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    Stabilizer for thiol-ene compositions
    3.
    发明授权
    Stabilizer for thiol-ene compositions 有权

    公开(公告)号：US10563125B2

    公开(公告)日：2020-02-18

    申请号：US15039901

    申请日：2014-11-24

    Applicant: Allnex Belgium S.A.

    Inventor： Luc Boogaerts ,  Steven Cappelle ,  Hugues Van Den Bergen

    IPC: C09K15/32 ,  C07C271/22 ,  C07C69/54 ,  C09K15/08 ,  C09K15/06

    Abstract: The present invention relates to stabilizers for thiol-ene compositions and to radiation curable thiol-ene compositions based thereon. Such radiation curable compositions can advantageously be used in inks, overprint varnishes, coatings, adhesives, for the making of 3D objects and for the making of solder resist and gel nails. Provided in particular is an inhibitor system (I) for thiol-ene compositions based on —at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, —at least one acidic compound (ii) having a pKa between 1 and 3, and —at least one compound (iii) selected from the group consisting of phosphites and phosphonites, with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring. Also provided is an inhibitor system (II) for thiol-ene compositions based on that is based on —at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, —at least one compound (iv) selected from the group consisting of spirophosphites, and —optionally, at least one acidic compound (ii) having a pKa between 1 and 3, and with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring.

    FLUORINATED WATER-OIL REPELLENCY AGENTS
    5.
    发明申请
    FLUORINATED WATER-OIL REPELLENCY AGENTS 审中-公开
    氟化水油代用品

    公开(公告)号：US20140287242A1

    公开(公告)日：2014-09-25

    申请号：US14350655

    申请日：2012-10-04

    Applicant: Allnex Belgium S.A.

    Inventor： Ruben Cleymans ,  Steven Cappelle ,  Marcus Lee Hutchins ,  Luc Moens

    IPC: C07C69/734 ,  C09D133/16 ,  C08L33/16

    CPC classification number: C07C69/734 ,  C08F290/141 ,  C08G18/348 ,  C08G18/755 ,  C08L33/16 ,  C09D133/16 ,  C09D175/16 ,  Y10T428/3154 ,  C08G18/672 ,  C08G18/5015 ,  C08F222/1006

    Abstract: The present invention relates to an active energy ray curable compound (A) comprising: at least one active energy ray curable group, at least one fluorine-containing moiety (a1) and at least one moiety (a2) comprising at least one portion represented by Formula (1): —[C(═O)—CH(R)—O—C(═O)—CH(R)—O]n- wherein n is an integer from 1 to 10, and wherein R is selected from —H or —CH3. The invention further relates to ways of making such compounds and to their use in providing water-oil repellency properties to a coating composition.

    Abstract translation: 本发明涉及一种活性能量射线固化性化合物（A），其包含：至少一种活性能量射线固化性基团，至少一种含氟部分（a1）和至少一个部分（a2），其包含至少一个部分 式（1）： - [C（= O）-CH（R）-O-C（= O）-CH（R）-O] n - ，其中n为1〜10的整数， 从-H或-CH 3。 本发明还涉及制备这些化合物及其在向涂料组合物中提供拒水拒斥性的用途的方法。

    Polymeric photoinitiators
    7.
    发明授权
    Polymeric photoinitiators 有权

    公开(公告)号：US10189930B2

    公开(公告)日：2019-01-29

    申请号：US14895950

    申请日：2013-07-23

    Applicant: Allnex Belgium S.A.

    Inventor： Hugues Van Den Bergen ,  Paul Gevaert ,  Steven Cappelle

    IPC: C08F222/22 ,  C09D4/00 ,  C08K5/103 ,  C08G65/332 ,  C08F222/10

    Abstract: The present invention relates to radiation curable compositions (A) comprising—(a) at least one photoinitiator compound of formula (I) wherein Q is the residue of a hydroxy compound having 1 to 6 hydroxyl groups, and wherein x is a number that is at least 1 but no greater than the number of hydroxyl groups originally present in said hydroxy compound;—(b) at least one ethylenically unsaturated compound selected from monomers (b1) and/or from oligomers (b2); and—(c) optionally, at least one co-synergist which preferably is an amino co-synergist. The present invention further relates to photoinitiator compounds(a) and their preparation.

    Stabilizer for thiol-ene compositions
    10.
    发明授权
    Stabilizer for thiol-ene compositions 有权

    公开(公告)号：US10995270B2

    公开(公告)日：2021-05-04

    申请号：US16737106

    申请日：2020-01-08

    Applicant: ALLNEX BELGIUM S.A.

    Inventor： Luc Boogaerts ,  Steven Cappelle ,  Hugues Van Den Bergen

    IPC: C09K15/32 ,  C08K5/00 ,  C07C69/54 ,  C07C271/22 ,  C09K15/06 ,  C09K15/08

    Abstract: The present invention relates to stabilizers for thiol-ene compositions and to radiation curable thiol-ene compositions based thereon. Such radiation curable compositions can advantageously be used in inks, overprint varnishes, coatings, adhesives, for the making of 3D objects and for the making of solder resist and gel nails. Provided in particular is an inhibitor system (I) for thiol-ene compositions based on —at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, —at least one acidic compound (ii) having a pKa between 1 and 3, and —at least one compound (iii) selected from the group consisting of phosphites and phosphonites, with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring. Also provided is an inhibitor system (II) for thiol-ene compositions based on that is based on —at least one inhibitor compound (i) having a % DPPH radical scavenging activity of at least 90%, the inhibitor compound (i) being selected from substituted benzene compounds or substituted naphthalene compounds containing at least two substituents selected from the group consisting of hydroxyl groups and C1-C3 alkoxy groups bonded directly to the benzene or the naphthalene ring, —at least one compound (iv) selected from the group consisting of spirophosphites, and —optionally, at least one acidic compound (ii) having a pKa between 1 and 3, and with the proviso that if the inhibitor compound (i) is a substituted benzene that it contains at least two hydroxyl groups bonded directly to the benzene ring.

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