公开(公告)号：US20240286097A1

公开(公告)日：2024-08-29

申请号：US18174026

申请日：2023-02-24

Applicant: Stearns, Conrad and Schmidt, Consulting Engineers, Inc.

Inventor： Jeffrey GRILL

IPC: B01F35/71 ,  B01F23/10 ,  B01F35/221

CPC classification number: B01F35/714 ,  B01F23/191 ,  B01F35/2211 ,  B01F35/718051

Abstract: A method of for mixing gases is described. The gases may include a first and a second gas wherein a gas mixing system accepts the gases and operates in a plurality of modes of operation to produce a discharge gas including a mixture thereof, and the second gas may be supplied without the first gas, and the first gas may be supplied without the second gas. The gas mixing system may be integrated with a gas processing system to produce a biogas-related product. The gas mixing system may be a compressor, a jet compressor, an ejector, an eductor, venturi jet pump, eductor-jet pump, and/or a thermocompressor, that uses a first stream of high-pressure gas to entrain a relatively lower pressure second gas, mixes the two, and discharges a third gas mixture that is of a sufficiently elevated pressure to be supplied to other areas of a production facility.

公开(公告)号：US20230321613A1

公开(公告)日：2023-10-12

申请号：US18130314

申请日：2023-04-03

Applicant: UNIVERSITY OF DOHA FOR SCIENCE & TECHNOLOGY

Inventor： Awni AL-OTOOM

IPC: B01F23/10 ,  F16K5/06 ,  F16K11/087

CPC classification number: B01F23/191 ,  F16K5/0647 ,  F16K11/0876

Abstract: Systems, methods, apparatuses, and computer program products for proportional gas mixing. A method for mixing gas may include receiving, at a modified ball valve, a first gas via a first gas input port of the modified ball valve, and a second gas via a second gas input port of the modified ball valve. The method may also include coupling a motor control device with the modified ball valve. The method may further include operating the modified ball valve via the motor control device by adjusting a position of the modified ball valve. In addition, the method may include releasing a gas mixture of the first gas and the second gas through a gas output port of the modified ball valve.

公开(公告)号：US20230285911A1

公开(公告)日：2023-09-14

申请号：US18008375

申请日：2021-05-27

Applicant: Air Liquide Electronic Systems

Inventor： Vanina TODOROVA ,  Herve DULPHY

IPC: B01F23/10 ,  B01F35/221 ,  B01F35/21 ,  B01F35/22 ,  B01F35/83

CPC classification number: B01F23/191 ,  B01F35/2211 ,  B01F35/2111 ,  B01F35/2202 ,  B01F35/2132 ,  B01F35/83 ,  B01F2101/58

Abstract: Plant for delivering a gas mixture to a silicon wafer doping unit comprising a source of a dopant gas (1), a source of a carrier gas (2), a mixer device (3) connected to the container of dopant gas (1) and to the source of carrier gas (2), a first flow regulator member (41) and a second flow regulator member (42) for regulating the flows of the dopant gas (1) and of the carrier gas (2) towards the mixer device (3), a control unit (5) for controlling the first and second flow regulator members (41, 42) so as to adjust the first flow rate setpoint (D1) and the second flow rate setpoint (D2) in proportions determined as a function of at least one target content (C1, C2) of dopant gas (1) and/or carrier gas (2) in the mixture, a buffer tank (7), a delivery line (6) for delivering the mixture to a doping unit (10) with a consumption flow rate (DC), at least one measurement sensor (8) for measuring a physical quantity, the variation of which is representative of a variation in the consumption flow rate (DC) and for providing a first measurement signal, the control unit (5) being connected to the sensor (8) and configured to produce a first control signal from the first measurement signal, the flow regulator members (41, 42) being configured to adjust the first and second flow rate setpoints (D1, D2) in response to said first control signal.

公开(公告)号：US20240325992A1

公开(公告)日：2024-10-03

申请号：US18193709

申请日：2023-03-31

Applicant: Varian Medical Systems, Inc.

