公开(公告)号：US20220298630A1

公开(公告)日：2022-09-22

申请号：US17835082

申请日：2022-06-08

Applicant: ASM IP Holding B.V.

Inventor： SungHoon Jun ,  HeeChul Jung ,  YonJong Jeon

IPC: C23C16/455 ,  C23C16/50 ,  C23C16/52 ,  C23C16/44

Abstract: Exemplary embodiments of the disclosure provide improved reactor systems, assemblies, and methods for controlling a temperature within the reactor system, such as a temperature of a gas supply unit. Exemplary systems and methods employ an exhaust unit to cause movement of a fluid over a portion of the gas supply unit to better control the temperature of the gas supply unit.

公开(公告)号：US12077857B2

公开(公告)日：2024-09-03

申请号：US18222024

申请日：2023-07-14

Applicant: ASM IP Holding B.V.

Inventor： SungHoon Jun ,  HeeChul Jung ,  YonJong Jeon

IPC: C23C16/40 ,  C23C16/44 ,  C23C16/455 ,  C23C16/50 ,  C23C16/52

CPC classification number: C23C16/455 ,  C23C16/4412 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/52

Abstract: Exemplary embodiments of the disclosure provide improved reactor systems, assemblies, and methods for controlling a temperature within the reactor system, such as a temperature of a gas supply unit. Exemplary systems and methods employ an exhaust unit to cause movement of a fluid over a portion of the gas supply unit to better control the temperature of the gas supply unit.

公开(公告)号：USD922229S1

公开(公告)日：2021-06-15

申请号：US29693892

申请日：2019-06-05

Applicant: ASM IP Holding B.V.

Designer： SungHoon Jun ,  HeeChul Jung ,  YonJong Jeon

公开(公告)号：US20210002762A1

公开(公告)日：2021-01-07

申请号：US16917859

申请日：2020-06-30

Applicant: ASM IP Holding B.V.

Inventor： SungHoon Jun ,  HeeChul Jung ,  YonJong Jeon

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/52 ,  C23C16/50

Abstract: Exemplary embodiments of the disclosure provide improved reactor systems, assemblies, and methods for controlling a temperature within the reactor system, such as a temperature of a gas supply unit. Exemplary systems and methods employ an exhaust unit to cause movement of a fluid over a portion of the gas supply unit to better control the temperature of the gas supply unit.

公开(公告)号：US20230357925A1

公开(公告)日：2023-11-09

申请号：US18222024

申请日：2023-07-14

Applicant: ASM IP Holding B.V.

Inventor： SungHoon Jun ,  HeeChul Jung ,  YonJong Jeon

IPC: C23C16/455 ,  C23C16/50 ,  C23C16/52 ,  C23C16/44

CPC classification number: C23C16/455 ,  C23C16/50 ,  C23C16/52 ,  C23C16/4412 ,  C23C16/45565

Abstract: Exemplary embodiments of the disclosure provide improved reactor systems, assemblies, and methods for controlling a temperature within the reactor system, such as a temperature of a gas supply unit. Exemplary systems and methods employ an exhaust unit to cause movement of a fluid over a portion of the gas supply unit to better control the temperature of the gas supply unit.

公开(公告)号：US11746414B2

公开(公告)日：2023-09-05

申请号：US17835082

申请日：2022-06-08

Applicant: ASM IP Holding B.V.

Inventor： SungHoon Jun ,  HeeChul Jung ,  YonJong Jeon

IPC: C23C16/40 ,  C23C16/455 ,  C23C16/50 ,  C23C16/52 ,  C23C16/44

CPC classification number: C23C16/455 ,  C23C16/4412 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/52

Abstract: Exemplary embodiments of the disclosure provide improved reactor systems, assemblies, and methods for controlling a temperature within the reactor system, such as a temperature of a gas supply unit. Exemplary systems and methods employ an exhaust unit to cause movement of a fluid over a portion of the gas supply unit to better control the temperature of the gas supply unit.

公开(公告)号：US20210319982A1

公开(公告)日：2021-10-14

申请号：US17224779

申请日：2021-04-07

Applicant: ASM IP Holding B.V.

Inventor： JaeHyun Kim ,  DaeYoun Kim ,  JeongHo Lee ,  HyunSoo Jang ,  YonJong Jeon

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/52

Abstract: A substrate processing apparatus capable of preventing power dissipation and achieving high process reproducibility includes a partition and a processing unit below the partition, wherein the processing unit includes a conductive body and at least one conductive protrusion integrally formed with the conductive body.