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公开(公告)号：US09244352B2
公开(公告)日：2016-01-26
申请号：US12782397
申请日：2010-05-18
申请人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
发明人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
IPC分类号： G03F7/11 , G03F7/004 , H01L21/027 , C09D167/02 , G03F7/09
CPC分类号： G03F7/11 , C09D167/02 , G03F7/0045 , G03F7/091 , H01L21/0271
摘要： Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
摘要翻译： 提供用于外涂光致抗蚀剂的涂料组合物，其中涂料组合物包含含有氰尿酸酯基团和疏水基团的树脂。 涂料组合物可以增强外涂光致抗蚀剂浮雕图像的分辨率。
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公开(公告)号：US08501383B2
公开(公告)日：2013-08-06
申请号：US12782350
申请日：2010-05-18
申请人： Anthony Zampini , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
发明人： Anthony Zampini , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
IPC分类号： G03F7/004 , C07D251/34 , C08G73/08
CPC分类号： C07D251/32 , C08G73/0655 , G03F7/091
摘要： Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.
摘要翻译： 提供了氰尿酸盐组合物，其特别可用作形成涂覆组合物在外涂光致抗蚀剂下的树脂组分的试剂。 优选的异氰脲酸酯化合物包括通过至少两个不同的羧基和/或羧基酯基取代多个氰脲酸酯氮环原子。
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公开(公告)号：US20110033800A1
公开(公告)日：2011-02-10
申请号：US12782350
申请日：2010-05-18
申请人： Anthony ZAMPINI , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
发明人： Anthony ZAMPINI , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
IPC分类号： G03F7/004 , C07D251/34 , G03F7/20 , C08G73/08
CPC分类号： C07D251/32 , C08G73/0655 , G03F7/091
摘要： Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.
摘要翻译： 提供了氰尿酸盐组合物，其特别可用作形成涂覆组合物在外涂光致抗蚀剂下的树脂组分的试剂。 优选的异氰脲酸酯化合物包括通过至少两个不同的羧基和/或羧基酯基取代多个氰脲酸酯氮环原子。
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公开(公告)号：US20110033801A1
公开(公告)日：2011-02-10
申请号：US12782397
申请日：2010-05-18
申请人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
发明人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
IPC分类号： G03F7/004 , C09D177/00 , G03F7/20
CPC分类号： G03F7/11 , C09D167/02 , G03F7/0045 , G03F7/091 , H01L21/0271
摘要： Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
摘要翻译： 提供用于外涂光致抗蚀剂的涂料组合物，其中涂料组合物包含含有氰尿酸酯基团和疏水基团的树脂。 涂料组合物可以增强外涂光致抗蚀剂浮雕图像的分辨率。
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公开(公告)号：US08968981B2
公开(公告)日：2015-03-03
申请号：US13341456
申请日：2011-12-30
申请人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
发明人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective compositions, that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and can serve as a planarizing, conformal or via-fill layer.
摘要翻译： 有机涂料组合物，特别是抗反射组合物，其包含包含一个或多个对苯甲酸部分的组分。 本发明的优选组合物可以减少来自衬底的辐射辐射反射回外涂光致抗蚀剂层的反射，并且可以用作平坦化，保形或通孔填充层。
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公开(公告)号：US20190354015A1
公开(公告)日：2019-11-21
申请号：US16525526
申请日：2019-07-29
申请人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
发明人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
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公开(公告)号：US10365562B2
公开(公告)日：2019-07-30
申请号：US13340989
申请日：2011-12-30
申请人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
发明人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
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公开(公告)号：US20130004893A1
公开(公告)日：2013-01-03
申请号：US13341456
申请日：2011-12-30
申请人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
发明人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
摘要翻译： 提供了有机涂料组合物，特别是抗反射涂料组合物，其包含包含一种或多种对映异构酸部分的组分。 本发明的优选组合物可用于减少来自衬底的曝光辐射反射回外涂光致抗蚀剂层的反射和/或作为平坦化，保形或通孔填充层的功能。
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公开(公告)号：US20080073754A1
公开(公告)日：2008-03-27
申请号：US11904028
申请日：2007-09-25
IPC分类号： H01L21/469 , H01L23/58
CPC分类号： G03F7/091 , G03F7/0392
摘要： Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer.
摘要翻译： 提供了包含一种或多种包含一种或多种改性酰亚胺基团的树脂的底涂层组合物。 这些涂料组合物特别可用作外涂光致抗蚀剂层的抗反射层。 优选的体系可以被热处理以增加组合物涂层的亲水性，以抑制与外涂有机组合物层的不期望的混合，同时使含水碱性光致抗蚀剂显影剂可除去组合物涂层。
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公开(公告)号：US08455178B2
公开(公告)日：2013-06-04
申请号：US11904028
申请日：2007-09-25
CPC分类号： G03F7/091 , G03F7/0392
摘要： Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer.
摘要翻译： 提供了包含一种或多种包含一种或多种改性酰亚胺基团的树脂的底涂层组合物。 这些涂料组合物特别可用作外涂光致抗蚀剂层的抗反射层。 优选的体系可以被热处理以增加组合物涂层的亲水性，以抑制与外涂有机组合物层的不期望的混合，同时使含水碱性光致抗蚀剂显影剂可除去组合物涂层。
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