-
1.发明申请PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2 审中-公开生产含有二氧化硅玻璃的工艺，含有二氧化硅的二氧化硅玻璃的光学材料和含有二氧化硅的二氧化硅玻璃的光学材料公开(公告)号：US20090242387A1
公开(公告)日：2009-10-01
申请号：US12466032
申请日：2009-05-14
IPC分类号： C23C14/34
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1484 , C03B2201/21 , C03B2201/42 , C03C17/40 , C03C2201/21 , C03C2201/42 , G03F7/70958
摘要： The claimed invention relates to a process for producing an optical material for EUV lithography, wherein the optical material contains a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass. The process including coating a multilayer film on the silica glass by ion beam sputtering.
摘要翻译： 所要求保护的发明涉及一种用于制造用于EUV光刻的光学材料的方法，其中所述光学材料包含玻璃中TiO 2浓度为3至12质量％且氢分子含量小于5×10 17分子/ cm 3的二氧化硅玻璃 。 该方法包括通过离子束溅射在二氧化硅玻璃上涂覆多层膜。
-
2.发明申请PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2 审中-公开生产含有二氧化硅玻璃的工艺，含有二氧化硅的二氧化硅玻璃的光学材料和含有二氧化硅的二氧化硅玻璃的光学材料公开(公告)号：US20070207911A1
公开(公告)日：2007-09-06
申请号：US11747698
申请日：2007-05-11
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1484 , C03B2201/21 , C03B2201/42 , C03C17/40 , C03C2201/21 , C03C2201/42 , G03F7/70958
摘要： Conventional TiO2—SiO2 glass contains hydrogen atoms substantially, and during deposition under ultrahigh vacuum condition, the hydrogen molecules will diffuse in the chamber, and H2 molecules will be taken into a film thereby formed. Hydrogen molecules will readily diffuse, and the optical characteristics of the multilayer film are likely to be thereby changed. In an optical material for EUV lithography, a multilayer film is coated by ion beam sputtering on a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass.
摘要翻译： 常规的TiO 2 -SiO 2 SiO 2玻璃基本上含有氢原子，并且在超高真空条件下沉积期间，氢分子将在室中扩散，并且H 2 < / SUB>分子将被吸收到由此形成的膜中。 氢分子将容易扩散，并且可能由此改变多层膜的光学特性。 在用于EUV光刻的光学材料中，通过离子束溅射在具有3至12质量％的TiO 2浓度和小于5×10 5质量％的氢分子含量的二氧化硅玻璃上涂覆多层膜， SUP> 17分子/ cm 3在玻璃中。
-
公开(公告)号：US06611317B1
公开(公告)日：2003-08-26
申请号：US09701180
申请日：2001-02-16
申请人： Tohru Ogawa , Hideo Hosono , Shinya Kikugawa , Yoshiaki Ikuta , Akio Masui , Noriaki Shimodaira , Shuhei Yoshizawa
发明人： Tohru Ogawa , Hideo Hosono , Shinya Kikugawa , Yoshiaki Ikuta , Akio Masui , Noriaki Shimodaira , Shuhei Yoshizawa
IPC分类号： G03B2772
CPC分类号： G03F7/70058 , G03F7/70241 , G03F7/70958
摘要： An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm−1 or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm−1.
