公开(公告)号：US20150323872A1

公开(公告)日：2015-11-12

申请号：US14762190

申请日：2013-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Anton Bernhard VAN OOSTEN ,  Hans BUTLER ,  Erik Roelof LOOPSTRA ,  Marc Wilhelmus Maria VAN DER WIJST ,  Koen Jacobus Johannes Maria ZAAL

IPC: G03F7/20 ,  G02B7/182

CPC classification number: G03F7/702 ,  G02B7/182 ,  G02B7/1827 ,  G02B26/0825 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70575 ,  G03F7/709

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

Abstract translation: 公开了一种被配置为将光束投射到光刻设备内的基板的目标部分上的系统。 该系统包括具有用于定位反射镜和/或配置反射镜形状的致动器（500）的反射镜（510），致动器还为反射镜提供主动阻尼，以及用于产生致动器控制的控制器（515a，515b） 用于控制所述致动器的信号。 当定位所述反射镜和/或构造所述反射镜的形状时，第一坐标系用于控制所述致动器，并且当向所述反射镜提供主动阻尼时，使用第二坐标系来控制所述致动器。

公开(公告)号：US20150116676A1

公开(公告)日：2015-04-30

申请号：US14586333

申请日：2014-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Koen Jacobus Johannes Maria ZAAL ,  Joost Jeroen Ottens

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70875

Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.

Abstract translation: 公开了一种具有与衬底台分开形成的盖板的光刻设备，以及通过控制盖板的温度来稳定衬底台的温度的装置。 公开了一种具有绝热性的光刻设备，其设置在盖板和基板台之间，使得盖板用作基板台的热屏蔽。 公开了一种光刻设备，其包括参考衬底台变形来确定衬底台变形并改善衬底的位置控制的装置。

公开(公告)号：US20200285155A1

公开(公告)日：2020-09-10

申请号：US16881109

申请日：2020-05-22

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Anton Bernhard VAN OOSTEN ,  Hans BUTLER ,  Erik Roelof LOOPSTRA ,  Marc Wilhelmus Maria VAN DER WIJST ,  Koen Jacobus Johannes Maria ZAAL

IPC: G03F7/20 ,  G02B7/182 ,  G02B26/08

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.

公开(公告)号：US20130164688A1

公开(公告)日：2013-06-27

申请号：US13686186

申请日：2012-11-27

Applicant: ASML Netherlands B.V.

Inventor： Theodorus Petrus Maria CADEE ,  Koen Jacobus Johannes Maria ZAAL ,  Harmeet SINGH

IPC: G03B27/58 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03B27/58 ,  G03F7/2051 ,  G03F7/707 ,  G03F7/70708 ,  H01L21/683

Abstract: A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.

Abstract translation: 对象（例如半导体衬底）的支撑件包括主体，该主体具有被配置和布置成具有多个突起的表面。 每个突起具有相关联的静电致动器，用于至少沿平行于物体的主表面的平面中的方向相对于主体移动相关联的突起的自由端。

公开(公告)号：US20220197154A1

公开(公告)日：2022-06-23

申请号：US17692859

申请日：2022-03-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Koen Jacobus Johannes Maria ZAAL ,  Joost Jeroen OTTENS

IPC: G03F7/20

Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.

公开(公告)号：US20190196342A1

公开(公告)日：2019-06-27

申请号：US16290299

申请日：2019-03-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Koen Jacobus Johannes Maria ZAAL ,  Joost Jeroen OTTENS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70875

Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.

公开(公告)号：US20160349629A1

公开(公告)日：2016-12-01

申请号：US15237394

申请日：2016-08-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Koen Jacobus Johannes Maria ZAAL ,  Joost Jeroen OTTENS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70875

Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.