公开(公告)号：US20160107381A1

公开(公告)日：2016-04-21

申请号：US14863409

申请日：2015-09-23

Applicant: Applied Materials, Inc.

Inventor： Kasiraman KRISHNAN ,  Daniel REDFIELD ,  Russell Edward PERRY ,  Gregory E. MENK ,  Rajeev BAJAJ ,  Fred C. REDEKER ,  Nag B. PATIBANDLA ,  Mahendra C. ORILALL ,  Jason G. FUNG

IPC: B29C67/00 ,  B24B37/22 ,  B24B37/26

CPC classification number: B29C64/112 ,  B24B37/22 ,  B24B37/24 ,  B24B37/26 ,  B24D11/001 ,  B29K2105/16 ,  B29K2995/007 ,  B29L2031/736

Abstract: A polishing article manufacturing system includes a feed section and a take-up section, the take-up section comprising a supply roll having a polishing article disposed thereon for a chemical mechanical polishing process, a print section comprising a plurality of printheads disposed between the feed section and the take-up section, and a curing section disposed between the feed section and the take-up section, the curing section comprising one or both of a thermal curing device and an electromagnetic curing device.

Abstract translation: 一种抛光制品制造系统，包括进料部分和卷取部分，所述卷取部分包括供料辊，所述供料辊具有设置在其上用于化学机械抛光工艺的抛光制品，所述打印部分包括设置在所述进料之间的多个打印头 以及设置在所述进料部和所述卷取部之间的固化部，所述固化部包括热固化装置和电磁固化装置中的一个或两个。

公开(公告)号：US20160101500A1

公开(公告)日：2016-04-14

申请号：US14695778

申请日：2015-04-24

Applicant: Applied Materials, Inc.

Inventor： Jason Garcheung FUNG ,  Rajeev BAJAJ ,  Kasiraman KRISHNAN ,  Mahendra C. ORILALL ,  Fred C. REDEKER ,  Russell Edward PERRY ,  Gregory E. MENK ,  Daniel REDFIELD

IPC: B24B37/26 ,  B24B55/02 ,  B24B37/015

CPC classification number: B24B37/26 ,  B24B37/015 ,  B24B55/02

Abstract: A polishing pad for chemical mechanical polishing is provided. The polishing pad includes a base region having a supporting surface. The polishing pad further includes a plurality of polishing features forming a polishing surface, the polishing surface opposing the supporting surface. The polishing pad further includes one or more channels formed in an interior region of the polishing pad and extending at least partly around a center of the polishing pad, wherein each channel is fluidly coupled to at least one port.

Abstract translation: 提供了用于化学机械抛光的抛光垫。 抛光垫包括具有支撑表面的基底区域。 抛光垫还包括形成抛光表面的多个抛光特征，抛光表面与支撑表面相对。 抛光垫还包括形成在抛光垫的内部区域中并且至少部分地围绕抛光垫的中心延伸的一个或多个通道，其中每个通道流体地联接到至少一个端口。

公开(公告)号：US20200147750A1

公开(公告)日：2020-05-14

申请号：US16746065

申请日：2020-01-17

Applicant: Applied Materials, Inc.

Inventor： Rajeev BAJAJ ,  Kasiraman KRISHNAN ,  Mahendra C. ORILALL ,  Daniel REDFIELD ,  Fred C. REDEKER ,  Nag B. PATIBANDLA ,  Gregory E. MENK ,  Jason G. FUNG ,  Russell Edward PERRY ,  Robert E. DAVENPORT

IPC: B24B37/26 ,  B24D18/00 ,  B24B37/22 ,  B24B37/20 ,  B33Y80/00 ,  B29C64/112 ,  B24B37/24

Abstract: Embodiments of the disclosure generally provide polishing pads having a composite pad body and methods for forming the polishing pads. In one embodiment, the composite pad body includes one or more first features formed from a first material or a first composition of materials, and one or more second features formed from a second material or a second composition of materials, wherein the one or more first features and the one or more second features are formed by depositing a plurality of layers comprising the first material or first composition of materials and second material or second composition of materials.

