Composite structure with high heat dissipation
    3.
    发明授权
    Composite structure with high heat dissipation 有权
    复合结构散热性好

    公开(公告)号:US07135383B2

    公开(公告)日:2006-11-14

    申请号:US11020040

    申请日:2004-12-21

    IPC分类号: H01L21/30

    CPC分类号: H01L21/76254

    摘要: A composite structure is disclosed that includes a support wafer and a layered structure on the support wafer. The layered structure includes at least one layer of a monocrystalline material and at least one layer of a dielectric material. In addition, the layered structure materials and the thickness of each layer are chosen such that the thermal impedance between ambient temperature and 600° K of the composite structure is a value that is no greater than about 1.3 times the thermal impedance of a monocrystalline bulk SiC wafer having the same dimensions as the composite structure. The composite structure provides sufficient heat dissipation properties for manufacturing optical, electronic, or optoelectronic components.

    摘要翻译: 公开了一种复合结构,其包括支撑晶片和支撑晶片上的分层结构。 层状结构包括至少一层单晶材料和至少一层电介质材料。 此外,选择层状结构材料和每层的厚度使得复合结构的环境温度和600°K之间的热阻抗是不大于单晶体块状SiC的热阻抗的约1.3倍的值 晶片具有与复合结构相同的尺寸。 复合结构为制造光学,电子或光电子元件提供了足够的散热特性。

    Composite structure with high heat dissipation
    6.
    发明授权
    Composite structure with high heat dissipation 有权
    复合结构散热性好

    公开(公告)号:US07256473B2

    公开(公告)日:2007-08-14

    申请号:US11539310

    申请日:2006-10-06

    IPC分类号: H01L21/4763

    CPC分类号: H01L21/76254

    摘要: A composite structure is disclosed that includes a support wafer and a layered structure on the support wafer. The layered structure includes at least one layer of a monocrystalline material and at least one layer of a dielectric material. In addition, the layered structure materials and the thickness of each layer are chosen such that the thermal impedance between ambient temperature and 600° K of the composite structure is a value that is no greater than about 1.3 times the thermal impedance of a monocrystalline bulk SiC wafer having the same dimensions as the composite structure. The composite structure provides sufficient heat dissipation properties for manufacturing optical, electronic, or optoelectronic components.

    摘要翻译: 公开了一种复合结构,其包括支撑晶片和支撑晶片上的分层结构。 层状结构包括至少一层单晶材料和至少一层电介质材料。 此外,选择层状结构材料和每层的厚度使得复合结构的环境温度和600°K之间的热阻抗是不大于单晶体块状SiC的热阻抗的约1.3倍的值 晶片具有与复合结构相同的尺寸。 复合结构为制造光学,电子或光电子元件提供了足够的散热特性。

    Method for making a composite substrate and composite substrate according to the method
    7.
    发明申请
    Method for making a composite substrate and composite substrate according to the method 有权
    根据该方法制造复合衬底和复合衬底的方法

    公开(公告)号:US20070022940A1

    公开(公告)日:2007-02-01

    申请号:US11541192

    申请日:2006-09-28

    IPC分类号: C30B33/06

    CPC分类号: H01L21/76254 Y10S117/915

    摘要: The present invention provides methods for fabricating a composite substrate including a supporting substrate and a layer of a binary or ternary material having a crystal form that is non-cubic and semi-polar or non-polar. The methods comprise transferring the layer of a binary or ternary material from a donor substrate to a receiving substrate.

    摘要翻译: 本发明提供了制造复合衬底的方法,所述复合衬底包括支撑衬底和具有非立方和半极性或非极性的晶体形式的二元或三元材料层。 所述方法包括将二元或三元材料的层从施主衬底转移到接收衬底。