公开(公告)号：US20180120714A1

公开(公告)日：2018-05-03

申请号：US15569086

申请日：2016-04-19

Applicant: ASML Netherlands B.V.

Inventor： Ferry ZIJP ,  Duygu AKBULUT ,  Peter Danny VAN VOORST ,  Jeroen Johan Maarten VAN DE WIJDEVEN ,  Koos VAN BERKEL

IPC: G03F7/20 ,  G01B11/14 ,  G02B21/00 ,  G02B21/33

CPC classification number: G03F7/70641 ,  G01B11/14 ,  G01N21/956 ,  G02B5/3025 ,  G02B21/0016 ,  G03F7/70308 ,  G03F7/70591 ,  G03F7/70625 ,  G03F7/70633

Abstract: A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.

公开(公告)号：US20240160151A1

公开(公告)日：2024-05-16

申请号：US18280459

申请日：2022-03-04

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N. V.

Inventor： Willem Marie Julia Marcel COENE ,  Vasco Tomas TENNER ,  Hugo Augustinus Joseph CRAMER ,  Arie Jeffrrey DEN BOEF ,  Wouter Dick KOEK ,  Sergei SOKOLOV ,  Jeroen Johan Maarten VAN DE WIJDEVEN ,  Alexander Kenneth RAUB

IPC: G03H1/04 ,  G01N21/95 ,  G02B21/10 ,  G02B21/36 ,  G03H1/00 ,  G03H1/02 ,  G03H1/08

CPC classification number: G03H1/0486 ,  G01N21/9501 ,  G02B21/10 ,  G02B21/365 ,  G03H1/0866 ,  G03H2001/0038 ,  G03H2001/0044 ,  G03H2001/005 ,  G03H2001/0232 ,  G03H2001/0445 ,  G03H2001/0473 ,  G03H2210/62

Abstract: A method of correcting a holographic image, a processing device, a dark field digital holographic microscope, a metrology apparatus and an inspection apparatus. The method includes obtaining a holographic image; determining at least one attenuation function due to motion blur from the holographic image; and correcting the holographic image, or a portion thereof, using the at least one attenuation function.

公开(公告)号：US20220290734A1

公开(公告)日：2022-09-15

申请号：US17633000

申请日：2020-07-09

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Johan Maarten VAN DE WIJDEVEN ,  Johannes VERMEULEN ,  Jeroen Pieter STARREVELD ,  Stan Henricus VAN DER MEULEN

IPC: F16F15/02 ,  F16F13/00 ,  G03F7/20

Abstract: The invention provides a support with first and second end portions. The second end portion is on the side opposite to the first end portion in a longitudinal direction of the support. A coil spring is arranged between the first and second end portions. The coil spring comprises a first spiral member that extends between the first and second end portions in a circumferential direction of the support, and a second spiral member that extends between the first and second end portions in a circumferential direction of the support. The first and second spiral members extend in the longitudinal direction around a longitudinal axis of the support, wherein the first spiral member of the coil spring and the second spiral member of the coil spring are moveable relative to each other, and wherein the support further comprises a damper device that is attached to the first spiral member.

公开(公告)号：US20250004390A1

公开(公告)日：2025-01-02

申请号：US18682038

申请日：2022-07-12

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Johan Maarten VAN DE WIJDEVEN ,  Michaël Johannes Christiaan RONDE ,  Bram Antonius Gerardus LOMANS ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN

IPC: G03F9/00 ,  G03F7/00

Abstract: The invention provides a method for positioning a sensor over a target on a moveable object, comprising the following steps: a. moving the object to move the target to a desired position, b. moving the sensor in a direction towards a measured momentary position of the target, c. when the sensor is over the target. moving the sensor along with the target to the desired position of the target.

公开(公告)号：US20160246189A1

公开(公告)日：2016-08-25

申请号：US15052201

申请日：2016-02-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Koos VAN BERKEL ,  Duygu AKBULUT ,  Jeroen Johan Maarten VAN DE WIJDEVEN ,  Ferry ZIJP

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G01N21/956 ,  G02B21/0016 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7019

Abstract: A method and apparatus for position control of a component relative to a surface is disclosed. The method may include calculating an estimated effect of, or derived from, Casimir force acting between the component and the surface, and compensating positioning of the component relative to the surface using the estimated effect.

Abstract translation: 公开了一种用于相对于表面的部件的位置控制的方法和装置。 该方法可以包括计算在组件和表面之间作用的卡西米力的估计效果或来自其的估计效果，以及使用估计效果来补偿部件相对于表面的定位。