公开(公告)号：US20180088468A1

公开(公告)日：2018-03-29

申请号：US15828523

申请日：2017-12-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus DE SCHIFFART ,  Michael Jozef Mathijs RENKENS ,  Gerard VAN SCHOTHORST ,  Andre Bernardus JEUNINK ,  Gregor Edward VAN BAARS ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN ,  Norbert Erwin Therenzo JANSEN ,  Toon HARDEMAN ,  George Arie Jan DE FOCKERT ,  Johan Frederik DIJKSMAN

IPC: G03F7/20 ,  G03F9/00 ,  B29C43/02 ,  B82Y40/00 ,  B82Y10/00 ,  G03F7/00 ,  B29C43/14 ,  B29C43/04

CPC classification number: G03F7/7035 ,  B29C43/021 ,  B29C43/04 ,  B29C43/14 ,  B29C2043/142 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/70775 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/709 ,  G03F9/7042

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US20230221651A1

公开(公告)日：2023-07-13

申请号：US18124350

申请日：2023-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus DE SCHIFFART ,  Michael Jozef Mathijs RENKENS ,  Gerard VAN SCHOTHORST ,  Andre Bernardus JEUNINK ,  Gregor Edward VAN BAARS ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN ,  Norbert Erwin Therenzo JANSEN ,  Toon HARDEMAN ,  George Arie Jan DE FOCKERT ,  Johan Frederik DIJKSMAN

IPC: G03F7/20 ,  G03F9/00 ,  G03F7/00

CPC classification number: G03F7/7035 ,  G03F7/709 ,  G03F9/7042 ,  G03F7/70825 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/0002

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US20210096468A1

公开(公告)日：2021-04-01

申请号：US17120506

申请日：2020-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus DE SCHIFFART ,  Michael Jozef Mathijs RENKENS ,  Gerard VAN SCHOTHORST ,  Andre Bernardus JEUNINK ,  Gregor Edward VAN BAARS ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN ,  Norbert Erwin Therenzo JANSEN ,  Toon HARDEMAN ,  George Arie Jan DE FOCKERT ,  Johan Frederik DIJKSMAN

IPC: G03F7/20 ,  G03F9/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.