Inventor： Ogy SABEV ,  Flavio POEHLMANN-MARTINS ,  Reza ALIBAZI BEHBAHANI

IPC: B01F23/10 ,  A61N5/02 ,  B01F35/21 ,  B01F35/221 ,  B01F35/71 ,  B01F35/92 ,  G05D22/02 ,  H01P3/12

CPC classification number: B01F23/191 ,  A61N5/02 ,  B01F35/21111 ,  B01F35/2113 ,  B01F35/2117 ,  B01F35/2211 ,  B01F35/71805 ,  B01F35/92 ,  G05D22/02 ,  H01P3/122 ,  B01F2035/99 ,  H05H9/00 ,  H05H2277/11

Abstract: A microwave network for a radiation therapy machine having a microwave source and a linear accelerator, includes a waveguide configured to connect between the microwave source and the linear accelerator. The waveguide contains at least one of a first gas or a second gas, the first gas being 2,3,3,3-tetrafluoro-2-(trifluoromethyl) propanenitrile and the second gas being 1,1,1,3,4,4,4-heptafluoro-3-(trifluoromethyl)-2-butanone.

公开(公告)号：US11949202B2

公开(公告)日：2024-04-02

申请号：US16965458

申请日：2018-02-15

Applicant: Cymer, LLC

Inventor： Yzzer Roman Gutierrez ,  Walter Dale Gillespie ,  Edward Siqi Luo ,  Dinesh Adinath Kanawade

IPC: B01D53/00 ,  B01D53/04 ,  B01D53/30 ,  B01F23/10 ,  B01F35/21 ,  B01F35/22 ,  B01F35/221 ,  H01S3/036 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/036 ,  B01D53/04 ,  B01D53/30 ,  B01F23/191 ,  B01F35/2132 ,  B01F35/2202 ,  B01F35/2211 ,  H01S3/225 ,  H01S3/2366 ,  B01D2253/104 ,  B01D2256/18 ,  B01D2257/102 ,  B01D2257/104 ,  B01D2257/204 ,  B01D2257/2066 ,  B01D2257/504 ,  B01D2257/80

Abstract: A gas recycle system includes a gas purifier system; a gas analysis system; a gas blending system that prepares a recycled gas mixture; and a control system configured to: determine whether a measured amount of at least one intended gas component is within a first range of acceptable values; and determine whether a measured amount of the at least one impurity gas component is within a second range of acceptable values. If the measured amount of the at least one intended gas component is not within the first range of acceptable values, the control system causes the gas blending system to add an additional gas component to the purified gas mixture to prepare the recycled gas mixture; and if the measured amount of the at least one impurity gas is not within the second range of acceptable values, the control system generates an error signal.

公开(公告)号：US11940819B1

公开(公告)日：2024-03-26

申请号：US18099853

申请日：2023-01-20

Applicant: Applied Materials, Inc.

Inventor： Abhishek Chowdhury ,  Ravikumar Patil ,  Arun Chakravarthy Chakravarthy ,  Jon Christian Farr ,  Saravanan Chandrabalu ,  Prabhuraj Kuberan

IPC: G05D11/13 ,  B01F23/10 ,  F17D1/04 ,  F17D3/01

CPC classification number: G05D11/132 ,  B01F23/191 ,  F17D1/04 ,  F17D3/01 ,  Y10T137/87249

Abstract: Embodiments of fast gas exchange (FGE) manifolds are provided herein. In some embodiments, a FGE manifold includes: a manifold housing having a plurality of inlets and a plurality of outlets for flowing a plurality of process gases therethrough, wherein the plurality of outlets correspond with a plurality of zones in the process chamber; a plurality of hybrid valves disposed in the manifold housing and fluidly coupled to the plurality of inlets; a plurality of mass flow controllers disposed in the manifold housing downstream of the plurality of hybrid valves; a plurality of mixing lines extending downstream from the plurality of mass flow controllers to a plurality of outlet lines; and a plurality of outlet valves disposed in line with corresponding ones of the plurality of outlet lines, wherein a flow path is defined between each inlet of the plurality of inlets and each outlet of the plurality of outlets.

公开(公告)号：US11801482B2

公开(公告)日：2023-10-31

申请号：US17177861

申请日：2021-02-17

Applicant: ILLINOIS TOOL WORKS INC.

Inventor： Michael Vincent Hoeger

IPC: B01F23/10 ,  B01F35/21 ,  B23K9/095 ,  B23K9/16

CPC classification number: B01F23/191 ,  B01F35/2111 ,  B23K9/0953 ,  B23K9/0956 ,  B23K9/164

Abstract: Methods and apparatus are disclosed relating to mixing fluids in welding-type equipment. In some examples, a welding-type power supply (and/or wire feeder) may include multiple fluid paths through which to provide fluid from multiple fluid reservoirs to multiple welding-type tools. The power supply may be configured to automatically control fluid flow rates through the fluid paths via proportional valves. Further, the welding-type power supply may be configured to allow and/or prohibit mixing of fluids from different flow paths via control of various valves.

