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公开(公告)号:US20190011838A1
公开(公告)日:2019-01-10
申请号:US16068211
申请日:2016-12-07
发明人: Hans BUTLER , Cornelius Adrianus Lambertus DE HOON , Fransiscus Mathijs JACOBS , Pavel KAGAN , Jeroen Pieter STARREVELD , Maurice Willem Jozef Etiënne WIJCKMANS
IPC分类号: G03F7/20
摘要: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.
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公开(公告)号:US20180059555A1
公开(公告)日:2018-03-01
申请号:US15558552
申请日:2016-02-22
发明人: Jan Steven Christiaan WESTERLAKEN , Marcel Koenraad Marie BAGGEN , Fransiscus Mathijs JACOBS , Jeroen Arnoldus Leonardus Johannes RAAYMAKERS , Frank Pieter Albert VAN DEN BERKMORTEL , Marc Wilhelmus Maria VAN DER WIJST
CPC分类号: G03F7/70775 , G03F7/70633 , G03F7/70641 , G03F7/7085 , G03F7/70858 , G03F7/709 , G03F9/70 , G03F9/7046
摘要: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.
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