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公开(公告)号：US6166543A
公开(公告)日：2000-12-26
申请号：US936892
申请日：1997-09-25
CPC分类号： G01V3/32 , G01N24/081
摘要： The present invention relates generally to an apparatus and method for measuring nuclear magnetic resonance properties of an earth formation traversed by a borehole by generating gradient-echoes. The measurement can be made while drilling or using a wireline tool. The apparatus applies a static magnetic field, B.sub.a, in a volume of the formation which polarizes the nuclei of hydrogenous connate fluids within the formation. The apparatus applies a second magnetic field, B.sub.b, in a volume of the formation. The magnetic fields B.sub.a and B.sub.b are substantially orthogonal in the volume of the formation. A change in the polarity of the magnetic field, B.sub.b, reverses the direction of precession of the nuclei thereby generating a train of gradient-echoes. Each gradient-echo signal is transformed into the frequency domain and the signal frequency is mapped to a radial position in the volume of the formation in order to generate an image of the formation. Various properties of the formation, such as the effective diffusion coefficient of the formation fluid, longitudinal relaxation time, spin--spin relaxation time, and porosity can be estimated from the train of gradient-echoes.
摘要翻译： 本发明一般涉及通过产生梯度回波来测量由钻孔穿过的地层的核磁共振特性的装置和方法。 可以在钻孔或使用有线工具时进行测量。 该装置在地层的体积中施加静磁场Ba，其使地层内的含氢原生液体的核极化。 该装置在地层的体积中施加第二磁场Bb。 磁场Ba和Bb在地层的体积中基本正交。 磁场极性的变化Bb反转核的进动方向，从而产生一系列梯度回波。 每个梯度回波信号被变换成频域，并且信号频率被映射到地层体积中的径向位置，以便产生地层的图像。 可以从梯度回波序列估计地层的各种性质，例如地层流体的有效扩散系数，纵向松弛时间，自旋 - 自旋弛豫时间和孔隙度。
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公开(公告)号：US06781371B2
公开(公告)日：2004-08-24
申请号：US10064994
申请日：2002-09-06
申请人： Reza Taherian , Boqin Sun , Abdurrahman Sezginer
发明人： Reza Taherian , Boqin Sun , Abdurrahman Sezginer
IPC分类号： G01V300
CPC分类号： G01N24/081 , G01V3/32
摘要： A high vertical resolution antenna design is provided for use in an NMR measurement apparatus. Multiple coils are situated along the length of a magnet. A primary coil is energized to cause an oscillating magnetic field in a portion of earth formation surrounding a borehole. A secondary coil having smaller dimensions than the primary coil is operated to receive spin echoes from a depth of investigation associated with the secondary coil. A distance sufficient to minimize electrical coupling separates the coils. The separation distance can be reduced by selecting a secondary coil with orthogonal polarization to the primary coil. Alternatively, a cross coil configuration can be implemented where the orthogonal secondary coil at least partially overlaps the primary coil, thereby reducing the overall length necessary for the polarizing magnet.
摘要翻译： 提供了用于NMR测量装置的高垂直分辨率天线设计。 多个线圈沿着磁体的长度设置。 初级线圈被通电以在围绕钻孔的地层的一部分中产生振荡磁场。 操作具有小于初级线圈的尺寸的次级线圈以从与次级线圈相关联的调查深度接收自旋回波。 足以使电耦合最小化的距离分离线圈。 可以通过选择具有与初级线圈的正交极化的次级线圈来减小间隔距离。 或者，可以实现交叉线圈配置，其中正交次级线圈至少部分地与初级线圈重叠，从而减小极化磁体所需的总长度。
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公开(公告)号：US06522137B1
公开(公告)日：2003-02-18
申请号：US09605805
申请日：2000-06-28
IPC分类号： G01V300
CPC分类号： G01V3/32 , G01N24/081
摘要： A downhole NMR measurement apparatus for use in a borehole includes at least one magnet, at least one RF transmission coil, at least one gradient coil and circuitry. The magnet(s) establish a magnetic field in a region of a formation that at least partially surrounds the measurement apparatus. The RF transmission coils(s) transmit RF pulses pursuant to an NMR pulse sequence into the region to, in combination with the magnetic field, induce the generation of spin echo signals from a resonance volume within the region. The gradient coil(s) establish a pulsed gradient field in the resonance volume, and the circuitry is coupled to the gradient coil(s) to control the generation of the pulsed gradient field to phase encode the spin echo signals for purposes of high resolution imaging of the formation.
