利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

259 条记录 (耗时 0.034 秒)

    LIDAR SYSTEM INCLUDING MULTIFACETED DEFLECTOR
    2.
    发明公开
    LIDAR SYSTEM INCLUDING MULTIFACETED DEFLECTOR 审中-公开

    公开(公告)号：US20240061088A1

    公开(公告)日：2024-02-22

    申请号：US18492998

    申请日：2023-10-24

    申请人： BLACKMORE SENSORS & ANALYTICS, LLC

    发明人： Ryan GALLOWAY ,  Edward ANGUS ,  Zeb BARBER

    IPC分类号： G01S7/481 ,  G01M11/00 ,  G02B1/06 ,  G02B5/09 ,  G02B26/10 ,  G02B26/12

    CPC分类号： G01S7/4817 ,  G01M11/30 ,  G02B1/06 ,  G02B5/09 ,  G02B26/106 ,  G02B26/121

    摘要： A system and method for scanning of coherent LIDAR. The system includes a motor, a laser source configured to generate an optical beam, and a deflector. A first facet of the plurality of facets has a facet normal direction. The deflector is coupled to the motor and is configured to rotate about a rotation axis to deflect the optical beam from the laser source. The laser source is configured to direct the optical beam such that the optical beam is incident on the deflector at a first incident angle in a first plane, wherein the first plane includes the rotation axis, wherein the first incident angle is spaced apart from the facet normal direction for the first facet. A second facet of the plurality of facets includes an optical element configured to deflect the optical beam at the first incident angle into a deflected angle.

    Deformable lens structure for adaptive optics devices
    4.
    发明授权
    Deformable lens structure for adaptive optics devices 有权

    公开(公告)号：US10139529B2

    公开(公告)日：2018-11-27

    申请号：US15114610

    申请日：2015-01-27

    申请人： ADAPTICA S.R.L.

    发明人： Gianlugi Meneghini ,  Stefano Bonora ,  Alessandro Brunelli

    IPC分类号： G02B3/12 ,  G02B1/06 ,  G02B3/14 ,  G02B27/00 ,  G02C7/08

    CPC分类号： G02B3/12 ,  G02B1/06 ,  G02B3/14 ,  G02B27/0068 ,  G02C7/085

    摘要： A deformable lens structure includes: a deformable first layer having a first outer surface adapted to receive an incident light beam, and a first inner surface opposite the first outer surface; at least a first central portion of the first layer being transparent to the light beam; a second layer having a second inner surface facing the first inner surface and a second outer surface opposite the second inner surface, at least a second central portion of the second layer being transparent to the light beam; a shaped spacer element positioned between the first inner surface and the second inner surface, and an inner chamber containing a liquid transparent to the light beam; first and second electrostatic actuators operatively associated with the first layer and second layers and positioned at the first central portion of the first layer and at the second central portion of the second layer, respectively.

    PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
    6.
    发明申请
    PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD 审中-公开

    公开(公告)号：US20180052398A1

    公开(公告)日：2018-02-22

    申请号：US15800807

    申请日：2017-11-01

    申请人： NIKON CORPORATION

    发明人： Yasuhiro OMURA ,  Takaya OKADA ,  Hiroyuki NAGASAKA

    IPC分类号： G03F7/20 ,  G02B17/08 ,  G02B1/06

    CPC分类号： G03F7/70725 ,  G02B1/06 ,  G02B17/08 ,  G02B17/0892 ,  G02B21/33 ,  G03F7/702 ,  G03F7/70225 ,  G03F7/70341

    摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis of a circle corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).

    Projection optical system, exposure apparatus, and exposure method
    8.
    发明授权
    Projection optical system, exposure apparatus, and exposure method 有权

    公开(公告)号：US09360763B2

    公开(公告)日：2016-06-07

    申请号：US14486305

    申请日：2014-09-15

    申请人： NIKON CORPORATION

    发明人： Yasuhiro Omura ,  Takaya Okada ,  Hiroyuki Nagasaka

    IPC分类号： G03B27/42 ,  G03F7/20 ,  G02B1/06 ,  G02B17/08 ,  G02B21/33

    CPC分类号： G03F7/70725 ,  G02B1/06 ,  G02B17/08 ,  G02B17/0892 ,  G02B21/33 ,  G03F7/702 ,  G03F7/70225 ,  G03F7/70341

    摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

    Projection optical system, exposure apparatus, and exposure method
    9.
    发明授权
    Projection optical system, exposure apparatus, and exposure method 有权

    公开(公告)号：US09310696B2

    公开(公告)日：2016-04-12

    申请号：US14486216

    申请日：2014-09-15

    申请人： NIKON CORPORATION

    发明人： Yasuhiro Omura ,  Takaya Okada ,  Hiroyuki Nagasaka

    IPC分类号： G03B27/42 ,  G03F7/20 ,  G02B1/06 ,  G02B17/08 ,  G02B21/33

    CPC分类号： G03F7/70725 ,  G02B1/06 ,  G02B17/08 ,  G02B17/0892 ,  G02B21/33 ,  G03F7/702 ,  G03F7/70225 ,  G03F7/70341

    摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).