公开(公告)号：US20240005463A1

公开(公告)日：2024-01-04

申请号：US18369775

申请日：2023-09-18

Applicant: ASML Netherlands B.V.

Inventor： Shakeeb Bin HASAN ,  Maikel Robert GOOSEN

IPC: G06T5/10 ,  G06T5/50 ,  H01J37/22 ,  H01J37/28

CPC classification number: G06T5/10 ,  G06T5/50 ,  H01J37/222 ,  H01J37/28 ,  G06T2207/10061 ,  G06T2207/20056 ,  G06T2207/20192 ,  G06T2207/30148 ,  H01J2237/223

Abstract: Disclosed herein is a method of reducing a sample charging effect in a scanning electron microscope (SEM) image, the method comprising: obtaining a first SEM image from a first electron beam scan with a parameter being a first quantity; obtaining a second SEM image from a second electron beam scan with the parameter being a second quantity different from the first quantity; and generating a reduced sample charging effect image based on convolution equations comprising a representation of the first SEM image, a representation of the second SEM image, a first point spread function corresponding to the first SEM image and a second point spread function corresponding to the second SEM image.

公开(公告)号：US20230280661A1

公开(公告)日：2023-09-07

申请号：US18016773

申请日：2021-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Shakeeb Bin HASAN ,  Nitish KUMAR

IPC: G03F7/20

CPC classification number: G03F7/7065 ,  G03F7/70125

Abstract: A method for determining deviations in a fabrication process, the method including: providing a sample with a layer having a periodic structure fabricated using the fabrication process and intended to cause a corresponding part of the layer to be fully reflective for light having a wavelength in a wavelength range and having an angle of incidence in an angle range; illuminating the sample with light having a wavelength in the wavelength range and an angle of incidence in the angle range; detecting light reflected and/or scattered from the layer of the sample; and determining deviations in the fabrication process from the detected light.

公开(公告)号：US20230335374A1

公开(公告)日：2023-10-19

申请号：US18019088

申请日：2021-07-27

Applicant: ASML Netherlands B.V.

Inventor： Benoit Herve GAURY ,  Jun JIANG ,  Bruno LA FONTAINE ,  Shakeeb Bin HASAN ,  Kenichi KANAI ,  Jasper Frans Mathijs VAN RENS ,  Cyrus Emil TABERY ,  Long MA ,  Oliver Desmond PATTERSON ,  Jian ZHANG ,  Chih-Yu JEN ,  Yixiang WANG

IPC: H01J37/26 ,  G01N23/2251 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/265 ,  G01N23/2251 ,  H01J37/244 ,  H01J37/228 ,  H01J2237/2482

Abstract: Systems and methods of observing a sample using a charged-particle beam apparatus in voltage contrast mode are disclosed. The charged-particle beam apparatus comprises a charged-particle source, an optical source, a charged-particle detector configured to detect charged particles, and a controller having circuitry configured to apply a first signal to cause the optical source to generate the optical pulse, apply a second signal to the charged-particle detector to detect the second plurality of charged particles, and adjust a time delay between the first and the second signals. In some embodiments, the controller having circuitry may be further configured to acquire a plurality of images of a structure, to determine an electrical characteristic of the structure based on the rate of gray level variation of the plurality of images of the structure, and to simulate, using a model, a physical characteristic of the structure based on the determined electrical characteristic.

公开(公告)号：US20220293389A1

公开(公告)日：2022-09-15

申请号：US17636344

申请日：2020-08-15

Applicant: ASML Netherlands B.V.

Inventor： Thomas Jarik HUISMAN ,  Shakeeb Bin HASAN

IPC: H01J37/22 ,  H01J37/28 ,  G06T5/00

Abstract: Systems and methods for image enhancement are disclosed. A method for enhancing an image may include acquiring a scanning electron microscopy (SEM) image. The method may also include simulating diffused charge associated with a position of the SEM image. The method may further include providing an enhanced SEM image based on the SEM image and the diffused charge.

公开(公告)号：US20230009177A1

公开(公告)日：2023-01-12

申请号：US17782771

申请日：2020-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Shakeeb Bin HASAN ,  Benoit Herve GAURY

IPC: G03F7/20

Abstract: Optically determining whether metallic features in different layers in a structure are in electrical contact with each other. When the metallic features include different metals and/or have different dimensions, which cause one or more resonances in reflected radiation to be detected, the metallic features in the different layers are determined to be in contact or out of contact with each other based on the spectral positions of the one or more resonances. When the metallic features are formed from the same metal and have the same dimensions, the metallic features in the different layers are determined to be in contact with each other responsive to detection of a single resonance associated with the metallic features and out of contact with each other responsive to detection of two or more resonances associated with the metallic features.

公开(公告)号：US20220148842A1

公开(公告)日：2022-05-12

申请号：US17430307

申请日：2020-02-04

Applicant: ASML Netherlands B.V.

Inventor： Shakeeb Bin HASAN ,  Yan REN ,  Maikel Robert GOOSEN ,  Albertus Victor Gerardus MANGNUS ,  Erwin Paul SMAKMAN

IPC: H01J37/04

Abstract: Disclosed among other aspects is a charged particle inspection system including an absorbing component and a programmable charged-particle mirror plate arranged to modify the energy distribution of electrons in a beam and shape the beam to reduce the energy spread of the electrons and aberrations of the beam, with the absorbing component including a set of absorbing structures configured as absorbing structures provided on a transparent conductive layer and a method using such an absorbing component and with the programmable charged-particle mirror plate including a set of pixels configured to generate a customized electric field to shape the beam and using such a programmable charged-particle mirror plate.