公开(公告)号：US20250011220A1

公开(公告)日：2025-01-09

申请号：US18892859

申请日：2024-09-23

Applicant: AGC Inc.

Inventor： Shuhei NOMURA ,  Kazutaka ONO

IPC: C03C3/091 ,  C03C4/00 ,  C03C4/16 ,  H01Q1/22 ,  H01Q1/38 ,  H01Q9/04 ,  H01Q15/00

Abstract: Provided is a glass substrate with which it is possible to reduce dielectric loss in high-frequency signals, and which also has excellent thermal shock resistance. This invention satisfies the relation {Young's modulus (GPa)×average thermal expansion coefficient (ppm/° C.) at 50-350° C.}≤300 (GPa·ppm/° C.), wherein the relative permittivity at 20° C. and 35 GHz does not exceed 10, and the dielectric loss tangent at 20° C. and 35 GHz does not exceed 0.006.

公开(公告)号：US20240383803A1

公开(公告)日：2024-11-21

申请号：US18757697

申请日：2024-06-28

Applicant: AGC Inc.

Inventor： Hirofumi TOKUNAGA ,  Daisuke KOBAYASHI ,  Kazutaka ONO ,  Atsuyoshi TAKENAKA ,  Yoshitaka MAEYANAGI

IPC: C03C21/00 ,  C03C3/087 ,  C03C3/091 ,  C03C17/00 ,  C03C19/00 ,  G02F1/1335

Abstract: The present invention relates to a glass substrate including a pair of main surfaces and an end surface, and having a surface layer diffusion Sn atom concentration of 2.0×1018 atomic/cm3 or more and 1.4×1019 atomic/cm3 or less in at least one of the main surfaces, the surface layer diffusion Sn atom concentration being obtained by subtracting an Sn atom concentration of an inside of the glass substrate from an Sn atom concentration of a surface layer of the glass substrate, in which the Sn atom concentration of a surface layer of the glass substrate is defined as an Sn atom concentration at a depth of 0.1 to 0.3 μm from the main surface and the Sn atom concentration of an inside of the glass substrate is defined as an Sn atom concentration at a depth of 9.0 to 9.2 μm from the main surface.

公开(公告)号：US20240270626A1

公开(公告)日：2024-08-15

申请号：US18644271

申请日：2024-04-24

Applicant: AGC Inc.

Inventor： Qing LI ,  Yusuke ARAI ,  Akio KOIKE ,  Kazutaka ONO ,  Hitomi FURUTA ,  Shigeki SAWAMURA

IPC: C03C10/00 ,  C03C4/18 ,  C03C21/00 ,  H01L23/15

CPC classification number: C03C10/0027 ,  C03C4/18 ,  C03C21/002 ,  H01L23/15 ,  C03C2204/00

Abstract: A glass sheet, containing, in mass % on an oxide basis: 45-70% of SiO2, 1-15% of Al2O3, 10-25% of Li2O, 0-10% of Na2O, 0-5% of K2O, and 0-15% of ZrO2. K2O/R2O is 0.10 or less and ZrO2/R2O is 0.30 or more, where R2O is a total content of Li2O, Na2O, and K2O. The glass sheet has an average thermal expansion coefficient at 50° C.-350° C. of 90×10−7/° C.-140×10−7/° C. and a Young's modulus of 85 GPa or more.

公开(公告)号：US20210363051A1

公开(公告)日：2021-11-25

申请号：US17396217

申请日：2021-08-06

Applicant: AGC Inc.

Inventor： Hirofumi TOKUNAGA ,  Kazutaka ONO

IPC: C03C3/091 ,  C03C3/087

Abstract: An alkali-free glass includes, in mol % in terms of oxides: SiO2: 63-69%; Al2O3: 8-13%; B2O3: 0.5-4%; MgO: 8-15%; CaO: 4-12%; SrO: 0-4.5%; and BaO: 0-1%. [MgO]/[CaO] is 0.67 to 3.75. A value of Formula (A) is 84 or larger. A value of Formula (B) is 715 or smaller. A value of Formula (C) is 200 or smaller. A value of Formula (D) is 15 or smaller.

公开(公告)号：US20210261456A1

公开(公告)日：2021-08-26

申请号：US17319270

申请日：2021-05-13

Applicant: AGC Inc.

Inventor： Kazutaka ONO ,  Yusaku MATSUO ,  Shuhei NOMURA

IPC: C03C4/16 ,  H01Q1/38 ,  H01Q1/22 ,  C03C3/085

Abstract: A glass substrate for high-frequency devices includes, in terms of molar percentage based on oxides: one or more alkaline-earth metal oxides in a total amount of 0.1 to 13%; Al2O3 and B2O3 in a total amount of 1 to 40%, in which a molar ratio of the contents represented by Al2O3/(Al2,O3+B2O3) is 0 to 0.45; at least one oxide selected from the group consisting of Sc2O3, TiO2, ZnO, Ga2O3, GeO2, Y2O3, ZrO2, Nb2O5, In2O3, TeO2, HfO2, Ta2O5, WO3, Bi2O3, La2O3, Gd2O3, Yb2O3, and Lu2O3, in a total amount of 0.1 to 1.0%; and SiO2 as a main component. The glass substrate has a dielectric dissipation factor at 35 GHz of 0.007 or less.

公开(公告)号：US20210024402A1

公开(公告)日：2021-01-28

申请号：US17006271

申请日：2020-08-28

Applicant: AGC Inc.