摘要翻译： 用于钻孔的井下NMR测量装置包括至少一个磁体，至少一个RF传输线圈，至少一个梯度线圈和电路。 磁体在至少部分地围绕测量装置的地层区域中建立磁场。 RF传输线圈根据NMR脉冲序列将RF脉冲发送到与该磁场相结合的区域中，从该区域内的共振体积引起自旋回波信号的产生。 梯度线圈在谐振体积中建立脉冲梯度场，并且电路耦合到梯度线圈以控制脉冲梯度场的产生以对自旋回波信号进行相位编码，以用于高分辨率成像 的形成。
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4.发明授权Method, system, and program product for routing an integrated circuit to be manufactured by sidewall-image transfer 有权用于路由要通过侧壁图像传送制造的集成电路的方法，系统和程序产品公开(公告)号：US08549458B2
公开(公告)日：2013-10-01
申请号：US12614911
申请日：2009-11-09
申请人： Abdurrahman Sezginer
发明人： Abdurrahman Sezginer
IPC分类号： G06F17/50
CPC分类号： G06F17/5077 , G06F2217/12 , Y02P90/265
摘要： Disclosed is a method, apparatus, and program product for routing an electronic design using sidewall image transfer that is correct by construction. The layout is routed by construction to allow successful manufacturing with sidewall image transfer, since the router will not allow a routing configuration in the layout that cannot be successfully manufactured with a two-mask sidewall image transfer. A layout is produced that can be manufactured by a two-mask sidewall image transfer method. In one approach, interconnections can be in arbitrary directions. In another approach, interconnections follow grid lines in x and y-directions.
摘要翻译： 公开了一种使用通过构造正确的侧壁图像传送来路由电子设计的方法，装置和程序产品。 布局通过结构进行路由，以允许成功制造侧壁图像传输，因为路由器将不允许布局中的路由配置不能用双掩模侧壁图像传输成功制造。 产生可以通过双掩模侧壁图像转印方法制造的布局。 在一种方法中，互连可以是任意方向。 在另一种方法中，互连遵循x和y方向的网格线。
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5.发明授权公开(公告)号：US07743358B2
公开(公告)日：2010-06-22
申请号：US11203498
申请日：2005-08-13
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： An apparatus and method for modifying a mask data set includes calculating a derivative of a figure-of-merit, indicative of a data set defined by a plurality of polygon edges and then segmenting polygon edges in response to said step of calculating.
摘要翻译： 用于修改掩模数据集的装置和方法包括计算表示由多个多边形边界定义的数据集的品质因数的导数，然后响应于所述计算步骤来分割多边形边缘。
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公开(公告)号：US07480891B2
公开(公告)日：2009-01-20
申请号：US11203505
申请日：2005-08-13
申请人： Abdurrahman Sezginer
发明人： Abdurrahman Sezginer
IPC分类号： G06F17/50
摘要： An apparatus and method for improving image quality in a photolithographic process includes calculating a figure-of-demerit for a photolithographic mask function and then adjusting said photolithographic mask function to reduce the figure of demerit.
摘要翻译： 用于改善光刻工艺中的图像质量的装置和方法包括计算光刻掩模功能的缺点，然后调整所述光刻掩模功能以减少刻痕图。
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公开(公告)号：US07277165B2
公开(公告)日：2007-10-02
申请号：US10860853
申请日：2004-06-04
申请人： Bo Wu , Abdurrahman Sezginer
发明人： Bo Wu , Abdurrahman Sezginer
IPC分类号： G01N21/00
CPC分类号： G03F7/70941 , G03F1/44 , G03F7/70591
摘要： A method of measuring flare in an optical lithographic system utilizes an exposure mask with first and second discrete opaque features each having rotational symmetry of order greater than four and of different respective areas. The exposure mask is positioned in the lithographic system such that actinic radiation emitted by the lithographic system illuminates the sensitive surface of an exposure target through the exposure mask. The extent to which regions of the sensitive surface that are within the geometric image of a feature of the exposure mask are exposed to actinic radiation during due to flare is measured.
