OPTOELECTRONIC SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING AN OPTOELECTRONIC SEMICONDUCTOR DEVICE

    公开(公告)号:US20230084844A1

    公开(公告)日:2023-03-16

    申请号:US17799295

    申请日:2021-02-17

    Abstract: An optoelectronic semiconductor device may include a carrier comprising a patterned surface and a semiconductor layer sequence arranged on the carrier. The semiconductor layer sequence may include a first semiconductor layer having a first surface, a second semiconductor layer having a first surface, and a first main surface and a second main surface opposite the first main surface. The first surfaces of the first and second semiconductor layers may be at least partly arranged at the first main surface. The second main surface may face the patterned surface of the carrier, and at least one side face may connect the first and second main surfaces. The device may further include a directionally reflective layer and a planarization layer. The planarization layer may be arranged between the patterned surface and the directionally reflective layer. Moreover, a method for producing an optoelectronic semiconductor device is also disclosed.

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