公开(公告)号：US20220367217A1

公开(公告)日：2022-11-17

申请号：US17321366

申请日：2021-05-14

申请人： Applied Materials, Inc.

发明人： Guoheng Zhao ,  Venkatakaushik Voleti ,  Todd J. Egan ,  Kyle R. Tantiwong ,  Andreas Schulze ,  Niranjan Ramchandra Khasgiwale ,  Mehdi Vaez-Iravani

IPC分类号： H01L21/67 ,  C23C16/52 ,  H01L21/66 ,  G01N21/55

摘要： Methods and systems for monitoring etch or deposition processes using image-based in-situ process monitoring techniques include illuminating a measurement area on a sample disposed in a process chamber. The measurement area is illuminated using an input beam generated remote from the process chamber and transmitted to a first viewing window of the process chamber by a first optical fiber. Portions of the first input beam reflected from the measurement area are transmitted from the first viewing window to an imaging sensor by a second optical fiber. A sequence of images is obtained at the imaging sensor, and a change in reflectance of pixels within each of the images is determined. The etch or deposition process is monitored based on the change in reflectance.

公开(公告)号：US20150097479A1

公开(公告)日：2015-04-09

申请号：US14107184

申请日：2013-12-16

申请人： APPLIED MATERIALS, INC.

发明人： Vladimir Knyazik ,  Samer Banna ,  Kyle R. Tantiwong

IPC分类号： H01J37/32

CPC分类号： H01J37/3211

摘要： A low inductance coil antenna for a plasma reactor has multiple radial zones of plural conductor lobes extending radially from respective RF supply and ground rings.

摘要翻译： 用于等离子体反应器的低电感线圈天线具有从相应的RF电源和接地环径向延伸的多个导体突起的多个径向区域。

公开(公告)号：US09472378B2

公开(公告)日：2016-10-18

申请号：US14107184

申请日：2013-12-16

申请人： APPLIED MATERIALS, INC.

发明人： Vladimir Knyazik ,  Samer Banna ,  Kyle R. Tantiwong

IPC分类号： C23C16/00 ,  H01L21/306 ,  H01J37/32

CPC分类号： H01J37/3211

摘要： A low inductance coil antenna for a plasma reactor has multiple radial zones of plural conductor lobes extending radially from respective RF supply and ground rings.

摘要翻译： 用于等离子体反应器的低电感线圈天线具有从相应的RF电源和接地环径向延伸的多个导体突起的多个径向区域。

公开(公告)号：US20150097478A1

公开(公告)日：2015-04-09

申请号：US14107137

申请日：2013-12-16

申请人： Applied Materials, Inc.

发明人： Vladimir Knyazik ,  Samer Banna ,  Kyle R. Tantiwong

IPC分类号： H01J37/32

CPC分类号： H01J37/3211

摘要： A low inductance coil antenna for a plasma reactor has plural conductor lobes extending radially from respective RF supply connections.

摘要翻译： 用于等离子体反应器的低电感线圈天线具有从相应的RF电源连接件径向延伸的多个导体凸角。

公开(公告)号：US11908716B2

公开(公告)日：2024-02-20

申请号：US17321366

申请日：2021-05-14

申请人： Applied Materials, Inc.

发明人： Guoheng Zhao ,  Venkatakaushik Voleti ,  Todd Egan ,  Kyle R. Tantiwong ,  Andreas Schulze ,  Niranjan Ramchandra Khasgiwale ,  Mehdi Vaez-Iravani

IPC分类号： H01L21/67 ,  C23C16/52 ,  G01N21/55 ,  H01L21/66

CPC分类号： H01L21/67253 ,  C23C16/52 ,  G01N21/55 ,  H01L21/67069 ,  H01L22/12

摘要： Methods and systems for monitoring etch or deposition processes using image-based in-situ process monitoring techniques include illuminating a measurement area on a sample disposed in a process chamber. The measurement area is illuminated using an input beam generated remote from the process chamber and transmitted to a first viewing window of the process chamber by a first optical fiber. Portions of the first input beam reflected from the measurement area are transmitted from the first viewing window to an imaging sensor by a second optical fiber. A sequence of images is obtained at the imaging sensor, and a change in reflectance of pixels within each of the images is determined. The etch or deposition process is monitored based on the change in reflectance.

公开(公告)号：US10271416B2

公开(公告)日：2019-04-23

申请号：US13657232

申请日：2012-10-22

申请人： APPLIED MATERIALS, INC.

发明人： Samer Banna ,  Waheb Bishara ,  Ryan Giar ,  Valentin Todorow ,  Dmitry Lubomirsky ,  Kyle R. Tantiwong

IPC分类号： H05H1/46

摘要： A plasma processing apparatus may include a process chamber having an interior processing volume, first, second and third RF coils disposed proximate the process chamber to couple RF energy into the processing volume, wherein the second RF coil disposed coaxially with respect to the first RF coil, and wherein the third RF coil disposed coaxially with respect to the first and second RF coils, at least one ferrite shield disposed proximate to at least one of the first, second or third RF coils, wherein the ferrite shield is configured to locally guide a magnetic field produced by an RF current flow through the first, second or third RF coils toward the process chamber, wherein the plasma processing apparatus is configured to control a phase of each RF current flow through each of the of the first, second or third RF coils.

公开(公告)号：US09312104B2

公开(公告)日：2016-04-12

申请号：US14107137

申请日：2013-12-16

申请人： APPLIED MATERIALS, INC.

发明人： Vladimir Knyazik ,  Samer Banna ,  Kyle R. Tantiwong

IPC分类号： H01Q1/26 ,  H01J37/32

CPC分类号： H01J37/3211

摘要： A low inductance coil antenna for a plasma reactor has plural conductor lobes extending radially from respective RF supply connections.

摘要翻译： 用于等离子体反应器的低电感线圈天线具有从相应的RF电源连接件径向延伸的多个导体凸角。