公开(公告)号：US11551942B2

公开(公告)日：2023-01-10

申请号：US17022072

申请日：2020-09-15

Applicant: APPLIED MATERIALS, INC.

Inventor： Manoj A. Gajendra ,  Kyle Moran Hanson ,  Mahadev Joshi ,  Arvind Thiyagarajan ,  Jon Christian Farr

IPC: H01L21/67 ,  H01L21/02 ,  H01L21/3065 ,  B08B3/08 ,  H01L21/677 ,  H01L21/687

Abstract: Methods and apparatus for removing substrate contamination are provided herein. In some embodiments, a multi-chamber processing apparatus includes: a processing chamber for processing a substrate; a factory interface (FI) coupled to the processing chamber via a load lock chamber disposed therebetween; and a cleaning chamber coupled to the FI and configured to rinse and to dry the substrate, wherein the cleaning chamber includes a chamber body defining an interior volume and having a first opening at an interface with the FI for transferring the substrate into and out of the interior volume.

公开(公告)号：US11940819B1

公开(公告)日：2024-03-26

申请号：US18099853

申请日：2023-01-20

Applicant: Applied Materials, Inc.

Inventor： Abhishek Chowdhury ,  Ravikumar Patil ,  Arun Chakravarthy Chakravarthy ,  Jon Christian Farr ,  Saravanan Chandrabalu ,  Prabhuraj Kuberan

IPC: G05D11/13 ,  B01F23/10 ,  F17D1/04 ,  F17D3/01

CPC classification number: G05D11/132 ,  B01F23/191 ,  F17D1/04 ,  F17D3/01 ,  Y10T137/87249

Abstract: Embodiments of fast gas exchange (FGE) manifolds are provided herein. In some embodiments, a FGE manifold includes: a manifold housing having a plurality of inlets and a plurality of outlets for flowing a plurality of process gases therethrough, wherein the plurality of outlets correspond with a plurality of zones in the process chamber; a plurality of hybrid valves disposed in the manifold housing and fluidly coupled to the plurality of inlets; a plurality of mass flow controllers disposed in the manifold housing downstream of the plurality of hybrid valves; a plurality of mixing lines extending downstream from the plurality of mass flow controllers to a plurality of outlet lines; and a plurality of outlet valves disposed in line with corresponding ones of the plurality of outlet lines, wherein a flow path is defined between each inlet of the plurality of inlets and each outlet of the plurality of outlets.

公开(公告)号：US20220285133A1

公开(公告)日：2022-09-08

申请号：US17189728

申请日：2021-03-02

Applicant: Applied Materials, Inc.

Inventor： Abhishek Chowdhury ,  Jon Christian Farr ,  Ravikumar Patil ,  Eller Juco ,  Yi Zheng ,  Siqing Lu

IPC: H01J37/32

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, an apparatus for processing a substrate comprises a top delivery gas nozzle configured to direct process gas toward a substrate support surface of a substrate support and a side delivery gas nozzle configured to direct the process gas toward a side surface of the substrate support, a first gas line connected to the top delivery gas nozzle, a second gas line connected to the side delivery gas nozzle, and a plurality of valves connected to the first gas line and the second gas line for providing process gas to the processing volume of the processing chamber, and a first orifice flow restrictor or a first needle valve connected to the first gas line or a second orifice flow restrictor or a second needle valve connected to the second gas line.