摘要:
The method for programming/erasing a non volatile memory cell device includes at least one electric stress step to apply, to at least one active oxide layer of at least one memory cell of the device, a stress electric field able to remove at least a part of charges trapped in the active oxide layer. The method may be used for devices with floating gate type memory cells. The electric stress step may include the application, to one or more terminals of at least one memory cell, of potentials able to produce an electric field on a corresponding active oxide layer.
摘要:
A method programs a memory device that includes at least one memory cell matrix. The programming method the steps of: erasing the memory cells; soft programming the memory cells; and complete programming of a group of such memory cells each of them storing its own logic value. Advantageously, the first complete programming step of a group of such memory cells involves cells belonging to a block (A) of the matrix being electrically insulated from the rest of the matrix. A memory device suitable to implement the proposed method is also described.
摘要:
A method programs a memory device that includes at least one memory cell matrix. The programming method the steps of: erasing the memory cells; soft programming the memory cells; and complete programming of a group of such memory cells each of them storing its own logic value. Advantageously, the first complete programming step of a group of such memory cells involves cells belonging to a block (A) of the matrix being electrically insulated from the rest of the matrix. A memory device suitable to implement the proposed method is also described.
摘要:
A two-dimensional array of memory cells may be used to implement a spatial dosimeter. The two-dimensional array of cells may be implemented by an integrated circuit memory Because of the relatively small size of the integrated circuit memory, the resolution of the resulting array may be less than 100 nanometers. The change in threshold voltage of each of the cells, as a result of radiation exposure, may be used to calculate the dose seen at each cell, allowing dose profiles in two dimensions with sub-micrometer resolution.
摘要:
A two-dimensional array of memory cells may be used to implement a spatial dosimeter. The two-dimensional array of cells may be implemented by an integrated circuit memory. Because of the relatively small size of the integrated circuit memory, the resolution of the resulting array may be less than 100 nanometers. The change in threshold voltage of each of the cells, as a result of radiation exposure, may be used to calculate the dose seen at each cell, allowing dose profiles in two dimensions with sub-micrometer resolution.
摘要:
A CAM memory cellintegrated on a semiconductor substrateincludes a plurality of floating gate memory cells, matrix-organized in rows, called word lines, and columns, called bit lines. The cells belonging to a same row and have floating gate electrodes are short-circuited with each other in order to form a single floating gate electrodefor the CAM memory cell. Advantageously, the single floating gate electrodeis equipped with at least a cavity manufactured in at least a side wall of the single floating gate electrode. A process for manufacturing CAM memory cellsintegrated on a semiconductor substrateis also described.
摘要:
A CAM memory cell integrated on a semiconductor substrate includes a plurality of floating gate memory cells, matrix-organized in rows, called word lines, and columns, called bit lines. The cells belonging to a same row and have floating gate electrodes are short-circuited with each other in order to form a single floating gate electrode for the CAM memory cell. Advantageously, the single floating gate electrode is equipped with at least a cavity manufactured in at least a side wall of the single floating gate electrode. A process for manufacturing CAM memory cells integrated on a semiconductor substrate is also described.