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    TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME
    3.
    发明申请
    TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME 有权
    含有二氧化硅的硅胶玻璃和光学元件用于使用它的光刻

    公开(公告)号：US20100317505A1

    公开(公告)日：2010-12-16

    申请号：US12862174

    申请日：2010-08-24

    申请人： Akio KOIKE ,  Yasutomi Iwahashi ,  Shinya Kikugawa

    发明人： Akio KOIKE ,  Yasutomi Iwahashi ,  Shinya Kikugawa

    IPC分类号： C03C3/06

    CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54

    摘要： The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.

    摘要翻译： 本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件时，其在高EUV能量光照射时的线性热膨胀系数基本为零。 本发明涉及具有1000℃以下的假想温度，600ppm以上的OH浓度，线性热膨胀系数为0ppb /℃的温度的含TiO 2的二氧化硅玻璃。 在20〜100℃的温度范围内的平均线性热膨胀系数为50ppb /℃以下。

    TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME
    5.
    发明申请
    TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME 失效
    含有二氧化硅的硅胶玻璃和光学元件用于使用它的光刻

    公开(公告)号：US20100323873A1

    公开(公告)日：2010-12-23

    申请号：US12870156

    申请日：2010-08-27

    申请人： Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa

    发明人： Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa

    IPC分类号： C03C3/04

    CPC分类号： C03B19/1461 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

    摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a halogen content of 100 ppm or more; a fictive temperature of 1,100° C. or lower; an average coefficient of linear thermal expansion in the range of from 20 to 100° C. of 30 ppb/° C. or lower; a temperature width ΔT, in which a coefficient of linear thermal expansion is 0±5 ppb/° C., of 5° C. or greater; and a temperature, at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 30 to 150° C.

    摘要翻译： 本发明提供了一种TiO 2 -SiO 2玻璃，其在高EUV能量光照射时的线性热膨胀系数基本为零，这适合作为EUVL用曝光工具的光学部件。 本发明涉及卤素含量为100ppm以上的含TiO 2的二氧化硅玻璃， 假想温度为1100℃或更低; 20〜100℃范围内的平均线性热膨胀系数为30ppb /℃以下; 5℃以上的线性热膨胀系数为0±5ppb /℃的温度宽度＆amp; T; T; 以及线性热膨胀系数为0ppb /℃的温度在30〜150℃的范围内。

    Silica glass containing TiO2 and process for its production
    7.
    发明申请
    Silica glass containing TiO2 and process for its production 有权
    含二氧化硅的硅玻璃及其生产工艺

    公开(公告)号：US20070042893A1

    公开(公告)日：2007-02-22

    申请号：US11589875

    申请日：2006-10-31

    申请人： Akio Koike ,  Yasutomi Iwahashi ,  Yasuyuki Takimoto ,  Shinya Kikugawa

    发明人： Akio Koike ,  Yasutomi Iwahashi ,  Yasuyuki Takimoto ,  Shinya Kikugawa

    IPC分类号： C03C3/06 ,  C03B19/00 ,  C03B23/00 ,  C03B32/00

    CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42

    摘要： It is to provide a silica glass containing TiO2, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero. A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient of thermal expansion from 0 to 100° C. of 0±150 ppb/° C., and an internal transmittance T400-700 per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.

    摘要翻译： 提供含有TiO 2的二氧化硅玻璃，其具有宽的温度范围，其中热膨胀系数基本上为零。 含有TiO 2浓度为3〜10质量％，OH基浓度为600质量ppm以下且Ti 3 +浓度为70质量ppm以下，其特征在于，假想温度为1200℃以下，0〜100℃的热膨胀系数为0±150ppb /℃。 并且在400至700nm的波长范围内每1mm厚度的内部透射率T 400-700 至少为80％。 一种制备含有TiO 2的二氧化硅玻璃的方法，其包括多孔玻璃体形成步骤，F掺杂步骤，氧处理步骤，致密化步骤和玻璃化步骤。

    TIO2-containing silica glass and optical member for lithography using the same
    9.
    发明授权
    TIO2-containing silica glass and optical member for lithography using the same 有权
    含TiO 2的石英玻璃和使用其的光刻用光学构件

    公开(公告)号：US08034731B2

    公开(公告)日：2011-10-11

    申请号：US12862174

    申请日：2010-08-24

    申请人： Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa

    发明人： Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa

    IPC分类号： C03C3/06 ,  C03C3/076 ,  C03B19/06 ,  C03B25/00

    CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54

    摘要： The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.

    摘要翻译： 本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件时，其在高EUV能量光照射时的线性热膨胀系数基本为零。 本发明涉及具有1000℃以下的假想温度，600ppm以上的OH浓度，线性热膨胀系数为0ppb /℃的温度的含TiO 2的二氧化硅玻璃。 在20〜100℃的温度范围内的平均线性热膨胀系数为50ppb /℃以下。

    TiO2-containing silica glass and optical member for lithography using the same
    10.
    发明授权
    TiO2-containing silica glass and optical member for lithography using the same 失效
    含TiO 2的二氧化硅玻璃和使用其的光刻用光学部件

    公开(公告)号：US07998892B2

    公开(公告)日：2011-08-16

    申请号：US12870156

    申请日：2010-08-27

    申请人： Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa

    发明人： Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa

    IPC分类号： C03C3/06 ,  C03C3/11 ,  C03C3/112

    CPC分类号： C03B19/1461 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

    摘要： The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a halogen content of 100 ppm or more; a fictive temperature of 1,100° C. or lower; an average coefficient of linear thermal expansion in the range of from 20 to 100° C. of 30 ppb/° C. or lower; a temperature width ΔT, in which a coefficient of linear thermal expansion is 0±5 ppb/° C., of 5° C. or greater; and a temperature, at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 30 to 150° C.

    摘要翻译： 本发明提供了一种TiO 2 -SiO 2玻璃，其在高EUV能量光照射时的线性热膨胀系数基本上为零，这适合作为EUVL的曝光工具的光学部件。 本发明涉及卤素含量为100ppm以上的含TiO 2的二氧化硅玻璃， 假想温度为1100℃或更低; 20〜100℃范围内的平均线性热膨胀系数为30ppb /℃以下; 5℃以上的线性热膨胀系数为0±5ppb /℃的温度宽度＆amp; T; T; 以及线性热膨胀系数为0ppb /℃的温度在30〜150℃的范围内。