (GPa·ppm/° C.), wherein the relative dielectric constant at 20° C. and 35 GHz does not exceed 10, and the dielectric dissipation factor at 20° C. and 35 GHz does not exceed 0.006.
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公开(公告)号:US20250011220A1
公开(公告)日:2025-01-09
申请号:US18892859
申请日:2024-09-23
Applicant: AGC Inc.
Inventor: Shuhei NOMURA , Kazutaka ONO
Abstract: Provided is a glass substrate with which it is possible to reduce dielectric loss in high-frequency signals, and which also has excellent thermal shock resistance. This invention satisfies the relation {Young's modulus (GPa)×average thermal expansion coefficient (ppm/° C.) at 50-350° C.}≤300 (GPa·ppm/° C.), wherein the relative permittivity at 20° C. and 35 GHz does not exceed 10, and the dielectric loss tangent at 20° C. and 35 GHz does not exceed 0.006.
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6.
公开(公告)号:US20210261456A1
公开(公告)日:2021-08-26
申请号:US17319270
申请日:2021-05-13
Applicant: AGC Inc.
Inventor: Kazutaka ONO , Yusaku MATSUO , Shuhei NOMURA
Abstract: A glass substrate for high-frequency devices includes, in terms of molar percentage based on oxides: one or more alkaline-earth metal oxides in a total amount of 0.1 to 13%; Al2O3 and B2O3 in a total amount of 1 to 40%, in which a molar ratio of the contents represented by Al2O3/(Al2,O3+B2O3) is 0 to 0.45; at least one oxide selected from the group consisting of Sc2O3, TiO2, ZnO, Ga2O3, GeO2, Y2O3, ZrO2, Nb2O5, In2O3, TeO2, HfO2, Ta2O5, WO3, Bi2O3, La2O3, Gd2O3, Yb2O3, and Lu2O3, in a total amount of 0.1 to 1.0%; and SiO2 as a main component. The glass substrate has a dielectric dissipation factor at 35 GHz of 0.007 or less.
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7.
公开(公告)号:US20190084868A1
公开(公告)日:2019-03-21
申请号:US16195001
申请日:2018-11-19
Applicant: AGC INC.
Inventor: Shuhei NOMURA , Kazutaka ONO
IPC: C03C3/091 , C03C3/093 , H01L23/373 , H01L27/146 , B32B17/06 , B32B9/00
Abstract: An alkali-free glass substrate includes, as represented by molar percentage based on oxides, 11.0% or more of Al2O3, 8.0% or more of B2O3, and 1% or more of SrO. The alkali-free glass substrate has an average coefficient of thermal expansion α100/200 at 100 to 200° C. of from 3.10 ppm/° C. to 3.70 ppm/° C., a Young's modulus of 76.0 GPa or less, and a density of 2.42 g/cm3 or more.
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公开(公告)号:US20240317631A1
公开(公告)日:2024-09-26
申请号:US18734875
申请日:2024-06-05
Applicant: AGC Inc.
Inventor: Kazutaka ONO , Shuhei NOMURA , Nobutaka KIDERA , Nobuhiko TAKESHITA
IPC: C03C3/089 , C03B17/02 , C03B17/06 , C03B19/14 , C03B25/08 , C03C3/06 , C03C3/087 , C03C3/091 , C03C3/118 , C03C4/16 , C03C13/04 , H05K1/02 , H05K1/03
CPC classification number: C03C3/089 , C03C3/091 , C03C4/16 , H05K1/024 , H05K1/03 , C03B17/02 , C03B17/064 , C03B19/14 , C03B25/08 , C03C3/06 , C03C3/087 , C03C3/118 , C03C13/046 , C03C2204/08 , C03C2217/253
Abstract: A glass substrate for a high-frequency device, which contains, in terms of mole percent on the basis of oxides: 40 to 75% of SiO2; 0 to 15% of Al2O3; 13 to 23% of B2O3; 2.5 to 11% of MgO; and 0 to 13% of CaO, and having a total content of alkali metal oxides in the range of 0.001-5%, where at least one main surface of the glass substrate has a surface roughness of 1.5 nm or less in terms of arithmetic average roughness Ra, and the glass substrate has a dielectric dissipation factor at 35 GHz of 0.007 or less.
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公开(公告)号:US20220102850A1
公开(公告)日:2022-03-31
申请号:US17550080
申请日:2021-12-14
Applicant: AGC Inc.
Inventor: Shuhei NOMURA , Kazutaka ONO
Abstract: Provided is a glass substrate with which it is possible to reduce dielectric loss in high-frequency signals, and which also has excellent thermal shock resistance. This invention satisfies the relation {Young's modulus (GPa)×average thermal expansion coefficient (ppm/° C.) at 50-350° C.}≤300 (GPa·ppm/° C.), wherein the relative dielectric constant at 20° C. and 35 GHz does not exceed 10, and the dielectric dissipation factor at 20° C. and 35 GHz does not exceed 0.006.
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公开(公告)号:US20210343610A1
公开(公告)日:2021-11-04
申请号:US17367762
申请日:2021-07-06
Applicant: AGC Inc.
Inventor: Yu HANAWA , Shigeki SAWAMURA , Shuhei NOMURA , Kazutaka ONO , Nobuhiko TAKESHITA , Keisuke HANASHIMA
Abstract: The present invention provides a glass substrate in which in a step of sticking a glass substrate and a silicon-containing substrate to each other, bubbles hardly intrude therebetween. The present invention relates to a glass substrate for forming a laminated substrate by lamination with a silicon-containing substrate, having a warpage of 2 μm to 300 μm, and an inclination angle due to the warpage of 0.0004° to 0.12°.
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