摘要翻译： 一种在光学平版印刷系统中测量光斑的方法利用具有第一和第二离散不透明特征的曝光掩模，每个不透明特征具有大于四的旋转对称性以及不同的相应区域。 曝光掩模位于光刻系统中，使得由光刻系统发射的光化辐射通过曝光掩模照射曝光目标的敏感表面。 测量在曝光掩模的特征的几何图像内的敏感表面的区域在由于耀斑期间暴露于光化辐射的程度。
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8.发明授权Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processes 有权用于设计可制造图案的方法和系统，其描述了图案化工艺的图案和位置依赖性质公开(公告)号：US07266800B2
公开(公告)日：2007-09-04
申请号：US10861170
申请日：2004-06-04
申请人： Abdurrahman Sezginer
发明人： Abdurrahman Sezginer
IPC分类号： G06F17/50
CPC分类号： G03F7/70433 , G03F7/70425 , G03F7/705 , G06F17/50 , G06F2217/12 , Y02P90/265
摘要： Computational models of a patterning process are described. Any one of these computational models can be implemented as computer-readable program code embodied in computer-readable media. The embodiments described herein explain techniques that can be used to adjust parameters of these models according to measurements, as well as how predictions made from these models can be used to correct lithography data. Corrected lithography data can be used to manufacture a device, such as an integrated circuit.
摘要翻译： 描述了图案化过程的计算模型。 这些计算模型中的任何一个可以被实现为体现在计算机可读介质中的计算机可读程序代码。 这里描述的实施例解释了可以用于根据测量来调整这些模型的参数的技术，以及如何使用这些模型做出的预测来校正光刻数据。 校正的光刻数据可用于制造诸如集成电路的器件。
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9.发明授权Method for correcting position-dependent distortions in patterning of integrated circuits 有权用于校正集成电路图案化中的位置相关失真的方法公开(公告)号：US07246343B2
公开(公告)日：2007-07-17
申请号：US10933192
申请日：2004-09-01
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A method and system for reducing the computation time required to apply position-dependent corrections to lithography, usually mask, data is disclosed. Optical proximity or process corrections are determined for a few instances of a repeating cluster or object, usually at widely separated locations and then interpolating the corrections to the other instances of the repeating cluster based on their positions in the exposure field. Or, optical proximity corrections can be applied to the repeating cluster of objects for different values of flare intensity, or another parameter of patterning imperfection, such as by calculating the value of the flare at the location of each instance of the repeating cluster, and interpolating the optical proximity corrections to those values of flare.
摘要翻译： 公开了一种用于减少对光刻应用位置相关校正所需的计算时间的方法和系统，通常是屏蔽数据。 通常在广泛分离的位置处对重复的簇或对象的几个实例确定光学邻近度或过程校正，然后基于它们在曝光区域中的位置将校正内插到重复簇的其他实例。 或者，可以将光学邻近校正应用于不同的闪光强度值的对象的重复簇或者图案化缺陷的另一参数，例如通过计算重复簇的每个实例的位置处的闪光的值，以及内插 光学接近度校正到这些闪光值。
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10.发明授权Diffracting, aperiodic targets for overlay metrology and method to detect gross overlay 有权用于覆盖计量的衍射，非周期性目标和检测总重叠的方法公开(公告)号：US07230704B2
公开(公告)日：2007-06-12
申请号：US10858691
申请日：2004-06-02
IPC分类号： G01B11/00
CPC分类号： G03F7/70633 , G01N21/4788
摘要： A method for measuring overlay in semiconductor wafers includes a calibration phase in which a series of calibration samples are analyzed. Each calibration sample has an overlay that is known to be less than a predetermined limit. A difference spectrum for a pair of reflectively symmetric overlay targets is obtained for each calibration sample. The difference spectra are then combined to define a gross overlay indicator. In subsequent measurements of actual wafers, difference spectra are compared to the overlay indicator to detect cases of gross overlay.
摘要翻译： 用于测量半导体晶片中覆盖层的方法包括其中分析一系列校准样本的校准阶段。 每个校准样品具有已知小于预定极限的覆盖层。 对于每个校准样品，获得一对反射对称覆盖目标的差分谱。 然后组合差分谱以定义总重叠指示符。 在随后的实际晶片测量中，将差分光谱与覆盖指示符进行比较，以检测总重叠的情况。
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