Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device using same

    公开(公告)号:US10106914B2

    公开(公告)日:2018-10-23

    申请号:US15081836

    申请日:2016-03-25

    Abstract: The present disclosure controls the heat source unit such that a to-be-processed object in which a hydrogen-containing to-be-processed layer is formed is irradiated with light in two stages, and thus the electrical characteristics of a semiconductor device may be suppressed and prevented from being deteriorated due to hydrogen. That is, ultraviolet light (UV) which is firstly radiated may induce a chemical reaction for separating Si—H bonds in the to-be-processed layer, and infrared light (IR) which is secondly radiated may induce a thermal reaction for vaporizing the separated hydrogen from the Si—H bonds. As such, both a chemical reaction for separating bonds of hydrogen and other ions in the to-be-processed layer and a thermal reaction for vaporizing hydrogen are performed, and thus hydrogen may be more easily removed than a temperature at which hydrogen is vaporized from the to-be-processed layer by only a thermal reaction.

    Apparatus and method of detecting temperature and apparatus for processing substrate
    2.
    发明授权
    Apparatus and method of detecting temperature and apparatus for processing substrate 有权
    检测温度的装置和方法以及处理衬底的装置

    公开(公告)号:US09470581B2

    公开(公告)日:2016-10-18

    申请号:US14190084

    申请日:2014-02-25

    Inventor: Sang Hyun Ji

    CPC classification number: G01J5/602 G01J5/0007 G01J2005/0048 G01J2005/067

    Abstract: Disclosed are an apparatus and method of detecting a temperature through a pyrometer in a non-contact manner, and an apparatus for processing a substrate using the apparatus, and more particularly, an apparatus and method of detecting a temperature, which precisely measures a temperature without any effect by humidity, and an apparatus for processing a substrate using the same. In an exemplary embodiment, an apparatus for detecting a temperature includes a humidity sensor configured to measure a humidity value, a temperature compensation database configured to store a temperature compensation value for each humidity value, and a pyrometer providing a non-contact temperature calculated by adding a temperature compensation value corresponding to a humidity value detected by the humidity sensor to a temperature to be compensated, which is obtained by converting a measured a wavelength intensity of a radiation radiated from an object in a wavelength band to be compensated.

    Abstract translation: 公开了以非接触方式通过高温计检测温度的装置和方法,以及使用该装置处理基板的装置,更具体地,涉及一种检测温度的装置和方法,其精确地测量温度而没有 湿度的任何影响,以及使用其的基板的处理装置。 在一个示例性实施例中,用于检测温度的装置包括被配置为测量湿度值的湿度传感器,配置为存储每个湿度值的温度补偿值的温度补偿数据库,以及提供非接触温度的高温计, 将由湿度传感器检测到的湿度值对应的温度补偿值与要补偿的温度相对应的温度补偿值,该温度补偿值是通过将被测量的被测物体辐射的波长的波长强度转换成待补偿的波段而得到的。

    APPARATUS FOR CALIBRATING PYROMETER
    3.
    发明申请
    APPARATUS FOR CALIBRATING PYROMETER 有权
    用于校准PYROMETER的装置

    公开(公告)号:US20140219310A1

    公开(公告)日:2014-08-07

    申请号:US14173795

    申请日:2014-02-05

    Inventor: Sang Hyun Ji

    CPC classification number: G01J5/522 G01J5/0007 G01J5/0893

    Abstract: Disclosed is a calibrating apparatus which is adapted to remove a measurement deviation of a pyrometer, and more particularly, to an apparatus for calibrating a pyrometer, which calibrates a reference value so as to remove a deviation in a temperature measured in a pyrometer. The apparatus for calibrating a pyrometer includes a blackbody including a radiant space from which radiant energy is radiated, a body housing configured to receive the blackbody therein and including a light output wall having a light output port connected with the radiant space, a light output wall protecting cover comprising a transparent blocking plate disposed at a position opposite to the light output port so as to transmit a long wavelength of approximately 5 μm to approximately 20 μm may and configured to be coupled with the light output wall of the body housing, and a fixing member configured to fix the light output wall protecting cover to the light output wall of the body housing.

    Abstract translation: 公开了一种校准装置,其适于去除高温计的测量偏差,更具体地,涉及用于校准高温计的装置,其校准参考值以消除在高温计中测量的温度的偏差。 用于校准高温计的装置包括黑体,其包括辐射能量辐射的辐射空间,被构造为在其中接收黑体的主体壳体,并且包括具有与辐射空间连接的光输出端口的光输出壁,光输出壁 保护盖包括设置在与光输出端口相对的位置处的透明阻挡板,以将大约5μm的长波长传输到大约20μm,并且可以被配置为与主体外壳的光输出壁相连,并且 固定构件,其构造成将光输出壁保护盖固定到主体壳体的光输出壁。

    Apparatus for calibrating pyrometer
    4.
    发明授权
    Apparatus for calibrating pyrometer 有权
    用于校准高温计的装置