摘要翻译： 一种曝光装置，其中构成曝光光源系统的光学部件，照明光学系统，光掩模和投影光学系统中的至少一个由用于光学部件的合成石英玻璃制成，其吸收系数为0.70 cm-1或更小，以及归因于约3640cm -1处的SiOH伸缩振动的红外吸收峰。
-
公开(公告)号：US06576578B1
公开(公告)日：2003-06-10
申请号：US09762679
申请日：2001-03-01
IPC分类号： C03C306
CPC分类号： C03B19/1415 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2207/30 , C03B2207/32 , C03B2207/36 , C03C3/06 , C03C2201/12 , C03C2201/21 , C03C2201/23 , C03C2203/40 , C03C2203/54 , Y02P40/57
摘要： A synthetic quartz glass to be used for light with a wavelength of from 150 to 200 nm, wherein the OH group concentration is at most 100 ppm, the hydrogen molecule concentration is at most 1×1017 molecules/cm3, reduction type defects are at most 1×1015 defects/cm3, and the relation between &Dgr;k163 and &Dgr;k190, as between before and after irradiation of ultraviolet rays, satisfies 0
摘要翻译： 用于波长为150〜200nm的光的合成石英玻璃，OH基浓度为100ppm以下，氢分子浓度为1×10 17分子/ cm 3以下，还原型缺陷为1×1015以下的缺陷 / cm3，紫外线照射前后的DELTAk163与DELTAk190之间的关系满足0
-
公开(公告)号：US08402786B2
公开(公告)日：2013-03-26
申请号：US10283055
申请日：2002-10-30
IPC分类号： C03B25/00
CPC分类号： G03F7/70958 , C03B19/1453 , C03B32/00 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C23/00 , C03C2201/21 , C03C2201/23 , C03C2203/54 , Y02P40/57
摘要： A process for producing a synthetic silica glass optical component which contains at least 1×1017 molecules/cm3 and has an OH concentration of at most 200 ppm and substantially no reduction type defects, by treating a synthetic silica glass having a hydrogen molecule content of less than 1×1017 molecules/cm3 at a temperature of from 300 to 600° C. in a hydrogen gas-containing atmosphere at a pressure of from 2 to 30 atms.
摘要翻译： 一种合成石英玻璃光学部件的制造方法，其通过处理氢分子含量少的合成二氧化硅玻璃，其含有至少1×10 17分子/ cm 3，OH浓度为200ppm以下，基本上无还原型缺陷 在含有氢气的气氛中，在2-30atms的压力下，在300-600℃的温度下，比1×1017分子/ cm 3。
-
公开(公告)号：US07022633B2
公开(公告)日：2006-04-04
申请号：US10317068
申请日：2002-12-12
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C23/002 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2203/44 , C03C2203/54 , Y02P40/57 , Y10S65/16 , Y10S501/90 , Y10S501/905
摘要： A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.
摘要翻译： 一种用于光学用途的合成石英玻璃，其通过在含有氟的紫外区域至真空紫外区域的范围内的光照射而使用，所述氟化物具有2250cm -1的散射峰强度 （I 2250）相对于800cm -1（I 800）的散射峰强度，即I 2250 在激光拉曼光谱中，其最大吸收系数为245nm，最多为2×10 3，最大为1×10 -4， SUP> -3cm -1 -1。
-
7.发明授权Synthetic quartz glass for optical member, process for producing the same, and method of using the same 失效用于光学构件的合成石英玻璃及其制造方法及其使用方法公开(公告)号：US06544914B1
公开(公告)日：2003-04-08
申请号：US09701191
申请日：2000-12-28
IPC分类号： C03C306
CPC分类号： C03C23/002 , B08B7/0057 , C03B19/1453 , C03B19/1469 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03C3/06 , C03C2201/23 , C03C2203/50 , Y02P40/57
摘要： A process for producing a synthetic quartz glass for an optical member, which comprises a step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet light having a wavelength of 180 nm or shorter to improve the transmittance in a region of wavelengths of not longer than 165 nm.
摘要翻译： 一种用于制造用于光学构件的合成石英玻璃的方法，其包括用波长为180nm或更短的真空紫外光照射具有50ppm或更低的OH基含量的合成石英玻璃以提高透射率的步骤 波长不超过165nm的区域。
-
公开(公告)号：US06499317B1
公开(公告)日：2002-12-31
申请号：US09581263
申请日：2000-10-17
IPC分类号： G01N2300
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C23/002 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2203/44 , C03C2203/54 , Y02P40/57 , Y10S65/16 , Y10S501/90 , Y10S501/905
摘要： A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.
