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公开(公告)号：US20230154723A1
公开(公告)日：2023-05-18
申请号：US17359365
申请日：2019-12-06
IPC分类号： H01J37/147 , H01J37/145 , H01J37/28 , H01J37/20 , H01J37/09 , G01N23/2251
CPC分类号： H01J37/1478 , H01J37/1474 , H01J37/145 , H01J37/28 , H01J37/20 , H01J37/09 , G01N23/2251 , H01J2237/0455 , H01J2237/2611 , H01J2237/151 , H01J2237/226 , H01J2237/04926 , H01J2237/103 , G01N2223/07 , G01N2223/418 , G01N2223/507
摘要： Embodiments consistent with the disclosure herein include methods and a multi-beam apparatus configured to emit charged-particle beams for imaging a top and side of a structure of a sample, including: a deflector array including a first deflector and configured to receive a first charged-particle beam and a second charged-particle beam; a blocking plate configured to block one of the first charged-particle beam and the second charged-particle beam; and a controller having circuitry and configured to change the configuration of the apparatus to transition between a first mode and a second mode. In the first mode, the deflector array directs the second charged-particle beam to the top of the structure, and the blocking plate blocks the first charged-particle beam. And in the second mode, the first deflector deflects the first charged-particle beam to the side of the structure, and the blocking plate blocks the second charged-particle beam.
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2.发明公开公开(公告)号：US20240339292A1
公开(公告)日：2024-10-10
申请号：US18748758
申请日：2024-06-20
IPC分类号： H01J37/244 , H01J37/10 , H01J37/28
CPC分类号： H01J37/244 , H01J37/10 , H01J37/28
摘要： There is provided a charged particle device for a charged particle inspection apparatus for projecting an array of sub-beams towards a sample, the charged particle device comprising: a charged particle optical element and a detector. The charged particle optical element has an up-beam surface having a plurality of openings to generate an array of sub-beams from a charged particle beam. In the charged particle optical element are defined: sub-beam apertures and monitoring apertures. The sub-beam aperture extend through the charged particle element for paths of the array of sub-beams towards a sample. The monitoring aperture extends through the charged particle element. The detector is in the monitoring aperture. At least part of the detector is down-beam of the up-beam surface. The detector measures a parameter of a portion of the charged particle beam incident on the detector.
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公开(公告)号：US20230324318A1
公开(公告)日：2023-10-12
申请号：US18327847
申请日：2023-06-01
发明人： Yan REN , Erwin SLOT , Albertus Victor, Gerardus MANGNUS , Marijke SCOTUZZI , Erwin Paul SMAKMAN
IPC分类号： G01N23/2251 , H01J37/244 , H01J37/09 , H01J37/12 , H01J37/147
CPC分类号： G01N23/2251 , H01J37/244 , H01J37/09 , H01J37/12 , H01J37/1472 , G01N2223/303 , H01J2237/2448 , H01J2237/0453 , H01J37/20
摘要： A charged-particle tool configured to generate a plurality of sub-beams from a beam of charged particles and direct the sub-beams downbeam toward a sample position, the tool charged-particle tool comprising at least three charged-particle-optical components; a detector module; and a controller. Thea detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode. The charged-particle-optical components include: a charged-particle source configured to emit a beam of charged particles and a beam generator configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.
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公开(公告)号：US20230154722A1
公开(公告)日：2023-05-18
申请号：US17361119
申请日：2019-12-17
发明人： Arno Jan BLEEKER , Pieter Willem Herman DE JAGER , Maikel Robert GOOSEN , Erwin Paul SMAKMAN , Albertus Victor Gerardus MANGNUS , Yan REN , Adam LASSISE
IPC分类号： H01J37/147 , H01J37/244 , H01J37/26 , H01J37/28
CPC分类号： H01J37/1474 , H01J37/244 , H01J37/265 , H01J37/28 , H01J2237/2817 , H01J2237/2448 , H01J2237/24475
摘要： Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.
