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公开(公告)号:US20190326147A1
公开(公告)日:2019-10-24
申请号:US16432568
申请日:2019-06-05
Applicant: APPLIED MATERIALS, INC.
Inventor: SRISKANTHARAJAH THIRUNAVUKARASU , ENG SHENG PEH , SRINIVAS D. NEMANI , ARVIND SUNDARRAJAN , AVINASH AVULA , ELLIE Y. YIEH , MICHAEL RICE , GINETTO ADDIEGO
IPC: H01L21/673 , B25J11/00
Abstract: Embodiments of a multi-cassette carrying case are provided herein. In some embodiments a method for transporting a substrate from a first processing device to a second processing device includes docking a substrate cassette to a first chamber; pumping down pressure in the substrate cassette; transferring a substrate through the first chamber to the substrate cassette; sealing the substrate cassette and moving the substrate cassette having the substrate disposed therein from the first chamber to a second chamber; docking the substrate cassette to the second chamber; and transferring the substrate from the substrate cassette through the second chamber.
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公开(公告)号:US20190259647A1
公开(公告)日:2019-08-22
申请号:US16273808
申请日:2019-02-12
Applicant: APPLIED MATERIALS, INC.
Inventor: SRISKANTHARAJAH THIRUNAVUKARASU , ENG SHENG PEH , FANG JIE LIM , KARRTHIK PARATHITHASAN , ANAND MAHADEV , SHOJU VAYYAPRON , CHAI BOON XIAN
IPC: H01L21/683 , C23C14/50
Abstract: Embodiments of a process kit for processing reduced size substrates are provided herein. In some embodiments, a process kit includes a deposition ring having an annular body; and a plurality of protrusions extending upwardly from the annular body and disposed about and equidistant from a central axis of the annular body, wherein an angle between a first protrusion and a second protrusion is between about 140° and about 180°.
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公开(公告)号:US20190244845A1
公开(公告)日:2019-08-08
申请号:US15956481
申请日:2018-04-18
Applicant: APPLIED MATERIALS, INC.
IPC: H01L21/673 , H01L21/67
CPC classification number: H01L21/67376 , H01L21/67126
Abstract: A bridging front opening unified pod (FOUP) is provided herein. In some embodiments, the bridging FOUP includes a bottom floor, side walls, a ceiling and a back wall that forms an enclosure volume having a front opening, a plurality of supports coupled to the side walls and extending into the enclosure volume, wherein the plurality of supports are configured to support a substrate carrier, a base plate assembly comprising a base plate coupled to the bottom floor, a pair of L-brackets coupled to the base plate, wherein each L-brackets includes a short lift pin, a long lift pin coupled to the base plate, wherein the height of the short lift pins and the long lift pin is selected such that the substrate is kept level when disposed thereon, and a docking support disposed proximate the base plate assembly and configured to support a substrate carrier.
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公开(公告)号:US20160322234A1
公开(公告)日:2016-11-03
申请号:US15142220
申请日:2016-04-29
Applicant: APPLIED MATERIALS, INC.
Inventor: Jen Sern LEW , Tuck Foong KOH , Sriskantharajah THIRUNAVUKARASU , Karthik ELUMALAI , ENG SHENG PEH , JUN-LIANG SU
IPC: H01L21/324 , F27B9/02 , F27B9/10 , H01L21/67
CPC classification number: H01L21/3247 , F27B9/02 , F27B9/10 , F27B17/0025 , H01L21/67109 , H01L21/67248 , H01L21/67288
Abstract: Embodiments of methods and apparatus for correcting substrate deformity are provided herein. In some embodiments, a substrate flattening system includes: a first process chamber having a first substrate support and a first showerhead, wherein the first substrate support does not include a chucking mechanism; a first heater disposed in the first substrate support to heat a substrate placed on a first support surface of the first substrate support; a second heater configured to heat a process gas flowing through the first showerhead into a first processing volume of the first process chamber; and a second process chamber having a second substrate support, wherein the second substrate support is not heated, and wherein the first process chamber and the cooling chamber are both non-vacuum chambers.
Abstract translation: 本文提供了用于校正衬底畸形的方法和装置的实施例。 在一些实施例中,衬底平坦化系统包括:具有第一衬底支撑件和第一喷头的第一处理室,其中所述第一衬底支撑件不包括夹紧机构; 第一加热器,设置在所述第一基板支撑件中以加热放置在所述第一基板支撑件的第一支撑表面上的基板; 第二加热器,被配置为将流过所述第一喷淋头的处理气体加热到所述第一处理室的第一处理容积中; 以及具有第二基板支撑件的第二处理室,其中所述第二基板支撑件不被加热,并且其中所述第一处理室和所述冷却室都是非真空室。
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公开(公告)号:US20190259635A1
公开(公告)日:2019-08-22
申请号:US16273390
申请日:2019-02-12
Applicant: APPLIED MATERIALS, INC.
Inventor: KARRTHIK PARATHITHASAN , FANG JIE LIM , ANAND MAHADEV , SHOJU VAYYAPRON , SRISKANTHARAJAH THIRUNAVUKARASU , ENG SHENG PEH
IPC: H01L21/673 , H01L21/02 , H01L21/683
Abstract: Embodiments of a process kit for processing reduced size substrates are provided herein. In some embodiments, a process kit includes a substrate carrier having a pocket configured to hold a substrate, wherein the pocket extends partially through a thickness of the substrate carrier; and wherein the pocket includes an annular trench disposed at a periphery of a floor of the pocket.
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公开(公告)号:US20190252235A1
公开(公告)日:2019-08-15
申请号:US16272811
申请日:2019-02-11
Applicant: APPLIED MATERIALS, INC.