    公开(公告)号:US09500530B2

    公开(公告)日:2016-11-22

    申请号:US14173793

    申请日:2014-02-05

    Inventor: Sang Hyun Ji

    CPC classification number: G01J5/522 G01J5/0007 G01J5/0887

    Abstract: Disclosed is a calibrating apparatus which is adapted to remove a measurement deviation of a pyrometer, and more particularly, to an apparatus for calibrating a pyrometer, which calibrates a reference value so as to remove a deviation in a temperature measured in a pyrometer. The apparatus for calibrating a pyrometer includes a blackbody including a radiant space from which radiant energy is radiated, a body housing configured to receive the blackbody therein and including a light output wall having a light output port connected with the radiant space, a light output wall protecting cover configured to be coupled with the light output wall of the body housing so as to define a passage connecting the light output wall of the body housing and an outside environment, and a fixing member configured to fix the light output wall protecting cover to the light output wall of the body housing.

    Abstract translation: 公开了一种校准装置,其适于去除高温计的测量偏差,更具体地,涉及用于校准高温计的装置,其校准参考值以消除在高温计中测量的温度的偏差。 用于校准高温计的装置包括黑体,其包括辐射能量辐射的辐射空间,被构造为在其中接收黑体的主体壳体,并且包括具有与辐射空间连接的光输出端口的光输出壁,光输出壁 保护盖,其构造成与所述主体壳体的所述光输出壁联接,以便限定连接所述主体壳体的光输出壁和外部环境的通​​道;以及固定构件,其将所述光输出壁保护盖固定到 光输出墙体的外壳。

    Gas spraying apparatus, substrate processing facility including the same, and method for processing substrate using substrate processing facility

    公开(公告)号:US11136670B2

    公开(公告)日:2021-10-05

    申请号:US15870756

    申请日:2018-01-12

    Abstract: A gas spraying apparatus according to the embodiment of the present invention includes a spray part disposed and aligned on one side outside a substrate in the width direction of the substrate, and having a plurality of nozzles for spraying gas toward the substrate, and a spray control unit for automatically controlling whether or not each of a plurality of nozzles sprays gas such that a gas density distribution type in the width direction of the substrate becomes a targeted gas density distribution type by the gas sprayed through the plurality of nozzles. Therefore, according to the embodiment of the present invention, it is easy to carry out the process with a plurality of types of process types or a plurality of types of gas density distribution types, and a time for adjusting the open or close operation of the plurality of nozzles can be shortened.

    Substrate treatment method and substrate treatment apparatus

    公开(公告)号:US10985040B2

    公开(公告)日:2021-04-20

    申请号:US16132218

    申请日:2018-09-14

    Abstract: A substrate treatment method in accordance with an exemplary embodiment includes: heating a substrate, for a substrate treatment process, so that a temperature of the substrate reaches a target temperature; calculating the temperature of the substrate using a sensor located facing the substrate while heating the substrate; and controlling an operation of a heating part configured to heat the substrate according to the temperature calculated from the calculating the temperature, wherein the calculating the temperature comprises: measuring a total radiant energy (Et) radiated from the substrate using the sensor; calculating a corrected total emissivity (εt0) by applying a correction value for correcting the total emissivity (εt) which is the emissivity of the radiant energy (Et); and calculating the temperature (Ts) of the substrate using the total radiant energy (Et) and the corrected total emissivity (εt0).

    Apparatus for calibrating pyrometer
    7.
    发明授权
    Apparatus for calibrating pyrometer 有权
    用于校准高温计的装置

    公开(公告)号:US09568372B2

    公开(公告)日:2017-02-14

    申请号:US14173795

    申请日:2014-02-05

    Inventor: Sang Hyun Ji

    CPC classification number: G01J5/522 G01J5/0007 G01J5/0893

    Abstract: Disclosed is a calibrating apparatus which is adapted to remove a measurement deviation of a pyrometer, and more particularly, to an apparatus for calibrating a pyrometer, which calibrates a reference value so as to remove a deviation in a temperature measured in a pyrometer. The apparatus for calibrating a pyrometer includes a blackbody including a radiant space from which radiant energy is radiated, a body housing configured to receive the blackbody therein and including a light output wall having a light output port connected with the radiant space, a light output wall protecting cover comprising a transparent blocking plate disposed at a position opposite to the light output port so as to transmit a long wavelength of approximately 5 μm to approximately 20 μm may and configured to be coupled with the light output wall of the body housing, and a fixing member configured to fix the light output wall protecting cover to the light output wall of the body housing.

    Abstract translation: 公开了一种校准装置,其适于去除高温计的测量偏差,更具体地,涉及用于校准高温计的装置,其校准参考值以消除在高温计中测量的温度的偏差。 用于校准高温计的装置包括黑体,其包括辐射能量辐射的辐射空间,被构造为在其中接收黑体的主体壳体,并且包括具有与辐射空间连接的光输出端口的光输出壁,光输出壁 保护盖包括设置在与光输出端口相对的位置处的透明阻挡板,以将大约5μm的长波长传输到大约20μm,并且可以被配置为与主体外壳的光输出壁相连,并且 固定构件,其构造成将光输出壁保护盖固定到主体壳体的光输出壁。

Patent Agency Ranking