公开(公告)号：US20220395958A1

公开(公告)日：2022-12-15

申请号：US17346399

申请日：2021-06-14

Applicant: Applied Materials, Inc.

Inventor： Shiyan Akalanka Jayanath WEWALA GONNAGAHADENIYAGE ,  Ashwin CHOCKALINGAM ,  Jason Garcheung FUNG ,  Veera Raghava Reddy KAKIREDDY ,  Nandan BARADANAHALLI KENCHAPPA ,  Puneet Narendra JAWALI ,  Rajeev BAJAJ

IPC: B24B37/26

Abstract: Embodiments herein generally relate to polishing pads and methods of forming polishing pads. A polishing pad includes a plurality of polishing elements and a plurality of grooves disposed between the polishing elements. Each polishing element includes a plurality of individual posts. Each post includes an individual surface that forms a portion of a polishing surface of the polishing pad and one or more sidewalls extending downwardly from the individual surface. The sidewalls of the plurality of individual posts define a plurality of pores disposed between the posts.

公开(公告)号：US20160101500A1

公开(公告)日：2016-04-14

申请号：US14695778

申请日：2015-04-24

Applicant: Applied Materials, Inc.

Inventor： Jason Garcheung FUNG ,  Rajeev BAJAJ ,  Kasiraman KRISHNAN ,  Mahendra C. ORILALL ,  Fred C. REDEKER ,  Russell Edward PERRY ,  Gregory E. MENK ,  Daniel REDFIELD

IPC: B24B37/26 ,  B24B55/02 ,  B24B37/015

CPC classification number: B24B37/26 ,  B24B37/015 ,  B24B55/02

Abstract: A polishing pad for chemical mechanical polishing is provided. The polishing pad includes a base region having a supporting surface. The polishing pad further includes a plurality of polishing features forming a polishing surface, the polishing surface opposing the supporting surface. The polishing pad further includes one or more channels formed in an interior region of the polishing pad and extending at least partly around a center of the polishing pad, wherein each channel is fluidly coupled to at least one port.

Abstract translation: 提供了用于化学机械抛光的抛光垫。 抛光垫包括具有支撑表面的基底区域。 抛光垫还包括形成抛光表面的多个抛光特征，抛光表面与支撑表面相对。 抛光垫还包括形成在抛光垫的内部区域中并且至少部分地围绕抛光垫的中心延伸的一个或多个通道，其中每个通道流体地联接到至少一个端口。