Inventor： Seiji INABA ,  Kazutaka ONO

IPC: C03C3/068 ,  H01L21/683

Abstract: To provide a glass plate having a high Young's modulus and a high devitrification viscosity. A glass includes, in mol % based on oxides: SiO2 of 30.0 to 50.0%; B2O3 of 10.0 to 30.0%; Al2O3of 10.0 to 30.0%; Y2O3 of 3.0 to 17.0%; and Gd2O3 of 3.5 to 17.0%, in which (Gd2O3+Y2O3) is from 16.0 to 22.0%, and (Gd2O3/Y2O3) is from 0.15 to 7.0.

公开(公告)号：US20190084868A1

公开(公告)日：2019-03-21

申请号：US16195001

申请日：2018-11-19

Applicant: AGC INC.

Inventor： Shuhei NOMURA ,  Kazutaka ONO

IPC: C03C3/091 ,  C03C3/093 ,  H01L23/373 ,  H01L27/146 ,  B32B17/06 ,  B32B9/00

Abstract: An alkali-free glass substrate includes, as represented by molar percentage based on oxides, 11.0% or more of Al2O3, 8.0% or more of B2O3, and 1% or more of SrO. The alkali-free glass substrate has an average coefficient of thermal expansion α100/200 at 100 to 200° C. of from 3.10 ppm/° C. to 3.70 ppm/° C., a Young's modulus of 76.0 GPa or less, and a density of 2.42 g/cm3 or more.

公开(公告)号：US20240176198A1

公开(公告)日：2024-05-30

申请号：US18433510

申请日：2024-02-06

Applicant: AGC Inc.

Inventor： Kazutaka ONO ,  Yasumasa KATO ,  Masaya KUNIGITA

IPC: G02F1/1362 ,  C03C3/091 ,  C03C17/36 ,  G02F1/1333 ,  G02F1/1343 ,  H01L27/12 ,  H01L29/423

CPC classification number: G02F1/136286 ,  C03C3/091 ,  C03C17/36 ,  C03C17/3605 ,  C03C17/3626 ,  C03C17/3649 ,  C03C17/3671 ,  G02F1/133302 ,  G02F1/1343 ,  G02F1/133345 ,  G02F1/136295 ,  H01L27/124 ,  H01L29/42384

Abstract: The present invention relates a non-alkali glass, having a Young's modulus (E) of from 70 GPa to 95 GPa and an average coefficient of thermal expansion a from 50° C. to 350° C. of from 32 to 45 (×10−7/° C.), and which satisfies the following formula (1): 20α+7E≥1310. The non-alkali glass has a composition in terms of mol % on the basis of oxides, satisfying the relationship of: 759−13.1×SiO2−7.5×Al2O3−15.5×B2O3+9.7×MgO+21.8×CaO+27.2×SrO+27.9×BaO≥0.

公开(公告)号：US20230154938A1

公开(公告)日：2023-05-18

申请号：US18066497

申请日：2022-12-15

Applicant: AGC INC.

Inventor： Kazutaka ONO ,  Takatoshi YAOITA ,  Reo USUI ,  Kenichi EBATA ,  Jun AKIYAMA

IPC: H01L27/12 ,  B32B7/12 ,  B32B17/00 ,  B32B17/06 ,  B32B38/10 ,  B32B43/00 ,  C03C3/091 ,  C03C27/10 ,  H01L21/683 ,  H01L29/786 ,  B32B7/06

CPC classification number: H01L27/1266 ,  B32B7/12 ,  B32B17/00 ,  B32B17/06 ,  B32B38/10 ,  B32B43/006 ,  C03C3/091 ,  C03C27/10 ,  H01L21/6835 ,  H01L27/1222 ,  H01L29/78672 ,  B32B7/06 ,  H01L2221/68386 ,  B32B2307/30 ,  B32B2307/308 ,  B32B2307/546 ,  B32B2307/734 ,  B32B2315/08 ,  B32B2457/00 ,  G02F1/1341

Abstract: A carrier substrate to be used, when manufacturing a member for an electronic device on a surface of a substrate, by being bonded to the substrate, includes at least a first glass substrate. The first glass substrate has a compaction described below of 80 ppm or less. Compaction is a shrinkage in a case of subjecting the first glass substrate to a temperature raising from a room temperature at 100° C./hour and to a heat treatment at 600° C. for 80 minutes, and then to a cooling to the room temperature at 100° C./hour.

公开(公告)号：US20220144685A1

公开(公告)日：2022-05-12

申请号：US17585787

申请日：2022-01-27

Applicant: AGC Inc.

Inventor： Mikio NAGANO ,  Seiji INABA ,  Yasunari SAITO ,  Kiyoshi TAMAI ,  Kazutaka ONO ,  Yuha KOBAYASHI

IPC: C03C3/097 ,  C03C3/095 ,  C03C3/091 ,  C03C3/085 ,  C03C3/087 ,  H01L21/683

Abstract: Suppressing deflection and reducing weight are to be achieved. A supporting glass substrate has a ratio of a Young's modulus (GPa) to a density (g/cm3) that is 37.0 (GPa·cm3/g) or more and the ratio has a value larger than a ratio calculation value, the ratio calculation value being a ratio of a Young's modulus (GPa) calculated from a composition to a density (g/cm3). The ratio calculation value is represented by the following expression: α=2·Σ{(Vi·Gi)/Mi·Xi}, where, in the expression, Vi is a filling parameter of a metal oxide contained in the supporting glass substrate, Gi is a dissociation energy of a metal oxide contained in the supporting glass substrate, Mi is a molecular weight of a metal oxide contained in the supporting glass substrate, and Xi is a molar ratio of a metal oxide contained in the supporting glass substrate.