公开(公告)号：US20180081278A1

公开(公告)日：2018-03-22

申请号：US15789702

申请日：2017-10-20

申请人： ASML NETHERLANDS B.V.

发明人： Andrey Alexandrovich NIKIPELOV ,  Olav Waldemar Vladimir FRIJNS ,  Gosse Charles DE VRIES ,  Erik Roelof LOOPSTRA ,  Vadim Yevgenyevich BANINE ,  Pieter Willem Herman DE JAGER ,  Rilpho Ludovicus DONKER ,  Han-Kwang NIENHUYS ,  Borgert KRUIZINGA ,  Wouter Joep ENGELEN ,  Otger Jan LUITEN ,  Johannes Antonius Gerardus AKKERMANS ,  Leonardus Adrianus Gerardus GRIMMINCK ,  Vladimir LITVINENKO

IPC分类号： G03F7/20 ,  G01J1/04

CPC分类号： G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

摘要： A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

公开(公告)号：US20180058928A1

公开(公告)日：2018-03-01

申请号：US15549133

申请日：2016-02-02

申请人： ASML NETHERLANDS B.V.

发明人： Vadim Yevgenyevich BANINE ,  Gerrit Jacobus Hendrik BRUSSAARD ,  Willem Jakobus Cornelis KOPPERT ,  Otger Jan LUITEN ,  Han-Kwang NIENHUYS ,  Job BECKERS ,  Ruud Martinus VAN DER HORST

IPC分类号： G01J1/58 ,  G01J1/42 ,  G03F7/20 ,  H01S3/13 ,  G01T1/20

摘要： A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.

公开(公告)号：US20190302625A1

公开(公告)日：2019-10-03

申请号：US16435630

申请日：2019-06-10

申请人： ASML NETHERLANDS B.V.

发明人： Wouter Joep ENGELEN ,  Otger Jan LUITEN ,  Andrey Alexandrovich NIKIPELOV ,  Vadim Yevgenyevich BANINE ,  Pieter Willem Herman DE JAGER ,  Erik Roelof LOOPSTRA

IPC分类号： G03F7/20 ,  H05H7/04 ,  G02B1/06 ,  G01J1/04 ,  G01J1/42 ,  G01J1/26 ,  H01S3/09 ,  G02B5/20 ,  G02B26/02 ,  G21K1/10

摘要： A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

公开(公告)号：US20160147161A1

公开(公告)日：2016-05-26

申请号：US14900110

申请日：2014-06-17

申请人： ASML NETHERLANDS B.V.

发明人： Andrey Alexandrovich NIKIPELOV ,  Olav Waldemar Vladimir FRIJNS ,  Gosse Charles DE VRIES ,  Erik Roelof LOOPSTRA ,  Vadim Yevgenyevich BANINE ,  Pieter Willem Herman DE JAGER ,  Rilpho Ludovicus DONKER ,  Han-Kwang NIENHUYS ,  Borgert KRUIZINGA ,  Wouter Joep ENGELEN ,  Otger Jan LUITEN ,  Johannes Antonius Gerardus AKKERMANS ,  Leonardus Adrianus Gerardus GRIMMINCK ,  Vladimir LITVINENKO

IPC分类号： G03F7/20

CPC分类号： G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

摘要： A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

摘要翻译： 图案化平版印刷基板的方法，其包括使用自由电子激光器产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备。 该方法还包括通过使用基于反馈的控制回路来相对地调节自由电子激光器的调节和调整自由电子激光器的操作来减少递送到光刻基片的EUV辐射的功率波动，以及将可变衰减应用于具有 由自由电子激光器输出，以便进一步控制传送到光刻设备的EUV辐射的功率。