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公开(公告)号：US09244352B2
公开(公告)日：2016-01-26
申请号：US12782397
申请日：2010-05-18
申请人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
发明人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
IPC分类号： G03F7/11 , G03F7/004 , H01L21/027 , C09D167/02 , G03F7/09
CPC分类号： G03F7/11 , C09D167/02 , G03F7/0045 , G03F7/091 , H01L21/0271
摘要： Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
摘要翻译： 提供用于外涂光致抗蚀剂的涂料组合物，其中涂料组合物包含含有氰尿酸酯基团和疏水基团的树脂。 涂料组合物可以增强外涂光致抗蚀剂浮雕图像的分辨率。
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公开(公告)号：US08501383B2
公开(公告)日：2013-08-06
申请号：US12782350
申请日：2010-05-18
申请人： Anthony Zampini , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
发明人： Anthony Zampini , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
IPC分类号： G03F7/004 , C07D251/34 , C08G73/08
CPC分类号： C07D251/32 , C08G73/0655 , G03F7/091
摘要： Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.
摘要翻译： 提供了氰尿酸盐组合物，其特别可用作形成涂覆组合物在外涂光致抗蚀剂下的树脂组分的试剂。 优选的异氰脲酸酯化合物包括通过至少两个不同的羧基和/或羧基酯基取代多个氰脲酸酯氮环原子。
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公开(公告)号：US20110033800A1
公开(公告)日：2011-02-10
申请号：US12782350
申请日：2010-05-18
申请人： Anthony ZAMPINI , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
发明人： Anthony ZAMPINI , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
IPC分类号： G03F7/004 , C07D251/34 , G03F7/20 , C08G73/08
CPC分类号： C07D251/32 , C08G73/0655 , G03F7/091
摘要： Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.
摘要翻译： 提供了氰尿酸盐组合物，其特别可用作形成涂覆组合物在外涂光致抗蚀剂下的树脂组分的试剂。 优选的异氰脲酸酯化合物包括通过至少两个不同的羧基和/或羧基酯基取代多个氰脲酸酯氮环原子。
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公开(公告)号：US20110033801A1
公开(公告)日：2011-02-10
申请号：US12782397
申请日：2010-05-18
申请人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
发明人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
IPC分类号： G03F7/004 , C09D177/00 , G03F7/20
CPC分类号： G03F7/11 , C09D167/02 , G03F7/0045 , G03F7/091 , H01L21/0271
摘要： Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
摘要翻译： 提供用于外涂光致抗蚀剂的涂料组合物，其中涂料组合物包含含有氰尿酸酯基团和疏水基团的树脂。 涂料组合物可以增强外涂光致抗蚀剂浮雕图像的分辨率。
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公开(公告)号：US08968981B2
公开(公告)日：2015-03-03
申请号：US13341456
申请日：2011-12-30
申请人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
发明人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective compositions, that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and can serve as a planarizing, conformal or via-fill layer.
摘要翻译： 有机涂料组合物，特别是抗反射组合物，其包含包含一个或多个对苯甲酸部分的组分。 本发明的优选组合物可以减少来自衬底的辐射辐射反射回外涂光致抗蚀剂层的反射，并且可以用作平坦化，保形或通孔填充层。
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公开(公告)号：US20190354015A1
公开(公告)日：2019-11-21
申请号：US16525526
申请日：2019-07-29
申请人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
发明人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
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公开(公告)号：US10365562B2
公开(公告)日：2019-07-30
申请号：US13340989
申请日：2011-12-30
申请人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
发明人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
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公开(公告)号：US20130004893A1
公开(公告)日：2013-01-03
申请号：US13341456
申请日：2011-12-30
申请人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
发明人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
摘要翻译： 提供了有机涂料组合物，特别是抗反射涂料组合物，其包含包含一种或多种对映异构酸部分的组分。 本发明的优选组合物可用于减少来自衬底的曝光辐射反射回外涂光致抗蚀剂层的反射和/或作为平坦化，保形或通孔填充层的功能。
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公开(公告)号：US06316165B1
公开(公告)日：2001-11-13
申请号：US09264061
申请日：1999-03-08
IPC分类号： G03F700
CPC分类号： G03F7/091 , Y10S430/151
摘要： The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.
摘要翻译： 本发明提供适合用作抗反射涂料组合物（“ARC”）的新的光吸收组合物，包括用于深UV应用。 本发明的抗反射组合物在需要平面化涂层时特别有用。 本发明的ARCs含有低分子量树脂，增塑剂化合物和/或低Tg树脂。 本发明还包括用于施加成形平坦化ARC涂层的方法。
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公开(公告)号：US20060068335A1
公开(公告)日：2006-03-30
申请号：US11131890
申请日：2005-05-18
申请人： Suzanne Coley , Peter Trefonas , Patricia Fallon , Gerald Wayton
发明人： Suzanne Coley , Peter Trefonas , Patricia Fallon , Gerald Wayton
CPC分类号： G03F7/091 , G03F7/0382 , G03F7/0392
摘要： Compositions and methods are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred coating composition and methods of the invention can provide enhanced resolution of a patterned overcoated photoresist layer and include use of low activation temperature thermal acid generators as well as multiple thermal treatments to process a layer of the underlying coating composition.
摘要翻译： 提供的组合物和方法可以减少从衬底暴露辐射回到外涂光致抗蚀剂层的反射和/或作为平坦化或通孔填充层的功能。 本发明优选的涂料组合物和方法可以提供图案化涂覆的光致抗蚀剂层的增强的分辨率，并且包括使用低活化温度的热酸发生剂以及多个热处理以处理下层涂料组合物的层。
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