公开(公告)号：US20240058771A1

公开(公告)日：2024-02-22

申请号：US18371052

申请日：2023-09-21

Applicant: Illinois Tool Works Inc.

Inventor： Michael Vincent Hoeger

IPC: B01F23/10 ,  B01F35/21 ,  B23K9/095 ,  B23K9/16

CPC classification number: B01F23/191 ,  B01F35/2111 ,  B23K9/0953 ,  B23K9/0956 ,  B23K9/164

Abstract: Methods and apparatus are disclosed relating to mixing fluids in welding-type equipment. In some examples, a welding-type power supply (and/or wire feeder) may include multiple fluid paths through which to provide fluid from multiple fluid reservoirs to multiple welding-type tools. The power supply may be configured to automatically control fluid flow rates through the fluid paths via proportional valves. Further, the welding-type power supply may be configured to allow and/or prohibit mixing of fluids from different flow paths via control of various valves.

公开(公告)号：US11835148B2

公开(公告)日：2023-12-05

申请号：US16875490

申请日：2020-05-15

Applicant: FLOW CONTROL LLC

Inventor： Akshaykumar Patel ,  Derrick Tran

IPC: B01F23/10 ,  B01F35/221 ,  B01F25/00 ,  F16K11/00 ,  B01F23/451 ,  B01F23/232

CPC classification number: F16K19/00 ,  B01F23/191 ,  B01F23/232 ,  B01F23/451 ,  B01F25/1051 ,  B01F35/2217 ,  Y10T137/87684

Abstract: A control valve features a first housing and a second housing. The first housing includes a first inlet port having a first inlet port orifice member with a first inlet port orifice size configured to provide a first inlet fluid with a first inlet volumetric flow rate, the first inlet port orifice member being detachably coupled inside the first inlet port; includes a second inlet port having a second inlet port orifice member with a second inlet port orifice size configured to provide a second inlet fluid with a second inlet volumetric flow rate, the second inlet port orifice member being detachably coupled inside the second inlet port; and includes a first housing rim configured to extend from the first fixed inlet and the second fixed inlet. The second housing includes a second housing rim coupled to the first housing rim and configured to form a mixture chamber to mix the first inlet fluid received from the first fixed inlet orifice and the second inlet fluid received from the second fixed inlet orifice and provide a mixture chamber fluid; and an outlet port having an outlet port orifice with an outlet port orifice size configured to provide the mixture chamber fluid as an outlet port fluid having an outlet volumetric flow rate. The outlet port fluid has a mixture ratio of the first inlet fluid and the second inlet fluid for a particular application that depends on dimensions of the first inlet port orifice size, the second inlet port orifice size and the outlet port orifice size.

公开(公告)号：US20230279961A1

公开(公告)日：2023-09-07

申请号：US16875490

申请日：2020-05-15

Applicant: FLOW CONTROL LLC

Inventor： Akshaykumar PATEL ,  Derrick TRAN

IPC: F16K11/00 ,  B01F23/10 ,  B01F23/232 ,  B01F23/451 ,  B01F25/00 ,  B01F35/221

CPC classification number: F16K19/00 ,  B01F23/191 ,  B01F23/232 ,  B01F23/451 ,  B01F25/1051 ,  B01F35/2217

Abstract: A control valve features a first housing and a second housing. The first housing includes a first inlet port having a first inlet port orifice member with a first inlet port orifice size configured to provide a first inlet fluid with a first inlet volumetric flow rate, the first inlet port orifice member being detachably coupled inside the first inlet port; includes a second inlet port having a second inlet port orifice member with a second inlet port orifice size configured to provide a second inlet fluid with a second inlet volumetric flow rate, the second inlet port orifice member being detachably coupled inside the second inlet port; and includes a first housing rim configured to extend from the first fixed inlet and the second fixed inlet. The second housing includes a second housing rim coupled to the first housing rim and configured to form a mixture chamber to mix the first inlet fluid received from the first fixed inlet orifice and the second inlet fluid received from the second fixed inlet orifice and provide a mixture chamber fluid; and an outlet port having an outlet port orifice with an outlet port orifice size configured to provide the mixture chamber fluid as an outlet port fluid having an outlet volumetric flow rate. The outlet port fluid has a mixture ratio of the first inlet fluid and the second inlet fluid for a particular application that depends on dimensions of the first inlet port orifice size, the second inlet port orifice size and the outlet port orifice size.