公开(公告)号：US20140060435A1

公开(公告)日：2014-03-06

申请号：US13721332

申请日：2012-12-20

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON ,  MICHAEL R. RICE ,  KARTIK B. SHAH ,  KASHIF MAQSOOD ,  PRAVIN K. NARWANKAR

IPC: C30B25/08 ,  E05F1/00

CPC classification number: H01L21/683 ,  B05B1/005 ,  C30B25/08 ,  C30B25/14 ,  C30B29/06 ,  E05F1/00 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/67712 ,  H01L21/6776

Abstract: Apparatus for use in an inline substrate processing tool are provided herein. In some embodiments, a door for use in an inline substrate processing tool between a first and a second substrate processing module coupled to one another in a linear arrangement may include a reflective body disposed between two cover plates of substantially transparent material, configured to reflect light and heat energy into each of the at first and second substrate processing modules, wherein the door is selectively movable, via an actuator coupled to the door, between an open position that fluidly couples the first and second substrate processing modules to a closed position that isolates the first substrate processing module from the second substrate processing module.

Abstract translation: 本文提供了用于在线基板处理工具中的装置。 在一些实施例中，在线性布置中彼此耦合的第一和第二基板处理模块之间的在线基板处理工具中使用的门可以包括设置在基本透明材料的两个盖板之间的反射体， 并且将热能分配到每个第一和第二基板处理模块中，其中门可选择性地通过耦合到门的致动器在将第一和第二基板处理模块流体耦合到打开位置之间选择性地移动，该打开位置将隔离 来自第二基板处理模块的第一基板处理模块。

公开(公告)号：US20140060434A1

公开(公告)日：2014-03-06

申请号：US13721323

申请日：2012-12-20

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON ,  MICHAEL R. RICE ,  KARTIK B. SHAH ,  KASHIF MAQSOOD ,  PRAVIN K. NARWANKAR

IPC: C30B25/14 ,  B05B1/00

CPC classification number: H01L21/683 ,  B05B1/005 ,  C30B25/08 ,  C30B25/14 ,  C30B29/06 ,  E05F1/00 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/67712 ,  H01L21/6776

Abstract: Apparatus for use in a substrate processing chamber are provided herein. In some embodiments, a gas injector for use in a process chamber may include first set of gas orifices configured to provide a jet flow of a first process gas into the process chamber, and a second set of gas orifices configured to provide a laminar flow of a second process gas into the process chamber, wherein the first set of gas orifices are disposed between at least two gas orifices of the second set of gas orifices.

Abstract translation: 本文提供了用于基板处理室的装置。 在一些实施例中，用于处理室的气体注入器可以包括构造成提供第一工艺气体到处理室中的喷射流的第一组气体孔，以及第二组气体孔，其被配置成提供 第二工艺气体进入处理室，其中第一组气体孔设置在第二组气体孔的至少两个气体孔之间。

公开(公告)号：US20140060433A1

公开(公告)日：2014-03-06

申请号：US13721311

申请日：2012-12-20

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON ,  MICHAEL R. RICE ,  KARTIK B. SHAH ,  KASHIF MAQSOOD ,  PRAVIN K. NARWANKAR

IPC: H01L21/683

CPC classification number: H01L21/683 ,  B05B1/005 ,  C30B25/08 ,  C30B25/14 ,  C30B29/06 ,  E05F1/00 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/67712 ,  H01L21/6776

Abstract: Apparatus for the removal of exhaust gases are provided herein. In some embodiments, an apparatus may include a carrier for supporting one or more substrates in a substrate processing tool, the carrier having a first exhaust outlet, and an exhaust assembly including a first inlet disposed proximate the carrier to receive process exhaust from the first exhaust outlet of the carrier, a second inlet to receive a cleaning gas, and an outlet to remove the process exhaust and the cleaning gas.

Abstract translation: 本文提供了用于排出废气的设备。 在一些实施例中，设备可以包括用于在衬底处理工具中支撑一个或多个衬底的载体，所述载体具有第一排气出口和排气组件，所述排气组件包括靠近所述载体设置的第一入口，以接收来自所述第一排气 载体的出口，用于接收清洁气体的第二入口和用于去除工艺废气和清洁气体的出口。