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5.发明公开公开(公告)号：US20240331968A1
公开(公告)日：2024-10-03
申请号：US18742934
申请日：2024-06-13
IPC分类号： H01J37/147 , H01J37/09 , H01J37/10 , H01J37/244 , H01J37/28
CPC分类号： H01J37/1471 , H01J37/09 , H01J37/10 , H01J37/244 , H01J37/28 , H01J2237/0453 , H01J2237/24578
摘要： A charged-particle apparatus generates a plurality of sub-beams from a source beam of charged particles and direct the sub-beams downbeam toward a sample position. The charged-particle apparatus comprises a charged particle source, an aperture array, and a charged particle optical component. The charged-particle source comprises an emitter to emit a source beam of charged particles along a divergent path. The aperture array is positioned in the divergent path so the aperture array generates sub-beams from the source beam. The charged-particle-optical component acts on the source beam upbeam of the aperture array. The charged-particle-optical component comprises a multipole and/or a charged-particle lens. The multipole operates on the source beam to vary the position of the divergent path at the aperture array. The multipole may vary a cross-sectional shape of the divergent path at the aperture array. The charged-particle-optical lens compensates for variations in distance between the emitter and the aperture array.
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公开(公告)号：US20220068587A1
公开(公告)日：2022-03-03
申请号：US17418749
申请日：2019-11-26
发明人： Yan REN
摘要： Systems and methods of observing a sample in a multi-beam apparatus are disclosed. The multi-beam apparatus may include an electron source configured to generate a primary electron beam, a pre-current limiting aperture array comprising a plurality of apertures and configured to form a plurality of beamlets from the primary electron beam, each of the plurality of beamlets having an associated beam current, a condenser lens configured to collimate each of the plurality of beamlets, a beam-limiting unit configured to modify the associated beam current of each of the plurality of beamlets, and a sector magnet unit configured to direct each of the plurality of beamlets to form a crossover within or at least near an objective lens that is configured to focus each of the plurality of beamlets onto a surface of the sample and to form a plurality of probe spots thereon.
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公开(公告)号：US20240339294A1
公开(公告)日：2024-10-10
申请号：US18743011
申请日：2024-06-13
发明人： Marijke SCOTUZZI , Albertus Victor Gerardus MANGNUS , Yan REN , Erwin Paul SMAKMAN , Jurgen VAN SOEST
IPC分类号： H01J37/317 , H01J37/147 , H01J37/22 , H01J37/244 , H01J37/28
CPC分类号： H01J37/3177 , H01J37/1474 , H01J37/226 , H01J37/244 , H01J37/28
摘要： A charged-particle optical apparatus configured to project a multi-beam of charged particles, the apparatus comprising: a charged particle device switchable between (i) an operational configuration in which the device is configured to project the multi-beam to a sample along an operational beam path extending from a source of the multi-beam to the sample and (ii) a monitoring configuration in which the device is configured to project the multi-beam to a detector along a monitoring beam path extending from the source to the detector; wherein the monitoring beam path diverts from the inspection beam path part way along the operational beam path.
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公开(公告)号：US20230048580A1
公开(公告)日：2023-02-16
申请号：US17790097
申请日：2021-01-04
IPC分类号： H01J37/153
摘要： An apparatus comprising a set of pixels configured to shape a beamlet approaching the set of pixels and a set of pixel control members respectively associated with each of the set of pixels, each pixel control member being arranged and configured to apply a signal to the associated pixel for shaping the beamlet.
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公开(公告)号：US20230028084A1
公开(公告)日：2023-01-26
申请号：US17785886
申请日：2020-12-16
发明人： Yan REN
IPC分类号： H01J37/153
摘要： A method of reducing aberration comprises separating charged particles of a beam based on energy of the charged particles to form beamlets, each of the beamlets configured to include charged particles at a central energy level; and deflecting the beamlets so that beamlets having different central energy levels are deflected differently. An aberration corrector comprises a dispersive element configured to cause constituent parts of a beam (e.g. a charged particle beam) to spread apart based on energy; an aperture array configured to form beamlets from the spread apart beam; and a deflector array configured to deflect the beamlets differently based on central energy levels of particles that form the beamlets.
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公开(公告)号：US20220148842A1
公开(公告)日：2022-05-12
申请号：US17430307
申请日：2020-02-04
发明人： Shakeeb Bin HASAN , Yan REN , Maikel Robert GOOSEN , Albertus Victor Gerardus MANGNUS , Erwin Paul SMAKMAN
IPC分类号： H01J37/04
摘要： Disclosed among other aspects is a charged particle inspection system including an absorbing component and a programmable charged-particle mirror plate arranged to modify the energy distribution of electrons in a beam and shape the beam to reduce the energy spread of the electrons and aberrations of the beam, with the absorbing component including a set of absorbing structures configured as absorbing structures provided on a transparent conductive layer and a method using such an absorbing component and with the programmable charged-particle mirror plate including a set of pixels configured to generate a customized electric field to shape the beam and using such a programmable charged-particle mirror plate.
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