公开(公告)号：US20180088468A1

公开(公告)日：2018-03-29

申请号：US15828523

申请日：2017-12-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus DE SCHIFFART ,  Michael Jozef Mathijs RENKENS ,  Gerard VAN SCHOTHORST ,  Andre Bernardus JEUNINK ,  Gregor Edward VAN BAARS ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN ,  Norbert Erwin Therenzo JANSEN ,  Toon HARDEMAN ,  George Arie Jan DE FOCKERT ,  Johan Frederik DIJKSMAN

IPC: G03F7/20 ,  G03F9/00 ,  B29C43/02 ,  B82Y40/00 ,  B82Y10/00 ,  G03F7/00 ,  B29C43/14 ,  B29C43/04

CPC classification number: G03F7/7035 ,  B29C43/021 ,  B29C43/04 ,  B29C43/14 ,  B29C2043/142 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/70775 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/709 ,  G03F9/7042

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US20230221651A1

公开(公告)日：2023-07-13

申请号：US18124350

申请日：2023-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus DE SCHIFFART ,  Michael Jozef Mathijs RENKENS ,  Gerard VAN SCHOTHORST ,  Andre Bernardus JEUNINK ,  Gregor Edward VAN BAARS ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN ,  Norbert Erwin Therenzo JANSEN ,  Toon HARDEMAN ,  George Arie Jan DE FOCKERT ,  Johan Frederik DIJKSMAN

IPC: G03F7/20 ,  G03F9/00 ,  G03F7/00

CPC classification number: G03F7/7035 ,  G03F7/709 ,  G03F9/7042 ,  G03F7/70825 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/0002

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US20210096468A1

公开(公告)日：2021-04-01

申请号：US17120506

申请日：2020-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus DE SCHIFFART ,  Michael Jozef Mathijs RENKENS ,  Gerard VAN SCHOTHORST ,  Andre Bernardus JEUNINK ,  Gregor Edward VAN BAARS ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN ,  Norbert Erwin Therenzo JANSEN ,  Toon HARDEMAN ,  George Arie Jan DE FOCKERT ,  Johan Frederik DIJKSMAN

IPC: G03F7/20 ,  G03F9/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US20160070181A1

公开(公告)日：2016-03-10

申请号：US14890129

申请日：2014-05-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Petrus Carolus Maria FRISSEN ,  Gerardus Lucien Mathildus JANSEN ,  George Arie Jan DE FOCKERT

IPC: G03F7/20 ,  H01F13/00 ,  H02K41/02 ,  H02K15/03

CPC classification number: G03F7/70758 ,  H01F13/003 ,  H02K15/03 ,  H02K41/02 ,  H02K41/031 ,  H02K2201/18

Abstract: A magnetization tool for post-assembly magnetization of a magnet assembly including a main coil, an end surface of the main coil configured to be positioned substantially parallel to an outer surface of the magnet assembly for magnetizing a magnetic pole of the magnet assembly, the main coil being configured to generate a magnetic field and a shielding arrangement positioned adjacent the main coil in a plane substantially parallel to the end surface of the main coil, whereby the shielding arrangement is configured to generate a shielding magnetic field, whereby a resulting magnetic field of the shielding magnetic field and the magnetic field is substantially only protruding the magnetic pole of the magnet assembly and directly adjacent magnetic poles of the magnet assembly such that the magnetic pole of the magnet assembly and the directly adjacent magnetic poles of the magnetic pole have a substantially opposite polarity.

Abstract translation: 一种用于磁体组件的组装后磁化的磁化工具，其包括主线圈，所述主线圈的端面被配置为基本上平行于所述磁体组件的外表面定位，用于磁化所述磁体组件的磁极，所述主线圈 线圈构造成产生磁场，并且屏蔽装置在与主线圈的端面大致平行的平面中邻近主线圈定位，由此屏蔽装置被配置为产生屏蔽磁场，由此产生所得到的磁场 屏蔽磁场和磁场基本上只突出磁体组件的磁极和磁体组件的直接相邻的磁极，使得磁体组件的磁极和磁极的直接相邻的磁极具有基本上 相反的极性