公开(公告)号：US20200343126A1

公开(公告)日：2020-10-29

申请号：US16396181

申请日：2019-04-26

Applicant: Applied Materials, Inc.

Inventor： Brian T. WEST ,  Miroslav GELO ,  Yan ROZENZON ,  Roger M. JOHNSON ,  Mark COVINGTON ,  Soundarrajan JEMBULINGAM ,  Simon Nicholas BINNS ,  Vivek VINIT

IPC: H01L21/687 ,  H02P8/30 ,  H01J37/32 ,  C23C14/34 ,  C23C14/50

Abstract: Implementations described herein provide a pedestal lift assembly for a plasma processing chamber and a method for using the same. The pedestal lift assembly has a platen configured to couple a shaft of a pedestal disposed in the plasma processing chamber. An absolute linear encoder is coupled to a fixed frame wherein the absolute linear encoder is configured to detect incremental movement of the platen. A lift rod is attached to the platen. A motor rotor encoder brake module (MRBEM) is coupled to the fixed frame and moveably coupled to the lift rod, the motor encoder brake module configured to move the lift rod in a first direction and a second direction, wherein the movement of the lift rod results in the platen traveling vertically relative to the fixed frame.

公开(公告)号：US20190096643A1

公开(公告)日：2019-03-28

申请号：US16203353

申请日：2018-11-28

Applicant: Applied Materials, Inc.

Inventor： Simon Nicholas BINNS ,  Brian T. WEST ,  Ronald Vern SCHAUER ,  Roger M. JOHNSON ,  Michael S. COX

IPC: H01J37/34 ,  H01J37/32

Abstract: A process chamber includes a chamber body having a chamber lid assembly disposed thereon, one or more monitoring devices coupled to the chamber lid assembly, and one or more antennas disposed adjacent to the chamber lid assembly that are in communication with the one or more monitoring devices.

公开(公告)号：US20150262798A1

公开(公告)日：2015-09-17

申请号：US14623419

申请日：2015-02-16

Applicant: APPLIED MATERIALS, INC.

Inventor： Simon Nicholas BINNS ,  Brian T. WEST ,  Ronald Vern SCHAUER ,  Roger M. JOHNSON ,  Michael S. COX

IPC: H01J37/34

CPC classification number: H01J37/3476 ,  H01J37/32935 ,  H01J37/3405 ,  H01J37/3414 ,  H01J37/3479

Abstract: A process chamber includes a chamber body having a chamber lid assembly disposed thereon, one or more monitoring devices coupled to the chamber lid assembly, and one or more antennas disposed adjacent to the chamber lid assembly that are in communication with the one or more monitoring devices.

Abstract translation: 处理室包括室主体，其具有设置在其上的室盖组件，耦合到室盖组件的一个或多个监控装置以及与室盖组件相邻设置的一个或多个与该一个或多个监控装置连通的天线 。