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公开(公告)号:US20250137723A1
公开(公告)日:2025-05-01
申请号:US18928413
申请日:2024-10-28
Applicant: ASM IP Holding B.V.
Inventor: Felix Rabinovich , Terry Parde , Gary Urban Keppers , Amin Azimi , Alicia Almeda , Fauhmee Oudeif , Amir Kajbafvala , Arun Murali , Frederick Aryeetey , Alexandros Demos , Nayna Khosla , Caleb Miskin , Hichem M'Saad , Shivaji Peddeti , Steven Reiter
Abstract: A chamber body includes a ceramic weldment having a lower wall, a sidewall, and an upper wall. The sidewall is coupled to the lower wall by a sidewall-to-lower wall weld and the upper wall is coupled to the sidewall by a sidewall-to-upper wall weld. The upper wall has an upper wall plate portion and an upper wall rib portion extending therefrom formed from a singular quartz workpiece using a subtractive manufacturing technique, the upper wall further having a unwelded ribbed region overlying the lower wall. Chamber arrangements, semiconductor processing systems and related methods of making chamber bodies and depositing material layers onto substrates supported within chamber bodies are also described.
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公开(公告)号:US20230203706A1
公开(公告)日:2023-06-29
申请号:US18086734
申请日:2022-12-22
Applicant: ASM IP Holding B.V.
Inventor: Alexandros Demos , Hichem M'Saad , Xing Lin , Caleb Miskin , Shivaji Peddeti , Amir Kajbafvala
CPC classification number: C30B25/14 , C30B25/12 , C30B25/165 , C30B25/186 , C30B29/06 , C30B29/08
Abstract: A reactor system may comprise a first reaction chamber and a second reaction chamber. The first and second reaction chambers may each comprise a reaction space enclosed therein, a susceptor disposed within the reaction space, and a fluid distribution system in fluid communication with the reaction space. The susceptor in each reaction chamber may be configured to support a substrate. The reactor system may further comprise a first reactant source, wherein the first reaction chamber and the second reaction chamber are fluidly coupled to the first reactant source at least partially by a first reactant shared line. The reactor system may be configured to deliver a first reactant from the first reactant source to the first reaction chamber and a second reaction chamber through the first reactant shared line.
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