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公开(公告)号：US10962891B2
公开(公告)日：2021-03-30
申请号：US16707525
申请日：2019-12-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Antonius Theodorus Anna Maria Derksen , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US10261428B2
公开(公告)日：2019-04-16
申请号：US15185626
申请日：2016-06-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US10146142B2
公开(公告)日：2018-12-04
申请号：US15419769
申请日：2017-01-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
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公开(公告)号：US09927711B2
公开(公告)日：2018-03-27
申请号：US15105343
申请日：2014-12-02
Applicant: ASML Netherlands B.V.
Inventor： Sven Antoin Johan Hol , Andrea Lodovico Mancuso , Hendricus Johannes Maria Meijer , Erik Maria Rekkers , Marinus Johannes Maria Van Dam
IPC: G03F7/20
CPC classification number: G03F7/70191 , G03F7/70758 , G03F7/70825 , G03F7/70941
Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets (370). A moving part includes a permanent magnet (362) with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. A ferromagnetic shield (820) is provided around the moving part and has at least one interruption (822) to reduce the influence of adjacent actuators or stray fields while also minimizing attraction between the permanent magnet (362) and the shield (820).
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公开(公告)号：US10180629B2
公开(公告)日：2019-01-15
申请号：US15385584
申请日：2016-12-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Johannes Catherinus Hubertus Mulkens , Roelof Aeilko Siebranc Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Erik Theodorus Maria Bijlaart , Christian Alexander Hoogendam , Helmar Van Santen , Marcus Adrianus Van De Kerkhof , Mark Kroon , Arie Jeffrey Den Boef , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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Patent Agency Ranking
公开(公告)号：US09606448B2
公开(公告)日：2017-03-28
申请号：US13903885
申请日：2013-05-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
CPC classification number: G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162
Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
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公开(公告)号：US20170010545A1
公开(公告)日：2017-01-12
申请号：US15185626
申请日：2016-06-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri LOF , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Antonius Theodorus Anna Maria Derksen , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay
IPC: G03F7/20
CPC classification number: G03F7/70858 , G03F7/70341 , G03F7/70716 , G03F7/70775 , G03F7/7085
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Abstract translation: 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号：US09366972B2
公开(公告)日：2016-06-14
申请号：US14701236
申请日：2015-04-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
Abstract translation: 光刻投影装置包括用于保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案来图案化辐射束; 投影系统，用于将图案化的光束投影到基板的目标部分上; 衬底台，其被配置为保持所述衬底，所述衬底台包括支撑表面，以支撑所述投影系统与所述衬底和位于所述衬底台上的物体中的至少一个之间的中间板，并且不与所述衬底台中的至少一个接触 基材和物体; 以及液体供应系统，用于在投影系统和至少一个基板和物体之间的空间中提供待投射光束的液体。
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公开(公告)号：US20150261102A1
公开(公告)日：2015-09-17
申请号：US14701236
申请日：2015-04-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri LOF , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
Abstract translation: 光刻投影装置包括用于保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案来图案化辐射束; 投影系统，用于将图案化的光束投影到基板的目标部分上; 衬底台，其被配置为保持所述衬底，所述衬底台包括支撑表面，以支撑所述投影系统与所述衬底和位于所述衬底台上的物体中的至少一个之间的中间板，并且不与所述衬底台中的至少一个接触 基材和物体; 以及液体供应系统，用于在投影系统和至少一个基板和物体之间的空间中提供待投射光束的液体。
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公开(公告)号：US20190086819A1
公开(公告)日：2019-03-21
申请号：US16197416
申请日：2018-11-21
Applicant: ASML NETHERLANDS B.V
Inventor： Erik Roelof LOOPSTRA , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
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