公开(公告)号：US09340876B2

公开(公告)日：2016-05-17

申请号：US14062578

申请日：2013-10-24

Applicant: Applied Materials, Inc.

Inventor： Kyung-Tae Kim

IPC: H01L51/56 ,  C23C16/458 ,  C23C16/04 ,  H01L51/00 ,  H01L51/52

CPC classification number: C23C16/4585 ,  C23C16/042 ,  H01L51/0011 ,  H01L51/5253

Abstract: Embodiments of the invention provide a mask for use in a deposition process. In one embodiment, the mask comprises a rectangular frame member having two opposing major sides and two opposing minor sides, each of the major and minor sides comprising a first side, a second side opposing the first side and joined to the first side by a first outer sidewall, a second outer sidewall disposed inward of the first outer sidewall and defining a raised region projecting from a plane of the second side, and an interior sidewall joining the raised region and the first side. The mask also comprises a rectangular strip disposed on a surface of the raised region, the rectangular strip comprising a first end, and a second end coupled to the first end and extending into an interior area of the frame member.

Abstract translation: 本发明的实施例提供了一种用于沉积工艺的掩模。 在一个实施例中，掩模包括具有两个相对的主侧面和两个相对的副侧面的矩形框架构件，每个主侧面和次侧均包括第一侧面，与第一侧面相对的第二侧面，并且通过第一侧面 外侧壁，第二外侧壁，其设置在第一外侧壁的内侧，并且限定从第二侧的平面突出的凸起区域，以及连接凸起区域和第一侧面的内侧壁。 掩模还包括设置在凸起区域的表面上的矩形条，矩形条包括第一端，第二端与第一端连接并延伸到框架构件的内部区域。

公开(公告)号：US10453728B2

公开(公告)日：2019-10-22

申请号：US15812922

申请日：2017-11-14

Applicant: Applied Materials, Inc.

Inventor： Kyung-Tae Kim ,  Su Ho Cho ,  Tsunehiko Kitamura ,  Shinobu Abe ,  Shuran Sheng

IPC: C23C16/00 ,  H01L21/677 ,  H01L31/18 ,  H01L21/67

Abstract: In one embodiment, a chamber is provided that includes a chamber body and a lid defining an interior volume, a frame within the interior volume, the frame sized to receive a plurality of substrates in a first orientation, and a rotational drive assembly coupled to the frame for rotating the frame and flipping each of the plurality of substrates to a second orientation that is different than the first orientation.