公开(公告)号：US20230040124A1

公开(公告)日：2023-02-09

申请号：US17787253

申请日：2020-11-27

Applicant: ASML Netherlands B.V.

Inventor： Han-Kwang NIENHUYS ,  Teis Johan COENEN ,  Sander Bas ROOBOL ,  Jeroen COTTAAR ,  Seyed Iman MOSSAVAT ,  Niels GEYPEN ,  Sandy Claudia SCHOLZ ,  Christina Lynn PORTER

IPC: G03F7/20 ,  G03F9/00

Abstract: Disclosed is a method of metrology. The method comprises illuminating a radiation onto a substrate; obtaining measurement data relating to at least one measurement of each of one or more structures on the substrate; using a Fourier-related transform to transform the measurement data into a transformed measurement data; and extracting a feature of the substrate from the transformed measurement data, or eliminating an impact of a nuisance parameter.

公开(公告)号：US20230341325A1

公开(公告)日：2023-10-26

申请号：US18043794

申请日：2021-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Lars LOETGERING ,  Stefan Michiel MICHIEL ,  Christina Lynn PORTER ,  Petrus Wilhelmus SMORENBURG

IPC: G01N21/47 ,  G01N23/20025 ,  G01N23/2055 ,  G03F7/20 ,  G03F7/00

CPC classification number: G01N21/4788 ,  G01N23/20025 ,  G01N23/2055 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70681 ,  G01N2201/021

Abstract: Disclosed is a wavefront sensor for measuring a wavefront of a radiation. The wavefront sensor comprises a mask comprising a pattern located in path of the radiation to interact with the radiation. The radiation impinging on the mask forms a radiation detection pattern on a radiation detector subsequent to the mask, and the pattern of the mask is designed at least partly based on a requirement of the radiation detection pattern.

公开(公告)号：US20240168392A1

公开(公告)日：2024-05-23

申请号：US18277188

申请日：2022-01-12

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Johan REININK ,  Marinus Petrus REIJNDERS ,  Han-Kwang NIENHUYS ,  David O'DWYER ,  Sander Bas ROOBOL ,  Christina Lynn PORTER ,  Stephen EDWARD

IPC: G03F7/00 ,  G21K1/10

CPC classification number: G03F7/706849 ,  G03F7/70233 ,  G03F7/70308 ,  G03F7/70316 ,  G21K1/10

Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.

公开(公告)号：US20220382124A1

公开(公告)日：2022-12-01

申请号：US17769725

申请日：2020-10-07

Applicant: ASML Netherlands B.V.

Inventor： Wenjie JIN ,  Nan LIN ,  Christina Lynn PORTER ,  Petrus Wilhelmus SMORENBURG

IPC: G02F1/35 ,  G02F1/355 ,  G03F7/20

Abstract: Disclosed is an illumination source comprising a gas delivery system comprising a gas nozzle. The gas nozzle comprises an opening in an exit plane of the gas nozzle. The gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region. The illumination source is configured to receive a pump radiation having a propagation direction and to provide the pump radiation in the gas flow. A geometry shape of the gas nozzle is adapted to shape a profile of the gas flow such that gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.