公开(公告)号：US20200264522A1

公开(公告)日：2020-08-20

申请号：US16645672

申请日：2018-08-03

Applicant: ASML Netherlands B.V.

Inventor： Laurentius Cornelius DE WINTER ,  Roland Pieter STOLK ,  Frank STAALS ,  Anton Bernhard VAN OOSTEN ,  Paul Christiaan HINNEN ,  Marinus JOCHEMSEN ,  Thomas THEEUWES ,  Eelco VAN SETTEN

IPC: G03F7/20 ,  G21K1/06

Abstract: Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus-dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom.

公开(公告)号：US20160070179A1

公开(公告)日：2016-03-10

申请号：US14787738

申请日：2014-04-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Wilhelmus Patrick Elisabeth Maria OP 'T ROOT ,  Adrianus Leonardus Gertrudus BOMMER ,  Robert DE JONG ,  Frank EVERTS ,  Herman Philip GODFRIED ,  Roland Pieter STOLK ,  Paul VAN DER VEEN

IPC: G03F7/20

CPC classification number: G03F7/70558 ,  G03F7/70025 ,  G03F7/70516 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/225

Abstract: A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.

Abstract translation: 选择要施加到辐射源的变量的周期性调制的方法，其中所述源传送用于投影到衬底上的辐射，并且其中以扫描速度存在所述衬底和所述辐射之间的相对运动，所述方法包括： 一组系统参数和用于基板上的位置的计算量，所述数量是对从应用于源的变量的调制产生的递送到位置的能量剂量的贡献的度量的量，其中贡献 能量剂量被计算为卷积：辐射曲线和对源发射的辐射的辐照度的贡献; 并且选择用于所述一组系统参数的量和所述基板上的位置的所述调制频率满足一定的标准。