公开(公告)号：US20180043613A1

公开(公告)日：2018-02-15

申请号：US15722810

申请日：2017-10-02

Applicant: Applied Materials, Inc.

Inventor： Kasiraman KRISHNAN ,  Daniel REDFIELD ,  Russell Edward PERRY ,  Gregory E. MENK ,  Rajeev BAJAJ ,  Fred C. REDEKER ,  Nag B. PATIBANDLA ,  Mahendra C. ORILALL ,  Jason G. FUNG

IPC: B24B37/26 ,  B24B37/22 ,  B29L31/00 ,  B29K105/16

Abstract: A polishing article manufacturing system includes a feed section and a take-up section, the take-up section comprising a supply roll having a polishing article disposed thereon for a chemical mechanical polishing process, a print section comprising a plurality of printheads disposed between the feed section and the take-up section, and a curing section disposed between the feed section and the take-up section, the curing section comprising one or both of a thermal curing device and an electromagnetic curing device.

公开(公告)号：US20180161954A1

公开(公告)日：2018-06-14

申请号：US15876436

申请日：2018-01-22

Applicant: Applied Materials, Inc.

Inventor： Rajeev BAJAJ ,  Kasiraman KRISHNAN ,  Mahendra C. ORILALL ,  Daniel REDFIELD ,  Fred C. REDEKER ,  Nag B. PATIBANDLA ,  Gregory E. MENK ,  Jason G. FUNG ,  Russell Edward PERRY ,  Robert E. DAVENPORT

IPC: B24B37/26 ,  B29C64/112 ,  B24D18/00 ,  B24B37/24 ,  B24B37/20 ,  B33Y80/00 ,  B24B37/22

Abstract: Embodiments of the disclosure generally provide polishing pads includes a composite pad body and methods for forming the polishing pads. One embodiment provides a polishing pad including a composite pad body. The composite pad body includes one or more first features formed from a first material or a first composition of materials, and one or more second features formed from a second material or a second composition of materials, wherein the one or more first features and the one or more second features are formed by depositing a plurality of layers comprising the first material or first composition of materials and second material or second composition of materials.

公开(公告)号：US20160107290A1

公开(公告)日：2016-04-21

申请号：US14695299

申请日：2015-04-24

Applicant: Applied Materials, Inc.

Inventor： Rajeev BAJAJ ,  Kasiraman KRISHNAN ,  Mahendra C. ORILALL ,  Daniel REDFIELD ,  Fred C. REDEKER ,  Nag B. PATIBANDLA ,  Gregory E. MENK ,  Jason G. FUNG ,  Russell Edward PERRY ,  Robert E. DAVENPORT

IPC: B24B37/26 ,  B24B37/22 ,  B24D18/00 ,  B24B37/20

CPC classification number: B24B37/26 ,  B24B37/205 ,  B24B37/22 ,  B24B37/24 ,  B24D18/0045 ,  B29C64/112 ,  B33Y80/00

Abstract: Embodiments of the disclosure generally provide polishing pads includes a composite pad body and methods for forming the polishing pads. One embodiment provides a polishing pad including a composite pad body. The composite pad body includes one or more first features formed from a first material or a first composition of materials, and one or more second features formed from a second material or a second composition of materials, wherein the one or more first features and the one or more second features are formed by depositing a plurality of layers comprising the first material or first composition of materials and second material or second composition of materials.

Abstract translation: 本公开的实施例通常提供抛光垫，其包括复合衬垫本体和用于形成抛光垫的方法。 一个实施例提供了一种包括复合衬垫本体的抛光垫。 复合衬垫本体包括由第一材料或第一组合材料形成的一个或多个第一特征以及由第二材料或第二材料组合物形成的一个或多个第二特征，其中所述一个或多个第一特征和一个 或更多的第二特征通过沉积多个层而形成，所述多个层包括第一材料或第一材料组合物和第二材料或第二材料组合物。