IPC: H01L21/687 , H01L21/683
CPC classification number: H01L21/68707 , H01L21/6838 , H01L21/68771 , H01L21/68785
Abstract: Embodiments of methods and apparatus for handling substrates of different sizes are provided herein. In some embodiments, an apparatus for handling substrates of different sizes includes: a pair of end effectors having a first set of contact pads configured to support a substrate having a first size and a second set of contact pads configured to support a substrate having a second size, smaller than the first size.
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公开(公告)号:US20160133494A1
公开(公告)日:2016-05-12
申请号:US14933635
申请日:2015-11-05
Applicant: APPLIED MATERIALS, INC.
Inventor: SRISKANTHARAJAH THIRUNAVUKARASU , ENG SHENG PEH , SRINIVAS D. NEMANI , ARVIND SUNDARRAJAN , AVINASH AVULA , ELLIE Y. YIEH
IPC: H01L21/677 , H01L21/673 , B25J11/00
CPC classification number: H01L21/67778 , H01L21/67201 , H01L21/67369 , H01L21/67373 , H01L21/67379 , H01L21/67389
Abstract: Embodiments of substrate transfer chambers are provided herein. In some embodiments, a substrate transfer chamber includes a body having an interior volume, wherein a bottom portion of the body includes a first opening; an adapter plate coupled to the bottom portion of the body to couple the substrate transfer chamber to a load lock chamber of a substrate processing system; wherein the adapter plate includes a second opening aligned with the first opening to fluidly couple the interior volume with an inner volume of the load lock chamber; a cassette support disposed in the interior volume to support a substrate cassette; and a lift actuator coupled to the cassette support to lower or raise the substrate cassette into or out of the load lock chamber.
Abstract translation: 本文提供了基板传送室的实施例。 在一些实施例中,衬底传送室包括具有内部容积的主体,其中主体的底部包括第一开口; 耦合到所述主体的底部的适配器板,以将所述衬底传送室耦合到衬底处理系统的负载锁定室; 其中所述适配器板包括与所述第一开口对准的第二开口,以将所述内部容积与所述负载锁定室的内部容积流体连接; 设置在所述内部容积中以支撑衬底盒的盒支架; 以及联接到所述盒支撑件的升降致动器,以将所述基板盒降低或升高到所述负载锁定室中或从所述负载锁定室中升起。
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公开(公告)号:US20160133491A1
公开(公告)日:2016-05-12
申请号:US14933651
申请日:2015-11-05
Applicant: APPLIED MATERIALS, INC.
Inventor: SRISKANTHARAJAH THIRUNAVUKARASU , ENG SHENG PEH , SRINIVAS D. NEMANI , ARVIND SUNDARRAJAN , AVINASH AVULA , ELLIE Y. YIEH , MICHAEL RICE , GINETTO ADDIEGO
IPC: H01L21/673 , B25J11/00
Abstract: Embodiments of multi-cassette carrying cases are provided herein. In some embodiments a multi-cassette carrying case includes: a body having an inner volume; a door coupled to the body to selectively seal off the inner volume; and a plurality of cassette holders disposed in the inner volume to hold one or more substrate cassettes. In some embodiments, a method of transferring substrates includes: placing a substrate in a substrate cassette, wherein an inner volume of the substrate cassette is sealed from an environment outside of the substrate cassette; and placing the substrate cassette in a multi-cassette carrying case.
Abstract translation: 这里提供了多盒式携带箱的实施例。 在一些实施例中,多卡带手提箱包括:具有内部容积的主体; 一个门连接到主体以选择性地密封内部容积; 以及设置在所述内部容积中以容纳一个或多个衬底盒的多个盒座。 在一些实施例中,传送衬底的方法包括:将衬底放置在衬底盒中,其中衬底盒的内部体积与衬底盒外的环境密封; 并将衬底盒放置在多盒式手提箱中。
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公开(公告)号:US20190326146A1
公开(公告)日:2019-10-24
申请号:US16432590
申请日:2019-06-05
Applicant: APPLIED MATERIALS, INC.
Inventor: SRISKANTHARAJAH THIRUNAVUKARASU , ENG SHENG PEH , SRINIVAS D. NEMANI , ARVIND SUNDARRAJAN , AVINASH AVULA , ELLIE Y. YIEH
IPC: H01L21/673 , H01L21/67 , H01L21/677
Abstract: Embodiments of substrate transfer apparatus are provided herein. In some embodiments, an apparatus for storing and transporting at least one substrate in a vacuum includes a carrying case for storing one or more substrates, wherein the carrying case includes a vacuum port and a plurality of holders to hold one or more substrates within an inner volume of the carrying case; and a vacuum source in fluid connection with the carrying case via the vacuum port.
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公开(公告)号:US20180144969A1
公开(公告)日:2018-05-24
申请号:US15815673
申请日:2017-11-16
Applicant: Applied Materials, Inc.
Inventor: SRISKANTHARAJAH THIRUNAVUKARASU , SHOJU VAYYAPRON , ANAND MAHADEV , SHANKEERTHAN KALYANASUNDARAM , ENG SHENG PEH
IPC: H01L21/683 , H01L21/673
Abstract: Embodiments of a hybrid substrate carrier are provided herein. In some embodiments, a substrate carrier includes: a carrier ring having an inner ledge adjacent a central opening of the carrier ring; and a carrier plate having a diameter greater than central opening and configured to rest upon the inner ledge, wherein the carrier plate includes an electrode disposed beneath a support surface to electrostatically clamp a substrate to the support surface of the carrier plate.
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