公开(公告)号：US20170345693A1

公开(公告)日：2017-11-30

申请号：US15675825

申请日：2017-08-14

Applicant: Applied Materials, Inc.

Inventor： Kim VELLORE ,  Dinesh KANAWADE ,  Stephen MOFFATT ,  Aaron MILLER ,  Leonid M. TERTITSKI ,  Norman L. TAM ,  Michael LIU ,  Colin FOX

IPC: H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67115

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.

公开(公告)号：US20200381278A1

公开(公告)日：2020-12-03

申请号：US16885909

申请日：2020-05-28

Applicant: Applied Materials, Inc.

Inventor： Kim Ramkumar VELLORE ,  Leonid M. TERTITSKI ,  Matthew D. SCOTNEY-CASTLE

IPC: H01L21/67 ,  G01J5/00 ,  H04N5/33

Abstract: A method and apparatus for measuring a temperature of a substrate located in a semiconductor processing environment is disclosed. The substrate has a top surface and an edge surface, and is positioned in a prescribed location within the semiconductor processing environment. An infrared camera oriented to view one side of the edge surface of the substrate is triggered to obtain an infrared image of the one side of the edge surface of the substrate. The infrared image is processed to obtain a temperature profile of the substrate.

公开(公告)号：US20180340832A1

公开(公告)日：2018-11-29

申请号：US15663037

申请日：2017-07-28

Applicant: Applied Materials, Inc.

Inventor： Lara HAWRYLCHAK ,  Samuel C. HOWELLS ,  Wolfgang R. ADERHOLD ,  Leonid M. TERTITSKI ,  Michael LIU ,  Dongming IU ,  Norman L. TAM ,  Ji-Dih HU

IPC: G01J5/00 ,  H01L21/324 ,  G05D23/19 ,  H01L21/66 ,  H05B1/02

CPC classification number: G01J5/0007 ,  G01J5/602 ,  G01J2005/0051 ,  G05D23/1931 ,  H01L21/324 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/68735 ,  H01L22/10 ,  H01L22/12 ,  H01L22/20 ,  H05B1/0233 ,  H05B3/0047

Abstract: Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one example, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected radiant energy to a back side of a substrate disposed in the process chamber during operation. The process chamber further includes an edge support for supporting the substrate and a cooling member disposed on the chamber bottom. The cooling member is disposed in proximity of the edge support to cool the edge support during low temperature operation in order to improve the temperature uniformity of the substrate.

公开(公告)号：US20150041453A1

公开(公告)日：2015-02-12

申请号：US14456682

申请日：2014-08-11

Applicant: APPLIED MATERIALS, INC.

Inventor： Kim VELLORE ,  Dinesh KANAWADE ,  Stephen MOFFATT ,  Aaron MILLER ,  Leonid M. TERTITSKI ,  Norman L. TAM ,  Michael LIU ,  Colin FOX

IPC: H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67115

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.

Abstract translation: 本公开的实施例一般涉及用于处理室（例如RTP室）中的视觉灯故障检测的方法和装置。 通过使用定位成观察处理室内的灯的广角透镜来促进视觉反馈。 广角镜头位于探头内并用弹簧固定，以承受高温处理。 耦合到透镜的照相机适于捕获处理室内的灯的图像。 然后将捕获的灯的图像与参考图像进行比较，以确定灯是否按需要起作用。

公开(公告)号：US20200149968A1

公开(公告)日：2020-05-14

申请号：US16741907

申请日：2020-01-14

Applicant: Applied Materials, Inc.

Inventor： Lara HAWRYLCHAK ,  Samuel C. HOWELLS ,  Wolfgang R. ADERHOLD ,  Leonid M. TERTITSKI ,  Michael LIU ,  Dongming IU ,  Norman L. TAM ,  Ji-Dih HU

IPC: G01J5/00 ,  H05B1/02 ,  H01L21/66 ,  G05D23/19 ,  H01L21/324 ,  H01L21/67 ,  H05B3/00 ,  H01L21/687 ,  G01J5/60

Abstract: Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one or more embodiments, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected radiant energy to a back side of a substrate disposed in the process chamber during operation. The process chamber further includes an edge support for supporting the substrate and a cooling member disposed on the chamber bottom. The cooling member is disposed in proximity of the edge support to cool the edge support during low temperature operation in order to improve the temperature uniformity of the substrate.

公开(公告)号：US20160125589A1

公开(公告)日：2016-05-05

申请号：US14882122

申请日：2015-10-13

Applicant: Applied Materials, Inc.

Inventor： Leonid M. TERTITSKI ,  Schubert S. CHU ,  Shay ASSAF ,  Kim R. VELLORE ,  Zhepeng CONG

IPC: G06T7/00 ,  G06T3/60 ,  H04N5/3745 ,  G06T7/40

CPC classification number: G06T7/0004 ,  G06T2207/10024 ,  G06T2207/30148

Abstract: A method and apparatus for detecting substrate misalignment (i.e., position displacement error) and/or substrate support misalignment. According to certain aspects, a method for detecting a misalignment of an object in a processing system is provided. The method generally includes obtaining a first image of the object, determining first values associated with pixels in at least one region of the first image, calculating at least one of a center of gravity value of the pixels in the at least one region or an average weight of the pixels in the at least one region, and detecting a misalignment of the object based on at least one of the calculated center of gravity or average weight of the pixels in the at least one region.

Abstract translation: 用于检测基板未对准（即，位置偏移误差）和/或基板支撑未对准的方法和装置。 根据某些方面，提供了一种用于检测处理系统中的对象的未对准的方法。 该方法通常包括获得对象的第一图像，确定与第一图像的至少一个区域中的像素相关联的第一值，计算至少一个区域中的像素的重心值或平均值 基于至少一个区域中的像素的计算重心或平均重量中的至少一个来检测对象的未对准。

公开(公告)号：US20150131698A1

公开(公告)日：2015-05-14

申请号：US14517060

申请日：2014-10-17

Applicant: Applied Materials, Inc.

Inventor： Kim VELLORE ,  Dinesh KANAWADE ,  Leonid M. TERTITSKI ,  Norman L. TAM ,  Aaron Muir HUNTER

IPC: G01J5/50 ,  H05B3/00

CPC classification number: G01J5/505 ,  G01J5/0007 ,  G01J5/0806 ,  G01J2005/0077 ,  G02B13/14 ,  H05B3/0047

Abstract: Embodiments of the present invention generally relate to methods and apparatus for monitoring substrate temperature uniformity in a processing chamber, such as an RTP chamber. Substrate temperature is monitored using an infrared camera coupled to a probe having a wide-angle lens. The wide-angle lens is positioned within the probe and secured using a spring, and is capable of withstanding high temperature processing. The wide angle lens facilities viewing of substantially the entire surface of the substrate in a single image. The image of the substrate can be compared to a reference image to facilitate lamp adjustments, if necessary, to effect uniform heating of the substrate.

Abstract translation: 本发明的实施例一般涉及用于监测诸如RTP室的处理室中的衬底温度均匀性的方法和装置。 使用耦合到具有广角镜头的探针的红外摄像机来监测衬底温度。 广角镜头位于探头内并用弹簧固定，能承受高温处理。 广角镜头设备在单个图像中基本上观察基底的整个表面。 如果需要，可以将衬底的图像与参考图像进行比较，以促进灯调节，以实现衬底的均匀加热。