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    Apparatus and system including extraction optics having movable blockers
    2.
    发明授权
    Apparatus and system including extraction optics having movable blockers 有权

    公开(公告)号：US11270864B2

    公开(公告)日：2022-03-08

    申请号：US16828886

    申请日：2020-03-24

    Applicant: Applied Materials, Inc.

    Inventor： Costel Biloiu ,  Adam Calkins ,  Alexander C. Kontos ,  James J. Howarth

    IPC: H01J27/02 ,  H01J37/317 ,  H01J37/08

    Abstract: Disclosed herein are approaches for adjusting extraction slits of an extraction plate using a set of adjustable beam blockers. In one approach, an ion extraction optics may include an extraction plate including a first opening and a second opening, and a first beam blocker extending over the first opening and a second beam blocker extending over the second opening. Each of the first and second beam blockers may include an inner slit defined by a first distance between an inner edge and the extraction plate, and an outer slit defined by a second distance between an outer edge and the extraction plate, wherein the first and second beam blockers are movable to vary at least one of the first distance and the second distance. As a result, extraction through the inner and outer slits of ion beamlets characterized by similar mean angles may be achieved.

    System and method for forming surface relief gratings
    3.
    发明授权
    System and method for forming surface relief gratings 有权

    公开(公告)号：US11226439B2

    公开(公告)日：2022-01-18

    申请号：US16228205

    申请日：2018-12-20

    Applicant: APPLIED Materials, Inc.

    Inventor： Joseph C. Olson ,  Ludovic Godet ,  Costel Biloiu

    IPC: G02B5/18 ,  G02B6/136

    Abstract: Optical grating components and methods of forming are provided. In some embodiments, a method includes providing a substrate, and etching a plurality of trenches into the substrate to form an optical grating. The optical grating may include a plurality of angled trenches, wherein a depth of a first trench of the plurality of trenches varies between at least one of the following: a first lengthwise end of the first trench and a second lengthwise end of the first trench, and between a first side of the first trench and a second side of the first trench.

    Compact low angle ion beam extraction assembly and processing apparatus
    4.
    发明授权
    Compact low angle ion beam extraction assembly and processing apparatus 有权

    公开(公告)号：US12191117B2

    公开(公告)日：2025-01-07

    申请号：US17503334

    申请日：2021-10-17

    Applicant: Applied Materials, Inc.

    Inventor： Costel Biloiu ,  Jay R. Wallace ,  Solomon Belangedi Basame ,  Kevin R. Anglin ,  Tyler Rockwell

    IPC: H01J37/32

    Abstract: An extraction assembly may include an extraction plate for placement along a side of a plasma chamber, and having an extraction aperture, elongated along a first direction, and having an aperture height, extending along a second direction, perpendicular to the first direction. The extraction plate defines an inner surface along the extraction aperture, lying in a first plane. A beam blocker is disposed over the extraction aperture, and has an outer surface, disposed in a second plane, different than the first plane. As such, the beam blocker overlaps with the extraction plate along a first edge of the extraction aperture by a first overlap distance, and overlaps with the extraction plate along a second edge of the extraction aperture by a second overlap distance, so as to define a first extraction slit, along the first edge, and a second extraction slit along the second edge.

    TUNABLE EXTRACTION ASSEMBLY FOR WIDE ANGLE ION BEAM
    6.
    发明申请
    TUNABLE EXTRACTION ASSEMBLY FOR WIDE ANGLE ION BEAM 有权

    公开(公告)号：US20220020557A1

    公开(公告)日：2022-01-20

    申请号：US16929626

    申请日：2020-07-15

    Applicant: Applied Materials, Inc.

    Inventor： Jay R. Wallace ,  Costel Biloiu ,  Kevin M. Daniels

    IPC: H01J37/08 ,  H01J37/04

    Abstract: An ion beam processing system including a plasma chamber, a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture, a beam blocker, disposed within the plasma chamber and facing the extraction aperture, a blocker electrode, disposed on a surface of the beam blocker outside of the plasma chamber, and an extraction electrode disposed on a surface of the plasma plate outside of the plasma chamber.

    Apparatus, system and techniques for mass analyzed ion beam
    10.
    发明授权
    Apparatus, system and techniques for mass analyzed ion beam 有权

    公开(公告)号：US10763072B1

    公开(公告)日：2020-09-01

    申请号：US16354638

    申请日：2019-03-15

    Applicant: APPLIED Materials, Inc.

    Inventor： Frank Sinclair ,  Costel Biloiu ,  Joseph C. Olson ,  Alexandre Likhanskii

    IPC: H01J37/05 ,  H01J37/317 ,  H01J37/147

    Abstract: An apparatus may include a housing including an entrance aperture, to receive an ion beam. The apparatus may include an exit aperture, disposed in the housing, downstream to the entrance aperture, the entrance aperture and the exit aperture defining a beam axis, extending therebetween. The apparatus may include an electrodynamic mass analysis assembly disposed in the housing and comprising an upper electrode assembly, disposed above the beam axis, and a lower electrode assembly, disposed below the beam axis. The apparatus may include an AC voltage assembly, electrically coupled to the upper electrode assembly and the lower electrode assembly, wherein the upper electrode assembly is arranged to receive an AC signal from the AC voltage assembly at a first phase angle, and wherein the lower electrode assembly is arranged to receive the AC signal at a second phase angle, the second phase angle 180 degrees shifted from the first phase angle.

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