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1.
公开(公告)号:US20240055219A1
公开(公告)日:2024-02-15
申请号:US18269269
申请日:2021-11-29
Applicant: ASML Netherlands B.V.
Inventor: Mans Johan Bertil OSTERBERG , Kenichi KANAI
IPC: H01J37/147 , H01J37/05 , H01J37/153 , H01J37/28 , H01J37/24
CPC classification number: H01J37/1472 , H01J37/05 , H01J37/153 , H01J37/28 , H01J37/24 , H01J2237/1508
Abstract: Apparatus and methods for directing a beam of primary electrons along a primary beam path onto a sample are disclosed. In one arrangement, a beam separator diverts away from the primary beam path a beam of secondary electrons emitted from the sample along the primary beam path. A dispersion device is upbeam from the beam separator. The dispersion device compensates for dispersion induced in the primary beam by the beam separator. One or more common power supplies drive both the beam separator and the dispersion device.
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公开(公告)号:US20240242921A1
公开(公告)日:2024-07-18
申请号:US18618957
申请日:2024-03-27
Applicant: ASML Netherlands B.V.
Inventor: Mans Johan Bertil OSTERBERG , Koen SCHUURBIERS
IPC: H01J37/147
CPC classification number: H01J37/1474 , H01J2237/0268 , H01J2237/0453 , H01J2237/04735 , H01J2237/04756 , H01J2237/04926 , H01J2237/1534 , H01J2237/2801
Abstract: A charged particle apparatus configured to project a multi-beam of charged particles along a multi-beam path toward a sample, the charged particle apparatus comprising: a charged particle source configured to emit a charged particle beam toward a sample; a charged particle-optical device configured to project sub-beams of a multi-beam of charged particles along the multi-beam path toward the sample, the sub-beams of the multi-beam of charged particles derived from the charged particle beam; a tube surrounding the multi-beam path configured to operate at a first potential difference from a ground potential; and a support configured to support the sample at a second potential difference from the ground potential, the first potential difference and the second potential difference having a difference so as to accelerate the multi-beam of charged particles towards the sample; wherein the first potential difference is greater than the second potential difference.
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