公开(公告)号：US20200348244A1

公开(公告)日：2020-11-05

申请号：US16963905

申请日：2019-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitish KUMAR ,  Richard QUINTANILHA ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Konstantin TSIGUTKIN ,  Willem Marie Julia Marcel COENE

IPC: G01N21/956 ,  G02F1/35 ,  G03F1/84

Abstract: A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.

公开(公告)号：US20190212660A1

公开(公告)日：2019-07-11

申请号：US16331547

申请日：2017-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitish KUMAR ,  Adrianus Johannes Hendrikus SCHELLEKENS ,  Sietse Thijmen VAN DER POST ,  Ferry ZIJP ,  Willem Maria Julia Marcel COENE ,  Peter Danny VAN VOORST ,  Duygu AKBULUT ,  Sarathi ROY

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70341 ,  G03F7/70516 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70941

Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.

公开(公告)号：US20230280661A1

公开(公告)日：2023-09-07

申请号：US18016773

申请日：2021-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Shakeeb Bin HASAN ,  Nitish KUMAR

IPC: G03F7/20

CPC classification number: G03F7/7065 ,  G03F7/70125

Abstract: A method for determining deviations in a fabrication process, the method including: providing a sample with a layer having a periodic structure fabricated using the fabrication process and intended to cause a corresponding part of the layer to be fully reflective for light having a wavelength in a wavelength range and having an angle of incidence in an angle range; illuminating the sample with light having a wavelength in the wavelength range and an angle of incidence in the angle range; detecting light reflected and/or scattered from the layer of the sample; and determining deviations in the fabrication process from the detected light.

公开(公告)号：US20230229094A1

公开(公告)日：2023-07-20

申请号：US18151334

申请日：2023-01-06

Applicant: ASML Netherlands B.V.

Inventor： Simon Reinald HUISMAN ,  Arjan Johannes Anton BEUKMAN ,  Arie Jeffrey DEN BOEF ,  Sebastianus Adrianus GOORDEN ,  Nitish KUMAR ,  Jin LIAN ,  Zili ZHOU

IPC: G03F9/00 ,  G02B27/28 ,  G02B26/08 ,  G03F7/20

CPC classification number: G03F9/7065 ,  G02B26/0833 ,  G02B27/283 ,  G03F7/70575 ,  G03F7/70616

Abstract: Disclosed is an illumination arrangement for spectrally shaping a broadband illumination beam to obtain a spectrally shaped illumination beam. The illumination arrangement comprises a beam dispersing element for dispersing the broadband illumination beam and a spatial light modulator for spatially modulating the broadband illumination beam subsequent to being dispersed. The illumination arrangement further comprises at least one of a beam expanding element for expanding said broadband illumination beam in at least one direction, located between an input of the illumination arrangement and the spatial light modulator; and a lens array, each lens of which for directing a respective wavelength band of the broadband illumination beam subsequent to being dispersed onto a respective region of the spatial light modulator.

公开(公告)号：US20230296533A1

公开(公告)日：2023-09-21

申请号：US18200947

申请日：2023-05-23

Applicant: ASML Netherlands B.V.

Inventor： Nitish KUMAR ,  Richard Quintanilha ,  Markus Gerardus Martinus Maria Van Kraaij ,  Konstantin Tsigutkin ,  Willem Marie Julia Marcel Coene

IPC: G01N21/956 ,  G02F1/35 ,  G03F1/84

CPC classification number: G01N21/956 ,  G02F1/353 ,  G03F1/84 ,  G01N2021/95676 ,  G01N2201/06113

Abstract: A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.

公开(公告)号：US20190302570A1

公开(公告)日：2019-10-03

申请号：US16307376

申请日：2017-06-01

Applicant: ASML Netherlands B.V.

Inventor： Nitish KUMAR ,  Simon Reinald HUISMAN

IPC: G02F1/365 ,  H01S3/067

Abstract: A supercontinuum radiation source for an alignment mark measurement system comprises: a radiation source; illumination optics; a plurality of waveguides; and collection optics. The radiation source is operable to produce a pulsed radiation beam. The illumination optics is arranged to receive the pulsed pump radiation beam and to form a plurality of pulsed sub-beams, each pulsed sub-beam comprising a portion of the pulsed radiation beam. Each of the plurality of waveguides is arranged to receive at least one of the plurality of pulsed sub-beams beam and to broaden a spectrum of that pulsed sub-beam so as to generate a supercontinuum sub-beam. The collection optics is arranged to receive the supercontinuum sub-beam from each of the plurality of waveguides and to combine them so as to form a supercontinuum radiation beam.