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公开(公告)号：US20190265596A1
公开(公告)日：2019-08-29
申请号：US16286885
申请日：2019-02-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri LOF , Antonius Theodorus Anna Maria DERKSEN , Christiaan Alexander HOOGENDAM , Aleksey KOLESNYCHENKO , Erik Roelof LOOPSTRA , Theodorus Marinus MODDERMAN , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN
Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
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公开(公告)号：US20180314164A1
公开(公告)日：2018-11-01
申请号：US15523938
申请日：2015-11-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen DEKKERS , Han-Kwang NIENHUYS , Michael Jozef Mathijs RENKENS , Johannes Antonius Gerardus AKKERMANS , Gosse Charles DE VRIES , Erik Roelof LOOPSTRA
CPC classification number: G03F7/70158 , G02B5/1828 , G02B5/1838 , G02B5/1861 , G02B6/29314 , G02B26/004 , G03F7/70266 , G03F7/70308
Abstract: An adjustable diffraction grating includes: an optical element and a distortion mechanism. The optical element has an optical surface to receive an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism includes one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.
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公开(公告)号：US20180259846A1
公开(公告)日：2018-09-13
申请号：US15974661
申请日：2018-05-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrei Mikhailovich YAKUNIN , Vadim Yevgenyevich BANINE , Erik Roelof LOOPSTRA , Harmen Klaas VAN DER SCHOOT , Lucas Henricus Johannes STEVENS , Maarten VAN KAMPEN
IPC: G03F1/64 , G03B27/54 , G02B5/20 , G02B27/00 , C01B32/20 , G03F7/20 , H01B1/24 , H01B1/04 , G21K1/06 , G03F1/24 , G02B5/08 , B82Y40/00 , B82Y10/00 , G03F1/62
CPC classification number: G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
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公开(公告)号：US20180046089A1
公开(公告)日：2018-02-15
申请号：US15790287
申请日：2017-10-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Henrikus Herman Marie COX , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Joeri LOF , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEDLEN , Johannes Catharinus Hubertus MULKENS , Gerardus Petrus Matthijs VAN NUNEN , Klaus SIMON , Bernardus Antonius SLAGHEKKE , Alexander STRAAIJER , Jan-Gerard Cornelis VAN DER TOORN , Martijn HOUKES
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US20170242347A1
公开(公告)日：2017-08-24
申请号：US15448438
申请日：2017-03-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Joeri LOF , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Alexander STRAAIJER , Bob STREEFKERK
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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Patent Agency Ranking
公开(公告)号：US20170184975A1
公开(公告)日：2017-06-29
申请号：US15129360
申请日：2015-03-30
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Johannes Antonius Gerardus AKKERMANS , Leonardus Adrianus Gerardus GRIMMINCK , Erik Roelof LOOPSTRA , Michael Jozef Mathijs RENKENS , Adrian TOMA , Han-Kwang NIENHUYS
CPC classification number: G03F7/70025 , G03F7/70008 , H01F6/04 , H01F7/0273 , H01F7/0278 , H01S3/0903 , H05H7/04 , H05H2007/041
Abstract: An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.
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公开(公告)号：US20150355557A1
公开(公告)日：2015-12-10
申请号：US14762450
申请日：2014-02-20
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Koen CUYPERS , Marcelo Henrique DE ANDRADE OLIVEIRA , Marinus Jan REMIE , Chattarbir SINGH , Laurentius Johannes Adrianus VAN BOKHOVEN , Henricus Anita Jozef Wilhemus VAN DE VEN , José Nilton FONSECA JUNIOR , Frank Johannes Jacobus VAN BOXTEL , Daniel Nathan BURBANK , Erik Roelof LOOPSTRA , Johannes ONVLEE , Mark Josef SCHUSTER , Robertus Nicodemus Jacobus VAN BALLEGOIJ , Christopher Charles WARD , Jan Steven Christiaan WESTERLAKEN
IPC: G03F7/20
CPC classification number: G03F7/70933 , G03F7/70358 , G03F7/70633 , G03F7/70725 , G03F7/70866
Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.
Abstract translation: 公开了一种通过控制光刻设备的图案形成装置周围的气流来减少重叠误差的系统。 光刻设备包括被配置为调节辐射束的照明系统。 光刻设备还包括可移动台，其包括可构造成支撑图案形成装置的支撑结构。 图案形成装置可以被配置为在其横截面中赋予辐射束图案以形成图案化的辐射束。 此外，光刻设备包括位于可移动台（401）和投影系统（208）之间的板（410）。 板包括包括第一侧壁（411a）和第二侧壁（411b）的开口（411）。 板可以被配置为在基本上垂直于照明系统的光轴的可移动台和投影系统之间的区域中提供气流图案（424）。
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公开(公告)号：US20150338748A1
公开(公告)日：2015-11-26
申请号：US14816997
申请日：2015-08-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Joeri LOF , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Alexander STRAAIJER , Bob STREEFKERK
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Abstract translation: 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号：US20200285155A1
公开(公告)日：2020-09-10
申请号：US16881109
申请日：2020-05-22
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF , Anton Bernhard VAN OOSTEN , Hans BUTLER , Erik Roelof LOOPSTRA , Marc Wilhelmus Maria VAN DER WIJST , Koen Jacobus Johannes Maria ZAAL
Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.
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公开(公告)号：US20200057394A1
公开(公告)日：2020-02-20
申请号：US16587483
申请日：2019-09-30
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Matthias KRUIZINGA , Maarten Mathijs Marinus JANSEN , Jorge Manuel AZEREDO LIMA , Erik Willem BOGAART , Derk Servatius Gertruda BROUNS , Marc BRUIJN , Richard Joseph BRULS , Jeroen DEKKERS , Paul JANSSEN , Mohammad Reza KAMALI , Ronald Harm Gunther KRAMER , Robert Gabriël Maria LANSBERGEN , Martinus Hendrikus Antonius LEENDERS , Matthew LIPSON , Erik Roelof LOOPSTRA , Joseph H. LYONS , Stephen ROUX , Gerrit VAN DEN BOSCH , Sander VAN DEN HEIJKANT , Sandra VAN DER GRAAF , Frits VAN DER MEULEN , Jérôme François SylvainVirgile VAN LOO , Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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