公开(公告)号：US20200149968A1

公开(公告)日：2020-05-14

申请号：US16741907

申请日：2020-01-14

Applicant: Applied Materials, Inc.

Inventor： Lara HAWRYLCHAK ,  Samuel C. HOWELLS ,  Wolfgang R. ADERHOLD ,  Leonid M. TERTITSKI ,  Michael LIU ,  Dongming IU ,  Norman L. TAM ,  Ji-Dih HU

IPC: G01J5/00 ,  H05B1/02 ,  H01L21/66 ,  G05D23/19 ,  H01L21/324 ,  H01L21/67 ,  H05B3/00 ,  H01L21/687 ,  G01J5/60

Abstract: Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one or more embodiments, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected radiant energy to a back side of a substrate disposed in the process chamber during operation. The process chamber further includes an edge support for supporting the substrate and a cooling member disposed on the chamber bottom. The cooling member is disposed in proximity of the edge support to cool the edge support during low temperature operation in order to improve the temperature uniformity of the substrate.

公开(公告)号：US20170345693A1

公开(公告)日：2017-11-30

申请号：US15675825

申请日：2017-08-14

Applicant: Applied Materials, Inc.

Inventor： Kim VELLORE ,  Dinesh KANAWADE ,  Stephen MOFFATT ,  Aaron MILLER ,  Leonid M. TERTITSKI ,  Norman L. TAM ,  Michael LIU ,  Colin FOX

IPC: H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67115

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.

公开(公告)号：US20180340832A1

公开(公告)日：2018-11-29

申请号：US15663037

申请日：2017-07-28

Applicant: Applied Materials, Inc.

Inventor： Lara HAWRYLCHAK ,  Samuel C. HOWELLS ,  Wolfgang R. ADERHOLD ,  Leonid M. TERTITSKI ,  Michael LIU ,  Dongming IU ,  Norman L. TAM ,  Ji-Dih HU

IPC: G01J5/00 ,  H01L21/324 ,  G05D23/19 ,  H01L21/66 ,  H05B1/02

CPC classification number: G01J5/0007 ,  G01J5/602 ,  G01J2005/0051 ,  G05D23/1931 ,  H01L21/324 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/68735 ,  H01L22/10 ,  H01L22/12 ,  H01L22/20 ,  H05B1/0233 ,  H05B3/0047

Abstract: Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one example, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected radiant energy to a back side of a substrate disposed in the process chamber during operation. The process chamber further includes an edge support for supporting the substrate and a cooling member disposed on the chamber bottom. The cooling member is disposed in proximity of the edge support to cool the edge support during low temperature operation in order to improve the temperature uniformity of the substrate.

公开(公告)号：US20160358789A1

公开(公告)日：2016-12-08

申请号：US15170982

申请日：2016-06-02

Applicant: Applied Materials, Inc.

Inventor： Aaron MILLER ,  Norman L. TAM ,  Michael LIU

IPC: H01L21/324 ,  H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/68792

Abstract: Embodiments of the present disclosure provide a cover assembly that includes a cover having a plurality of ports, and each port has a diameter of less than 1 mm, such as between about 0.1 mm to about 0.9 mm. The cover may be disposed between a device side surface of a substrate and a reflector plate, which are all disposed within a thermal processing chamber. The presence of the cover having the plurality of small ports within the thermal processing chamber will improve thermal uniformity over time after processing doped substrates.

Abstract translation: 本公开的实施例提供一种盖组件，其包括具有多个端口的盖，并且每个端口具有小于1mm的直径，例如在约0.1mm至约0.9mm之间。 盖可以设置在基板的装置侧表面和反射板之间，反射板都设置在热处理室内。 在热处理室内具有多个小端口的盖的存在将改善在处理掺杂的衬底之后随时间的热均匀性。

公开(公告)号：US20150041453A1

公开(公告)日：2015-02-12

申请号：US14456682

申请日：2014-08-11

Applicant: APPLIED MATERIALS, INC.

Inventor： Kim VELLORE ,  Dinesh KANAWADE ,  Stephen MOFFATT ,  Aaron MILLER ,  Leonid M. TERTITSKI ,  Norman L. TAM ,  Michael LIU ,  Colin FOX

IPC: H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67115

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.

Abstract translation: 本公开的实施例一般涉及用于处理室（例如RTP室）中的视觉灯故障检测的方法和装置。 通过使用定位成观察处理室内的灯的广角透镜来促进视觉反馈。 广角镜头位于探头内并用弹簧固定，以承受高温处理。 耦合到透镜的照相机适于捕获处理室内的灯的图像。 然后将捕获的灯的图像与参考图像进行比较，以确定灯是否按需要起作用。

公开(公告)号：US20150155190A1

公开(公告)日：2015-06-04

申请号：US14550781

申请日：2014-11-21

Applicant: Applied Materials, Inc.

Inventor： Aaron MILLER ,  Mehran BEHDJAT ,  Norman L. TAM ,  Michael LIU

IPC: H01L21/67 ,  H01L21/66 ,  H01L21/324

CPC classification number: H01L21/67115 ,  H01L21/67248 ,  H01L21/68792

Abstract: Embodiments of the present disclosure provide a cover assembly that includes a cover disposed between a device side surface of a substrate and a reflector plate, which are disposed within a thermal processing chamber. The presence of the cover between the device side surface of a substrate and a reflector plate has many advantages over conventional thermal processing chamber designs, which include an improved temperature uniformity during processing, a reduced chamber down time and an improved cost-of-ownership of the processes performed in the thermal processing chamber. In some configurations, the cover includes two or more ports that are formed therein and are positioned to deliver a gas, from a space formed between the reflector plate and the cover, to desired regions of the substrate during processing to reduce the temperature variation across the substrate.

Abstract translation: 本公开的实施例提供一种盖组件，其包括设置在基板的装置侧表面和反射板之间的盖，所述盖设置在热处理室内。 衬底的器件侧表面与反射板之间的存在与常规热处理室设计相比具有许多优点，其包括在处理期间改进的温度均匀性，减少的室停机时间和改进的拥有成本 在热处理室中进行的处理。 在一些构造中，盖包括形成在其中的两个或更多个端口，并且被定位成在处理期间将气体从形成在反射板和盖之间的空间传送到基板的期望区域，以减少横跨 基质。