公开(公告)号：US20170345693A1

公开(公告)日：2017-11-30

申请号：US15675825

申请日：2017-08-14

Applicant: Applied Materials, Inc.

Inventor： Kim VELLORE ,  Dinesh KANAWADE ,  Stephen MOFFATT ,  Aaron MILLER ,  Leonid M. TERTITSKI ,  Norman L. TAM ,  Michael LIU ,  Colin FOX

IPC: H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67115

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.

公开(公告)号：US20190115241A1

公开(公告)日：2019-04-18

申请号：US15782650

申请日：2017-10-12

Applicant: APPLIED MATERIALS, INC.

Inventor： Kim VELLORE ,  Douglas A. BUCHBERGER, JR. ,  Niranjan Kumar ,  Seshadri RAMASWAMI

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/673 ,  C23C8/16

Abstract: The present disclosure relates to an electrostatic chuck, including: a base having a dielectric first surface to support a substrate thereon during processing; and an electrode disposed within the base proximate the dielectric first surface to facilitate electrostatically coupling the substrate to the dielectric first surface during use, wherein the dielectric first surface is sufficiently hydrophobic to electrostatically retain the substrate to the dielectric first surface when contacted with water. Methods of making and using the electrostatic chuck under wet conditions are also disclosed.

公开(公告)号：US20150041453A1

公开(公告)日：2015-02-12

申请号：US14456682

申请日：2014-08-11

Applicant: APPLIED MATERIALS, INC.

Inventor： Kim VELLORE ,  Dinesh KANAWADE ,  Stephen MOFFATT ,  Aaron MILLER ,  Leonid M. TERTITSKI ,  Norman L. TAM ,  Michael LIU ,  Colin FOX

IPC: H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67115

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.

Abstract translation: 本公开的实施例一般涉及用于处理室（例如RTP室）中的视觉灯故障检测的方法和装置。 通过使用定位成观察处理室内的灯的广角透镜来促进视觉反馈。 广角镜头位于探头内并用弹簧固定，以承受高温处理。 耦合到透镜的照相机适于捕获处理室内的灯的图像。 然后将捕获的灯的图像与参考图像进行比较，以确定灯是否按需要起作用。

公开(公告)号：US20170040194A1

公开(公告)日：2017-02-09

申请号：US15207226

申请日：2016-07-11

Applicant: Applied Materials, Inc.

Inventor： Jiping LI ,  Aaron Muir HUNTER ,  Bruce E. ADAMS ,  Kim VELLORE ,  Samuel C. HOWELLS ,  Stephen MOFFATT

IPC: H01L21/67 ,  B23K26/0622 ,  B23K26/00 ,  B23K26/03 ,  H01L21/268 ,  H01L21/324

CPC classification number: H01L21/67115 ,  B23K26/009 ,  B23K26/034 ,  B23K26/0622 ,  B23K26/066 ,  B23K26/352 ,  B23K2101/40 ,  H01L21/268 ,  H01L21/324

Abstract: Embodiments described herein relate to apparatus and methods of thermal processing. More specifically, apparatus and methods described herein relate to laser thermal treatment of semiconductor substrates by increasing the uniformity of energy distribution in an image at a surface of a substrate.

Abstract translation: 本文所述的实施例涉及热处理的装置和方法。 更具体地，本文所述的装置和方法涉及通过增加基板表面上的图像中的能量分布的均匀性来对半导体基板进行激光热处理。

公开(公告)号：US20150131698A1

公开(公告)日：2015-05-14

申请号：US14517060

申请日：2014-10-17

Applicant: Applied Materials, Inc.

Inventor： Kim VELLORE ,  Dinesh KANAWADE ,  Leonid M. TERTITSKI ,  Norman L. TAM ,  Aaron Muir HUNTER

IPC: G01J5/50 ,  H05B3/00

CPC classification number: G01J5/505 ,  G01J5/0007 ,  G01J5/0806 ,  G01J2005/0077 ,  G02B13/14 ,  H05B3/0047

Abstract: Embodiments of the present invention generally relate to methods and apparatus for monitoring substrate temperature uniformity in a processing chamber, such as an RTP chamber. Substrate temperature is monitored using an infrared camera coupled to a probe having a wide-angle lens. The wide-angle lens is positioned within the probe and secured using a spring, and is capable of withstanding high temperature processing. The wide angle lens facilities viewing of substantially the entire surface of the substrate in a single image. The image of the substrate can be compared to a reference image to facilitate lamp adjustments, if necessary, to effect uniform heating of the substrate.

Abstract translation: 本发明的实施例一般涉及用于监测诸如RTP室的处理室中的衬底温度均匀性的方法和装置。 使用耦合到具有广角镜头的探针的红外摄像机来监测衬底温度。 广角镜头位于探头内并用弹簧固定，能承受高温处理。 广角镜头设备在单个图像中基本上观察基底的整个表面。 如果需要，可以将衬底的图像与参考图像进行比较，以促进灯调节，以实现衬底的均匀加热。

公开(公告)号：US20140256161A1

公开(公告)日：2014-09-11

申请号：US14159228

申请日：2014-01-20

Applicant: Applied Materials, Inc.

Inventor： Jiping LI ,  Aaron Muir HUNTER ,  Bruce E. ADAMS ,  Kim VELLORE ,  Samuel C. HOWELLS ,  Stephen MOFFATT

IPC: H01L21/268 ,  B23K26/00 ,  H01L21/263

CPC classification number: H01L21/67115 ,  B23K26/009 ,  B23K26/034 ,  B23K26/0622 ,  B23K26/066 ,  B23K26/352 ,  B23K2101/40 ,  H01L21/268 ,  H01L21/324

Abstract: Embodiments described herein relate to apparatus and methods of thermal processing. More specifically, apparatus and methods described herein relate to laser thermal treatment of semiconductor substrates by increasing the uniformity of energy distribution in an image at a surface of a substrate.

Abstract translation: 本文所述的实施例涉及热处理的装置和方法。 更具体地，本文所述的装置和方法涉及通过增加基板表面上的图像中的能量分布的均匀性来对半导体基板进行激光热处理。