摘要翻译： 一种用于光学用的合成石英玻璃，其用于通过在从含有氟的紫外线区域到真空紫外线区域的光的照射下使用，其具有2250cm -1（I2250）的散射峰强度比， 对于激光拉曼光谱中至多为1×10 -4的800cm -1（I800）的散射峰强度（I800），即I2250 / I800，其吸光系数为245nm，最多为2×10 -3 cm -3， 1。
-
9.发明授权Glass for information recording media substrate, glass substrate for magnetic disk and magnetic disk 有权用于信息记录介质基板的玻璃，用于磁盘和磁盘的玻璃基板公开(公告)号：US08119268B2
公开(公告)日：2012-02-21
申请号：US12881236
申请日：2010-09-14
CPC分类号： G11B5/7315 , C03C3/083 , C03C3/085 , C03C4/20 , Y10T428/31 , Y10T428/315
摘要： To provide a glass for an information recording media substrate, which is excellent in weather resistance.A glass for an information recording media substrate, which comprises, as represented by mol % based on oxide, from 61 to 66% of SiO2, from 11.5 to 17% of Al2O3, from 8 to 16% of Li2O, from 2 to 8% of Na2O, from 2.5 to 8% of K2O, from 0 to 6% of MgO, from 0 to 4% of TiO2 and from 0 to 3% of ZrO2, provided that Al2O3+MgO+TiO2 is at least 12%, and Li2O+Na2O+K2O is from 16 to 23%, wherein in a case of where B2O3 is contained, its content is less than 1%. The above glass for an information recording media substrate, wherein when the glass is left under steam atmosphere at 120° C. at 0.2 MPa for 20 hours, and the amount of Li, the amount of Na and the amount of K, which precipitate on a surface of the glass are represented as CLi, CNa and CK respectively, CNa is at most 0.7 nmol/cm2, and CLi+CNa+CK is at most 3.5 nmol/cm2.
摘要翻译： 提供耐候性优异的信息记录介质基板用玻璃。 用于信息记录介质基板的玻璃，其以氧化物的摩尔％表示，SiO 2的61至66％，Al 2 O 3的11.5至17％，Li 2 O的8至16％，2至8重量％ 的Na 2 O，2.5〜8％的K 2 O，0〜6％的MgO，0〜4％的TiO 2和0〜3％的ZrO 2，条件是Al 2 O 3 + MgO + TiO 2为至少12％，Li 2 O + Na 2 O + K 2 O为16〜23％，其中，在含有B 2 O 3的情况下，其含量小于1％。 上述用于信息记录介质基板的玻璃，其中当玻璃在蒸气气氛中在120℃下在0.2MPa下放置20小时时，并且Li的量，Na的量和沉淀的K的量 玻璃的表面分别表示为CLi，CNa和CK，CNa为0.7nmol / cm 2以下，CLi + CNa + CK为3.5nmol / cm 3以下。
-
10.发明申请公开(公告)号：US20110189505A1
公开(公告)日：2011-08-04
申请号：US13015155
申请日：2011-01-27
申请人： Takeaki ONO , Noriaki Shimodaira
发明人： Takeaki ONO , Noriaki Shimodaira
CPC分类号： B24B1/00 , B24B7/17 , B24B7/24 , B24B37/12 , B24B53/02 , B24B53/095 , B24D3/00 , B24D3/06 , B24D3/28 , C03C19/00 , G11B5/73 , G11B5/82 , G11B5/84
摘要： The present invention provides a method for lapping a glass substrate, including lapping a glass substrate having excellent maximum thickness deviation, and a method for manufacturing a glass substrate for a magnetic recording medium, including a step using the above-mentioned lapping method.
摘要翻译： 本发明提供一种研磨玻璃基板的方法，包括研磨具有优异的最大厚度偏差的玻璃基板以及用于制造用于磁记录介质的玻璃基板的方法，包括使用上述研磨方法的步骤。
-
-
-
-
-
-
-
-
-
搜索结果
17 条记录 (耗时 0.026 秒)
