公开(公告)号：US20180024444A1

公开(公告)日：2018-01-25

申请号：US15644284

申请日：2017-07-07

Applicant: Applied Materials, Inc.

Inventor： Tamer COSKUN ,  Hwan J. JEONG

IPC: G03F7/20

CPC classification number: G03F7/70633

Abstract: Embodiments disclosed herein generally relate to adjusting exposure parameters of a substrate in response to an overlay error. The method includes partitioning the substrate into one or more sections. Each section corresponds to an image projection system. A total overlay error of a first layer deposited on the substrate is determined. For each section, a sectional overlay error is calculated. For each overlap area, in which two or more sections overlap, an average overlay error is calculated. The exposure parameters are adjusted in response to the total overlay error.

公开(公告)号：US20190128825A1

公开(公告)日：2019-05-02

申请号：US15962981

申请日：2018-04-25

Applicant: Applied Materials, Inc.

Inventor： Qin ZHONG ,  Antoine P. MANENS ,  Hwan J. JEONG

IPC: G01N21/958 ,  G02B26/08 ,  G01M11/02 ,  G03F7/20

CPC classification number: G01N21/958 ,  G01M11/0278 ,  G01N2021/9583 ,  G02B26/0833 ,  G03F7/70025 ,  G03F7/70291 ,  G03F7/70316 ,  G03F7/706 ,  G03F9/7026

Abstract: A method for qualitatively detecting aberration and determine aberration types in a photolithography system is disclosed. The method includes using a digital micromirror device (DMD) pattern to project an optical signal on a reflective substrate, acquiring a return optical signal reflected from the substrate at different focus heights (ranging from above to below best focus), forming a through focus curve based off of the return optical signal at various focus heights, comparing the through focus curve to a predetermined curve—the predetermined curve being a function of focus, and determining if a lens aberration is present. By using the existing hardware of the photolithography system to determine if a lens aberration exists, costs are maintained at a minimum and the DMD pattern creates a through focus curve (TFC) image in less than five minutes allowing for quick correction.

公开(公告)号：US20180210346A1

公开(公告)日：2018-07-26

申请号：US15871302

申请日：2018-01-15

Applicant: Applied Materials, Inc.

Inventor： Thomas L. LAIDIG ,  Hwan J. JEONG

IPC: G03F7/20

CPC classification number: G03F7/702 ,  G02B26/0833 ,  G03F7/70291

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for processing one or more substrates, and more specifically to improved spatial light modulators for digital lithography systems and digital lithography methods using improved spatial light modulators. The spatial light modulator is configured such that there is a 180-degree phase shift between adjacent spatial light modulator pixels. The spatial light modulator is useful for pixel blending by forming a plurality of partially overlapping images, at least one of the plurality of partially overlapping images having at least two pixels formed by a first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween. The spatial light modulator results in improved resolution, depth of focus, and pixel blending.

公开(公告)号：US20210191285A1

公开(公告)日：2021-06-24

申请号：US17057536

申请日：2019-05-31

Applicant: Applied Materials, Inc.

Inventor： David MARKLE ,  Hwan J. JEONG

IPC: G03F9/00 ,  G02B5/18 ,  G03F7/20

Abstract: A lithography system for generating grating structures is provided having a multiple column imaging system located on a bridge capable of moving in a cross-scan direction, a mask having a grating pattern with a fixed spatial frequency located in an object plane of the imaging system, a multiple line alignment mark aligned to the grating pattern and having a fixed spatial frequency, a platen configured to hold and scan a substrate, a scanning system configured to move the platen over a distance greater than a desired length of the grating pattern on the substrate, a longitudinal encoder scale attached to the platen and oriented in a scan direction and at least two encoder scales attached to the platen and arrayed in the cross-scan direction wherein the scales contain periodically spaced alignment marks having a fixed spatial frequency.

公开(公告)号：US20190033729A1

公开(公告)日：2019-01-31

申请号：US16146951

申请日：2018-09-28

Applicant: Applied Materials, Inc.

Inventor： Tamer COSKUN ,  Hwan J. JEONG

IPC: G03F7/20

Abstract: Methods are provided and generally relate to adjusting exposure parameters of a substrate in response to an overlay error. The method includes partitioning the substrate into one or more sections. Each section corresponds to an image projection system. A total overlay error of a first layer deposited on the substrate is determined. For each section, a sectional overlay error is calculated. For each overlap area, in which two or more sections overlap, an average overlay error is calculated. The exposure parameters are adjusted in response to the total overlay error.