公开(公告)号：US09117697B2

公开(公告)日：2015-08-25

申请号：US14303371

申请日：2014-06-12

Applicant: Advanced Semiconductor Engineering, Inc.

Inventor： Chun-Che Lee ,  Yuan-Chang Su ,  Wen-Chi Cheng ,  Guo-Cheng Liao ,  Yi-Chuan Ding

IPC: H01L23/52 ,  H01L21/44 ,  H01L23/00

CPC classification number: H01L24/11 ,  H01L23/13 ,  H01L23/498 ,  H01L23/49827 ,  H01L24/13 ,  H01L24/14 ,  H01L24/16 ,  H01L2224/11019 ,  H01L2224/11622 ,  H01L2224/1163 ,  H01L2224/13147 ,  H01L2224/14104 ,  H01L2224/16225 ,  H01L2924/12042 ,  H05K3/108 ,  H05K3/3436 ,  H05K3/4007 ,  H05K3/4682 ,  H05K2201/0376 ,  H05K2201/09045 ,  H05K2201/10674 ,  H05K2203/0723 ,  H05K2203/1461 ,  H01L2924/00

Abstract: The present disclosure relates to a semiconductor substrate and a method for making the same. The semiconductor substrate includes an insulation layer, a first circuit layer, a second circuit layer, a plurality of conductive vias and a plurality of bumps. The first circuit layer is embedded in a first surface of the insulation layer, and exposed from the first surface of the insulation layer. The second circuit layer is located on a second surface of the insulation layer and electrically connected to the first circuit layer through the conductive vias. The bumps are directly located on part of the first circuit layer, where the lattice of the bumps is the same as that of the first circuit layer.

Abstract translation: 本公开涉及一种半导体衬底及其制造方法。 半导体衬底包括绝缘层，第一电路层，第二电路层，多个导电通孔和多个凸块。 第一电路层嵌入绝缘层的第一表面，并从绝缘层的第一表面露出。 第二电路层位于绝缘层的第二表面上，并通过导电通孔与第一电路层电连接。 凸块直接位于第一电路层的一部分上，其中凸块的晶格与第一电路层的晶格相同。